Electronic transport in low temperature nanocrystalline silicon thin-film transistors obtained by Hot-Wire CVD

Hydrogenated nanocrystalline silicon (nc-Si:H) obtained by hot-wire chemical vapour deposition (HWCVD) at low substrate temperature (150 °C) has been incorporated as the active layer in bottom-gate thin-film transistors (TFTs). These devices were electrically characterised by measuring in vacuum the output and transfer characteristics for different temperatures. The field-effect mobility showed a thermally activated behaviour which could be attributed to carrier trapping at the band tails, as in hydrogenated amorphous silicon (a-Si:H), and potential barriers for the electronic transport. Trapped charge at the interfaces of the columns, which are typical in nc-Si:H, would account for these barriers. By using the Levinson technique, the quality of the material at the column boundaries could be studied. Finally, these results were interpreted according to the particular microstructure of nc-Si:H

On the determination of the interface density of states in a-Si:H/a-SiC:H multilayers

This paper deals with the determination of the interface density of states in amorphous silicon-based multilayers. Photothermal deflection spectroscopy is used to characterize two series of aSi:H/aSi1-xCx:H multilayers, and a new approach in the treatment of experimental dada is used in order to obtain accurate results. From this approach, an upper limit of 10^10 cm-2 is determined for the interface density of states

Increased conductivity of a hole transport layer due to oxidation by a molecular nanomagnet

Thin film transistors based on polyarylamine poly(N,N′-diphenyl-N,N′bis(4-hexylphenyl)-[1,1′biphenyl]-4,4′-diamine (pTPD) were fabricated using spin coating in order to measure the mobility of pTPD upon oxidation. Partially oxidized pTPD with a molecular magnetic cluster showed an increase in mobility of over two orders of magnitude. A transition in the mobility of pTPD upon doping could also be observed by the presence of a maximum obtained for a given oxidant ratio and subsequent decrease for a higher ratio. Such result agrees well with a previously reported model based on the combined effect of dipolar broadening of the density of states and transport manifold [email protected] [email protected]

Contingut en fluor a les aigües de consum públic de Catalunya: aportació de dades i consells pràctics per al clínic

El coneixement del contingut de fluor a les aigües de consum públic és de gran importància pel que fa a l'ús de suplements d'aquest mineral en la prevenció i control de la caries dental. S'exposen dades deis nivells de fluorurs dels abastaments públics de Catalunya, i consells pràctics per al clínic en relació a l'ús de suplements. Quasi un 90 % de les xarxes tingueren ni­vells inferiors a O. 7 mg/1

Microcrystalline silicon thin film transistors obtained by Hot-Wire CVD

Polysilicon thin film transistors (TFT) are of great interest in the field of large area microelectronics, especially because of their application as active elements in flat panel displays. Different deposition techniques are in tough competition with the objective to obtain device-quality polysilicon thin films at low temperature. In this paper we present the preliminary results obtained with the fabrication of TFT deposited by hot-wire chemical vapor deposition (HWCVD). Some results concerned with the structural characterization of the material and electrical performance of the device are presented

Large Stokes shift downshifting Eu(III) films as efficiency enhancing UV blocking layers for dye sensitized solar cells

Large Stokes shift downshifting organolanthanide complex, Eu(tta)(3)phen, is examined for inclusion in polymeric layers to replace the UV blocking layer in dye sensitized solar cell (DSSC) technology. The UV blocking layer increases stability but power conversion efficiency decreases as incident UV photons are not converted into photocurrent. Eu(tta) 3phen doped polymeric film are prepared and attached to DSSC devices following optimized thickness and concentration from a ray-trace numerical model for the specific DSSC. External quantum efficiency is significantly increased in the UV spectral region compared to DSSCs utilizing a passive, non-luminescent, UV-BL. High Eu(tta)(3)phen film transparency in the visible range minimizes DSSC EQE losses at visible wavelengths. Short-circuit current (I-sc) enhancement due to downshifting is demonstrated (similar to 1%) in small-scale DSSC prototypes, where the specific geometry limits the photon collection efficiency and overall enhancement. Model predictions indicate that 2%-3% I-sc enhancement is realizable in flexible single DSSC compared to, non-luminescent, UV-BL. Added to this, in outdoor conditions taking into account diffuse light, the increment in Isc can increase 50% more. Although photostability of the blended LSS-DS polymer films is not sufficient to be useful for medium-long term outdoor PV applications, the results demonstrate that significant efficiency enhancement can be realized. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, WeinheimPeer ReviewedPostprint (author’s final draft

Ultrathin a-Si:H/Oxide transparent solar cells exhibiting UV-Blue selective-like absorption

This is the peer reviewed version of the following article: Lopez-Garcia, A. [et al.]. Ultrathin a-Si:H/Oxide transparent solar cells exhibiting UV-Blue selective-like absorption. "Solar RRL", April 2023, which has been published in final form at https://onlinelibrary.wiley.com/doi/10.1002/solr.202200928. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. This article may not be enhanced, enriched or otherwise transformed into a derivative work, without express permission from Wiley or by statutory rights under applicable legislation. Copyright notices must not be removed, obscured or modified. The article must be linked to Wiley’s version of record on Wiley Online Library and any embedding, framing or otherwise making available the article or pages thereof by third parties from platforms, services and websites other than Wiley Online Library must be prohibited.Herein, the fabrication of transparent solar cells based on nanometric (8 and30 nm) intrinsic hydrogenated amorphous siliconfilms (a-Si:H) and using oxidethinfilms as transparent carrier selective contacts are reported. The ultrathindevices present photovoltaic effect and high average visible transmittance (AVT).Additionally, they display a shifted spectral response toward short wavelengths.Glass/fluorine-doped tin oxide (FTO)/aluminum-doped zinc oxide (AZO)/a-Si:H/MoO3/indium tin oxide (ITO) prototypes are shown, presenting AVT=35% andphotovoltaic conversion efficiency (PCE)=2% for a device with a 30 nm a-Si:Hfilm. This yields a light utilization efficiency (LUE) of 0.7%, a record up to this datefor inorganic oxide-based transparent solar cells. For devices including an 8 nma-Si:Hfilm, the AVT reaches 66% with a PCE=0.6% (LUE=0.4%). These highAVT values are comparable or even superior in some cases to those achieved forpure oxide devices. Thesefindings confirm the potential of the proposedarchitectures for the development of highly transparent energy harvesters asfunctional components in building-integrated photovoltaics (BIPV), agrophoto-voltaics (APV), sensors and other low-power devices. In addition, these devicesare fabricated with earth-abundant materials and with up-scalable techniquesthat can allow for a feasible implementation.Peer ReviewedPostprint (published version

Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

In this work, we study the electronic surface passivation of crystalline silicon with intrinsic thin silicon films deposited by Catalytic CVD. The contactless method used to determine the effective surface recombination velocity was the quasi-steady-state photoconductance technique. Hydrogenated amorphous and nanocrystalline silicon films were evaluated as passivating layers on n- and p-type float zone silicon wafers. The best results were obtained with amorphous silicon films, which allowed effective surface recombination velocities as low as 60 and 130 cms -1 on p- and n-type silicon, respectively. To our knowledge, these are the best results ever reported with intrinsic amorphous silicon films deposited by Catalytic CVD. The passivating properties of nanocrystalline silicon films strongly depended on the deposition conditions, especially on the filament temperature. Samples grown at lower filament temperatures (1600 °C) allowed effective surface recombination velocities of 450 and 600 cms -1 on n- and p-type silicon

Thin Film Transistors obtained by Hot-Wire CVD

Hydrogenated microcrystalline silicon films obtained at low temperature (150-280°C) by hot wire chemical vapour deposition at two different process pressures were measured by Raman spectroscopy, X-ray diffraction (XRD) spectroscopy and photothermal deflection spectroscopy (PDS). A crystalline fraction >90% with a subgap optical absortion 10 cm -1 at 0.8 eV were obtained in films deposited at growth rates >0.8 nm/s. These films were incorporated in n-channel thin film transistors and their electrical properties were measured. The saturation mobility was 0.72 ± 0.05 cm 2/ V s and the threshold voltage around 0.2 eV. The dependence of their conductance activation energies on gate voltages were related to the properties of the material