1,126 research outputs found
Stress-Induced Delamination Of Through Silicon Via Structures
Continuous scaling of on-chip wiring structures has brought significant challenges for materials and processes beyond the 32 nm technology node in microelectronics. Recently three-dimensional (3-D) integration with through-silicon-vias (TSVs) has emerged as an effective solution to meet the future interconnect requirement. Thermo-mechanical reliability is a key concern for the development of TSV structures used in die stacking as 3-D interconnects. This paper examines the effect of thermal stresses on interfacial reliability of TSV structures. First, the three-dimensional distribution of the thermal stress near the TSV and the wafer surface is analyzed. Using a linear superposition method, a semi-analytic solution is developed for a simplified structure consisting of a single TSV embedded in a silicon (Si) wafer. The solution is verified for relatively thick wafers by comparing to numerical results obtained by finite element analysis (FEA). Results from the stress analysis suggest interfacial delamination as a potential failure mechanism for the TSV structure. Analytical solutions for various TSV designs are then obtained for the steady-state energy release rate as an upper bound for the interfacial fracture driving force, while the effect of crack length is evaluated numerically by FEA. Based on these results, the effects of TSV designs and via material properties on the interfacial reliability are elucidated. Finally, potential failure mechanisms for TSV pop-up due to interfacial fracture are discussed.Aerospace Engineerin
Characterization Of Thermal Stresses And Plasticity In Through-Silicon Via Structures For Three-Dimensional Integration
Through-silicon via (TSV) is a critical element connecting stacked dies in three-dimensional (3D) integration. The mismatch of thermal expansion coefficients between the Cu via and Si can generate significant stresses in the TSV structure to cause reliability problems. In this study, the thermal stress in the TSV structure was measured by the wafer curvature method and its unique stress characteristics were compared to that of a Cu thin film structure. The thermo-mechanical characteristics of the Cu TSV structure were correlated to microstructure evolution during thermal cycling and the local plasticity in Cu in a triaxial stress state. These findings were confirmed by microstructure analysis of the Cu vias and finite element analysis (FEA) of the stress characteristics. In addition, the local plasticity and deformation in and around individual TSVs were measured by synchrotron x-ray microdiffraction to supplement the wafer curvature measurements. The importance and implication of the local plasticity and residual stress on TSV reliabilities are discussed for TSV extrusion and device keep-out zone (KOZ).Microelectronics Research Cente
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Thermomechanical Reliability Challenges For 3D Interconnects With Through-Silicon Vias
Continual scaling of on-chip wiring structures has brought significant challenges for materials and processes beyond the 32 nm technology node in microelectronics. Recently threedimensional (3-D) integration with through-silicon-vias (TSVs) has emerged as an effective solution to meet the future interconnect requirement. Among others, thermo-mechanical reliability is a key concern for the development of TSV structures used in die stacking as 3-D interconnects. This paper examines the effects of thermally induced stresses on interfacial reliability of TSV structures. First, three-dimensional distribution of the thermal stress near the TSV and the wafer surface is analyzed. Using a linear superposition method, a semi-analytic solution is developed for a simplified structure consisting of a single TSV embedded in a silicon (Si) wafer. The solution is verified for relatively thick wafers by comparing to numerical results From finite element analysis (FEA). The stress analysis suggests interfacial delamination as a potential failure mechanism for the TSV structure. An analytical solution is then obtained for the steady-state energy release rate as the upper bound for the interfacial fracture driving force, while the effect of crack length is evaluated numerically by FEA. With these results, the effects of the TSV dimensions (e.g., via diameter and wafer thickness) on the interfacial reliability are elucidated. Furthermore, the effects of via material properties are discussed.Aerospace Engineerin
Thermomechanical Characterization And Modeling For TSV Structures
Continual scaling of devices and on-chip wiring has brought significant challenges for materials and processes beyond the 32-nm technology node in microelectronics. Recently, three-dimensional (3-D) integration with through-silicon vias (TSVs) has emerged as an effective solution to meet the future technology requirements. Among others, thermo-mechanical reliability is a key concern for the development of TSV structures used in die stacking as 3-D interconnects. This paper presents experimental measurements of the thermal stresses in TSV structures and analyses of interfacial reliability. The micro-Raman measurements were made to characterize the local distribution of the near-surface stresses in Si around TSVs. On the other hand, the precision wafer curvature technique was employed to measure the average stress and deformation in the TSV structures subject to thermal cycling. To understand the elastic and plastic behavior of TSVs, the microstructural evolution of the Cu vias was analyzed using focused ion beam (FIB) and electron backscattering diffraction (EBSD) techniques. Furthermore, the impact of thermal stresses on interfacial reliability of TSV structures was investigated by a shear-lag cohesive zone model that predicts the critical temperatures and critical via diameters.Microelectronics Research Cente
Pre and postoperative lactate levels and lactate clearance in predicting in-hospital mortality after surgery for gastrointestinal perforation
Abstract
Background
This study aimed to compare the prognostic significance of pre and postoperative lactate levels and postoperative lactate clearance in the prediction of in-hospital mortality after surgery for gastrointestinal (GI) perforation.
Methods
Among patients who underwent surgery for GI perforation between 2013 and 2017, only patients whose lactate were measured before and after surgery were included and divided into an in-hospital mortality group and a survival group. Data on demographics, comorbidities, pre and postoperative laboratory test results, and operative findings were collected. Risk factors for in-hospital mortality were identified, and receiver-operating characteristic (ROC) curve analysis was performed for pre and postoperative lactate levels and postoperative lactate clearance.
Results
Of 104 included patients, 17 patients (16.3%) died before discharge. The in-hospital mortality group demonstrated higher preoperative lactate (6.3 ± 5.1 vs. 3.5 ± 3.2, P = 0.013), SOFA score (4.5 ± 1.7 vs. 3.4 ± 2.3, P = 0.004), proportions of patients with lymphoma (23.5% vs. 2.3%, P = 0.006), and rates of contaminated ascites (94.1% vs. 68.2%, P = 0.036) and lower preoperative hemoglobin (10.4 ± 1.6 vs. 11.8 ± 2.4, P = 0.018) compare to the survival group. Multivariate analysis revealed that postoperative lactate (HR 1.259, 95% CI 1.084–1.463, P = 0.003) and preoperative hemoglobin (HR 0.707, 95% CI 0.520–0.959, P = 0.026) affected in-hospital mortality. In the ROC curve analysis, the largest area under the curve (AUC) was shown in the postoperative lactate level (AUC = 0.771, 95% CI 0.678–0.848).
Conclusion
Of perioperative lactate levels in patients underwent surgery for GI perforation, postoperative lactate was the strongest predictor for in-hospital mortality
Hysteresis effects and diagnostics of the shock formation in low angular momentum axisymmetric accretion in the Kerr metric
The secular evolution of the purely general relativistic low angular momentum
accretion flow around a spinning black hole is shown to exhibit hysteresis
effects. This confirms that a stationary shock is an integral part of such an
accretion disc in the Kerr metric. The equations describing the space gradient
of the dynamical flow velocity of the accreting matter have been shown to be
equivalent to a first order autonomous dynamical systems. Fixed point analysis
ensures that such flow must be multi-transonic for certain astrophysically
relevant initial boundary conditions. Contrary to the existing consensus in the
literature, the critical points and the sonic points are proved not to be
isomorphic in general. Homoclinic orbits for the flow flow possessing multiple
critical points select the critical point with the higher entropy accretion
rate, confirming that the entropy accretion rate is the degeneracy removing
agent in the system. However, heteroclinic orbits are also observed for some
special situation, where both the saddle type critical points of the flow
configuration possesses identical entropy accretion rate. Topologies with
heteroclinic orbits are thus the only allowed non removable degenerate
solutions for accretion flow with multiple critical points, and are shown to be
structurally unstable. Depending on suitable initial boundary conditions, a
homoclinic trajectory can be combined with a standard non homoclinic orbit
through an energy preserving Rankine-Hugoniot type of stationary shock. An
effective Lyapunov index has been proposed to analytically confirm why certain
class of transonic flow can not accommodate shock solutions even if it produces
multiple critical points. (Abridged)Comment: mn2e.cls format. 24 pages. 4 figure
Study of the decays B->D_s1(2536)+ anti-D(*)
We report a study of the decays B -> D_s1(2536)+ anti-D(*), where anti-D(*)
is anti-D0, D- or D*-, using a sample of 657 x 10^6 B anti-B pairs collected at
the Upsilon(4S) resonance with the Belle detector at the KEKB asymmetric-energy
e+e- collider. The branching fractions of the decays B+ -> D_s1(2536)+ anti-D0,
B0 -> D_s1(2536)+ D- and B0 -> D_s1(2536)+ D*- multiplied by that of
D_s1(2536)+ -> (D*0K+ + D*+K0) are found to be (3.97+-0.85+-0.56) x 10^-4,
(2.75+-0.62+-0.36) x 10^-4 and (5.01+-1.21+-0.70) x 10^-4, respectively.Comment: 6 pages, 2 figues, submitted to PRD (RC
Evidence for B- -> tau- nu_bar with a Semileptonic Tagging Method
We present a measurement of the decay B- -> tau- nu_bar using a data sample
containing 657 million BB_bar pairs collected at the Upsilon(4S) resonance with
the Belle detector at the KEKB asymmetric-energy e+e- collider. A sample of
BB_bar pairs are tagged by reconstructing one B meson decaying
semileptonically. We detect the B- -> tau- nu_bar candidate in the recoil. We
obtain a signal with a significance of 3.6 standard deviations including
systematic uncertainties, and measure the branching fraction to be Br(B- ->
tau- nu_bar) = [1.54+0.38-0.37(stat)+0.29-0.31(syst)]*10^-4. This result
confirms the evidence for B- -> tau- nu_bar obtained in a previous Belle
measurement that used a hadronic B tagging method.Comment: 7 pages, 3 figures, corrected references, to appear in PRD-R
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