Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition

Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic force microscopy, and optical transmission spectroscopy. We show that the properties of the ZnO nanostructured films depend strongly on the type of primary oxide-covered substrate used. Previous studies on different electrodeposition methods for nucleation and growth are considered in the final discussion.Facultad de Ciencias Exacta

Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition

Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic force microscopy, and optical transmission spectroscopy. We show that the properties of the ZnO nanostructured films depend strongly on the type of primary oxide-covered substrate used. Previous studies on different electrodeposition methods for nucleation and growth are considered in the final discussion.Facultad de Ciencias Exacta

Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition

Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers play an important role on the properties of the nanostructured films grown on top of them. Additionally, these primary oxide layers prevent direct hole combination when used in optoelectronic devices. Structural and optical characterizations were carried out by scanning electron microscopy, atomic force microscopy, and optical transmission spectroscopy. We show that the properties of the ZnO nanostructured films depend strongly on the type of primary oxide-covered substrate used. Previous studies on different electrodeposition methods for nucleation and growth are considered in the final discussion.We thank Prof. A. Segura of the Universitat de Valencia for the facilities with the sputtering equipment. This work was supported by the project PROMETEO/2009/074 from the Generalitat Valenciana.Reyes Tolosa, MD.; Damonte, LC.; Brine, H.; Bolink, HJ.; Hernández Fenollosa, MDLÁ. (2013). Nucleant layer effect on nanocolumnar ZnO films grown by electrodeposition. Nanoscale Research Letters. 8:135-144. https://doi.org/10.1186/1556-276X-8-135S1351448Franklin JB, Zou B, Petrov P, McComb DW, Ryanand MP, McLachlan MA,J: Optimised pulsed laser deposition of ZnO thin films on transparent conducting substrates. Mater Chem 2011, 21: 8178–8182. 10.1039/c1jm10658aJaroslav B, Andrej V, Marie N, Šuttab P, Miroslav M, František U: Cryogenic pulsed laser deposition of ZnO. 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Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films

The quality and properties of electrodeposited nanostructured ZnO flms are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the efect of this interlayer on the morphological and optical properties of several nanostructured ZnO flms grown by diferent electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO flms deposited on top of these interlayers were characterized using feld emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO flms for application in thin-flm optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.Fil: Reyes Tolosa, María Dolores. Universidad Politécnica de Valencia. Instituto de Tecnología de Materiales; EspañaFil: Alajami, Mutaz. Universidad Politécnica de Valencia. Instituto de Tecnología de Materiales; EspañaFil: Montero Reguera, A. E.. Universidad Politécnica de Valencia. Instituto de Tecnología de Materiales; EspañaFil: Damonte, Laura Cristina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Física La Plata. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Física La Plata; ArgentinaFil: Hernández Fenollosa, María de los Ángeles. Universidad Politécnica de Valencia. Instituto de Tecnología de Materiales; Españ

Optical and Electrical Properties of TiO2/Co/TiO2 Multilayer Films Grown by DC Magnetron Sputtering

Transparent oxide multilayer films of TiO2/Co/TiO2 were grown on glass substrate by DC magnetron sputtering technique. The optical and electrical properties of these films were analyzed with the aim of substituting ITO substrate in optoelectronic devices. The samples were characterized by UV-visible spectroscopy, atomic force microscopy (AFM), and Kelvin probe force microscopy (KPFM). The effect of Co interlayer thickness (4, 8, and 12 nm) on the transmittance spectra yielded an optical absorption edge shift. The work function of these films was determined by KPFM technique allowing us to predict the Fermi level shift by extending the model for pure materials to our multilayer system. The Fermi level and optical absorption edge seem to be correlated and shifted toward lower energies when Co interlayer thickness is increased

Agreement in the assessment of metastatic spine disease using scoring systems

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