Van Der Waals Heteroepitaxy of GaSe and InSe, Quantum Wells and Superlattices

Bandgap engineering and quantum confinement in semiconductor heterostructures provide the means to fine-tune material response to electromagnetic fields and light in a wide range of the spectrum. Nonetheless, forming semiconductor heterostructures on lattice-mismatched substrates has been a challenge for several decades, leading to restrictions for device integration and the lack of efficient devices in important wavelength bands. Here, we show that the van der Waals epitaxy of two-dimensional (2D) GaSe and InSe heterostructures occur on substrates with substantially different lattice parameters, namely silicon and sapphire. The GaSe/InSe heterostructures were applied in the growth of quantum wells and superlattices presenting photoluminescence and absorption related to interband transitions. Moreover, we demonstrate a self-powered photodetector based on this heterostructure on Si that works in the visible-NIR wavelength range. Fabricated at wafer-scale, these results pave the way for an easy integration of optoelectronics based on these layered 2D materials in current Si technology.Comment: 16 Pages, 5 figures. Supplementary Information included in the end (+10 pages, +10 Figures, + 2 Tables). Partially presented at 21st ICMBE - September 202

Études in-situ dans un microscope électronique en transmission des réactions à l’état solide entre métal et nanofil de Ge

Semiconductor nanowires (NWs) are promising candidates for many device applications ranging from electronics and optoelectronics to energy conversion and spintronics. However, typical NW devices are fabricated using electron beam lithography and therefore source, drain and channel length still depend on the spatial resolution of the lithography. In this work we show fabrication of NW devices in a transmission electron microscope (TEM) where we can obtain atomic resolution on the channel length using in-situ propagation of a metallic phase in the semiconducting NW independent of the lithography resolution. We show results on semiconducting NW devices fabricated on two different electron transparent Si3N4 membranes: a planar membrane and a membrane where devices are suspended over holes. First we show the process of making lithographically defined reliable electrical contacts on individual NWs. Second we show first results on in-situ propagation of a metal-semiconductor phase in Ge NWs by joule heating, while measuring the current through the device. Two different devices are studied: one with platinum metal contacts and one with copper contacts. Different phenomena can occur in CuGe NWs during phase propagation.Le domaine des nanofils semi-conducteurs est en pleine expansion depuis ces dix dernières années grâce à leurs applications dans de nombreux domaines tels que l’électronique ou la conversion d’énergie. Dans cette étude on part d’une base de nanofil de germanium (le canal), on dépose des contacts métalliques qui seront chauffés par effet joule. Une différence de potentiel est alors appliquée au contact d’entrée (la source), le courant électrique est récupéré et mesuré par le contact de sortie (le drain). Une réaction à l’état solide permet aux atomes du métal de diffuser dans le nanofil. La propagation d'une phase métal/semi-conducteur est suivie dans un microscope électronique en transmission (MET) dont la résolution permet une observation à l’échelle atomique au niveau de la source, le drain et le canal. Les dispositifs caractérisés au cours de ce stage ont été élaborés à partir de deux types de membranes, l’une plane et l’autre avec des trous. Chacune d’entre elles sont constituées d’une couche de nitrate de silicium Si3N4 à leurs surfaces présentant l’avantage d’être transparents aux électrons et isolants au courant

In-situ transmission electron microscopy studies of metal-Ge nanowire solid-state reactions

Le domaine des nanofils semi-conducteurs est en pleine expansion depuis ces dix dernières années grâce à leurs applications dans de nombreux domaines tels que l’électronique ou la conversion d’énergie. Dans cette étude on part d’une base de nanofil de germanium (le canal), on dépose des contacts métalliques qui seront chauffés par effet joule. Une différence de potentiel est alors appliquée au contact d’entrée (la source), le courant électrique est récupéré et mesuré par le contact de sortie (le drain). Une réaction à l’état solide permet aux atomes du métal de diffuser dans le nanofil. La propagation d'une phase métal/semi-conducteur est suivie dans un microscope électronique en transmission (MET) dont la résolution permet une observation à l’échelle atomique au niveau de la source, le drain et le canal. Les dispositifs caractérisés au cours de ce stage ont été élaborés à partir de deux types de membranes, l’une plane et l’autre avec des trous. Chacune d’entre elles sont constituées d’une couche de nitrate de silicium Si3N4 à leurs surfaces présentant l’avantage d’être transparents aux électrons et isolants au courant.Semiconductor nanowires (NWs) are promising candidates for many device applications ranging from electronics and optoelectronics to energy conversion and spintronics. However, typical NW devices are fabricated using electron beam lithography and therefore source, drain and channel length still depend on the spatial resolution of the lithography. In this work we show fabrication of NW devices in a transmission electron microscope (TEM) where we can obtain atomic resolution on the channel length using in-situ propagation of a metallic phase in the semiconducting NW independent of the lithography resolution. We show results on semiconducting NW devices fabricated on two different electron transparent Si3N4 membranes: a planar membrane and a membrane where devices are suspended over holes. First we show the process of making lithographically defined reliable electrical contacts on individual NWs. Second we show first results on in-situ propagation of a metal-semiconductor phase in Ge NWs by joule heating, while measuring the current through the device. Two different devices are studied: one with platinum metal contacts and one with copper contacts. Different phenomena can occur in CuGe NWs during phase propagation

Atomic-Scale Interface Modification Improves the Performance of Cu(In1\u2013xGax)Se2/Zn(O,S) Heterojunction Solar Cells

Cadmium-free buffer layers deposited by a dry vacuum process are mandatory for low-cost and environmentally friendly Cu(In1\u2013xGax)Se2 (CIGS) photovoltaic in-line production. Zn(O,S) has been identified as an alternative to the chemical bath deposited CdS buffer layer, providing comparable power conversion efficiencies. Recently, a significant efficiency enhancement has been reported for sputtered Zn(O,S) buffers after an annealing treatment of the complete solar cell stack; the enhancement was attributed to interdiffusion at the CIGS/Zn(O,S) interface, resulting in wide-gap ZnSO4 islands formation and reduced interface defects. Here, we exclude interdiffusion or island formation at the absorber/buffer interface after annealing up to 200 \ub0C using high-resolution scanning transmission electron microscopy (HR-STEM) and energy-dispersive X-ray spectroscopy (EDX). Interestingly, HR-STEM imaging reveals an epitaxial relationship between a part of the Zn(O,S) buffer layer grains and the CIGS grains induced by annealing at such a low temperature. This alteration of the CIGS/buffer interface is expected to lead to a lower density of interface defects, and could explain the efficiency enhancement observed upon annealing the solar cell stack, although other causes cannot be excluded

In Situ Transmission Electron Microscopy Analysis of Copper–Germanium Nanowire Solid-State Reaction

International audienceA promising approach of making high quality contacts on semiconductors is a silicidation (for silicon) or germanidation (for germanium) annealing process, where the metal enters the semiconductor and creates a low resistance intermetallic phase. In a nanowire, this process allows one to fabricate axial heterostructures with dimensions depending only on the control and understanding of the thermally induced solid-state reaction. In this work, we present the first observation of both germanium and copper diffusion in opposite directions during the solid-state reaction of Cu contacts on Ge nanowires using in situ Joule heating in a transmission electron microscope. The in situ observations allow us to follow the reaction in real time with nanometer spatial resolution. We follow the advancement of the reaction interface over time, which gives precious information on the kinetics of this reaction. We combine the kinetic study with ex situ characterization using model-based energy dispersive X-ray spectroscopy (EDX) indicating that both Ge and Cu diffuse at the surface of the created Cu3Ge segment and the reaction rate is limited by Ge surface diffusion at temperatures between 360 and 600 °C. During the reaction, germanide crystals typically protrude from the reacted NW part. However, their formation can be avoided using a shell around the initial Ge NW. Ha direct Joule heating experiments show slower reaction speeds indicating that the reaction can be initiated at lower temperatures. Moreover, they allow combining electrical measurements and heating in a single contacting scheme, rendering the Cu–Ge NW system promising for applications where very abrupt contacts and a perfectly controlled size of the semiconducting region is required. Clearly, in situ TEM is a powerful technique to better understand the reaction kinetics and mechanism of metal–semiconductor phase formation

Scanning Transmission Electron Microscopy Investigations of an Efficiency Enhanced Annealed Cu(In1-xGax)Se2 Solar Cells with Sputtered Zn(O,S) Buffer Layer

Cu(In1-xGax)Se2 (CIGS) is a direct band gap semiconductor widely used in photovoltaic (PV) energy conversion devices due to its high sunlight absorbance and high temperature stability. A conventional CIGS solar cell is presented as a stack of glass/Mo/CIGS/CdS/i-ZnO/ZnO:Al. The highest efficiencies are typically obtained with a CdS buffer layer deposited by chemical bath deposition (CBD). However, CdS CBD at industrial scale is material inefficient and environmentally unfriendly, as it generates large amounts of toxic/carcinogenic waste. Therefore, a transition to Cd-free buffer layers deposited by a dry vacuum process is mandatory for sustainable CIGS PV in-line production. ZnO1-xSx (ZnO0.75S0.25) via sputtering is an alternative to the CdS CBD in CIGS solar cells, providing a negative conduction band offset [1]. Recently, a significant efficiency enhancement was reported after an annealing treatment of the complete solar cell stack with the sputtered buffer ZnO0.75S0.25 [2]. Among the possible causes of this enhancement inter-diffusion occurring at the absorber/buffer layer interface could play a major role. In the following, we investigate the interface of a similar CIGS solar cell before and after 200\ub0C annealing using advanced scanning transmission electron microscopy (STEM) techniques. Our first results, obtained by high resolution STEM (HR-STEM) and energy dispersive X-ray spectroscopy (EDX), demonstrate the absence of any inter-diffusion or intermixing layer at the absorber/buffer layer interface. Interestingly, we systematically observe the presence of stacking faults in CIGS in close proximity to the absorber/buffer layer interface, independently from the annealing process. HR-STEM imaging reveals an order occurring between ZnO0.75S0.25 crystals and the CIGS crystals, where an epitaxial relationship arises subsequent to the 200\ub0C annealing. This change at the CIGS/buffer interface could result in a lower density of interface defects, which in turn would explain the efficiency enhancement observed in the annealed solar cell stack. [1] C. Platzer-Bj\uf6rkman et al, Journal of Applied Physics, 100 (2006) 044506-1 \u2013 044506-9. [2] M. Zutter et al, Phys. Status Solidi RRL, 13 (2019) 1900145-1 - 1900145-8

In Situ Transmission Electron Microscopy Analysis of Aluminum–Germanium Nanowire Solid-State Reaction

International audienceTo fully exploit the potential of semiconduct-ing nanowires for devices, high quality electrical contacts are of paramount importance. This work presents a detailed in situ transmission electron microscopy (TEM) study of a very promising type of NW contact where aluminum metal enters the germanium semiconducting nanowire to form an extremely abrupt and clean axial metal−semiconductor interface. We study this solid-state reaction between the aluminum contact and germanium nanowire in situ in the TEM using two different local heating methods. Following the reaction interface of the intrusion of Al in the Ge nanowire shows that at temperatures between 250 and 330°C the position of the interface as a function of time is well fitted by a square root function, indicating that the reaction rate is limited by a diffusion process. Combining both chemical analysis and electron diffraction we find that the Ge of the nanowire core is completely exchanged by the entering Al atoms that form a monocrystalline nanowire with the usual face-centered cubic structure of Al, where the nanowire dimensions are inherited from the initial Ge nanowire. Model-based chemical mapping by energy dispersive X-ray spectroscopy (EDX) characterization reveals the three-dimensional chemical cross-section of the transformed nanowire with an Al core, surrounded by a thin pure Ge (∼2 nm), Al 2 O 3 (∼3 nm), and Ge containing Al 2 O 3 (∼1 nm) layer, respectively. The presence of Ge containing shells around the Al core indicates that Ge diffuses back into the metal reservoir by surface diffusion, which was confirmed by the detection of Ge atoms in the Al metal line by EDX analysis. Fitting a diffusion equation to the kinetic data allows the extraction of the diffusion coefficient at two different temperatures, which shows a good agreement with diffusion coefficients from literature for self-diffusion of Al

Micro-sized thin-film solar cells via area-selective electrochemical deposition for concentrator photovoltaics application.

Micro-concentrator solar cells enable higher power conversion efficiencies and material savings when compared to large-area non-concentrated solar cells. In this study, we use materials-efficient area-selective electrodeposition of the metallic elements, coupled with selenium reactive annealing, to form Cu(In,Ga)Se2 semiconductor absorber layers in patterned microelectrode arrays. This process achieves significant material savings of the low-abundance elements. The resulting copper-poor micro-absorber layers' composition and homogeneity depend on the deposition charge, where higher charge leads to greater inhomogeneity in the Cu/In ratio and to a patchy presence of a CuIn5Se8 OVC phase. Photovoltaic devices show open-circuit voltages of up to 525 mV under a concentration factor of 18 ×, which is larger than other reported Cu(In,Ga)Se2 micro-solar cells fabricated by materials-efficient methods. Furthermore, a single micro-solar cell device, measured under light concentration, displayed a power conversion efficiency of 5% under a concentration factor of 33 ×. These results show the potential of the presented method to assemble micro-concentrator photovoltaic devices, which operate at higher efficiencies while using light concentration

Imaging At the Timescale Of Micro- and Milliseconds With the pnCCD (S)TEM Camera

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