Facet recovery and light emission from GaN/InGaN/GaN core-shell structures grown by metal organic vapour phase epitaxy on etched GaN nanorod arrays

The use of etched nanorods from a planar template as a growth scaffold for a highly regular GaN/InGaN/GaN core-shell structure is demonstrated. The recovery of m-plane non-polar facets from etched high-aspect-ratio GaN nanorods is studied with and without the introduction of a hydrogen silsesquioxane passivation layer at the bottom of the etched nanorod arrays. This layer successfully prevented c-plane growth between the nanorods, resulting in vertical nanorod sidewalls (∼89.8°) and a more regular height distribution than re-growth on unpassivated nanorods. The height variation on passivated nanorods is solely determined by the uniformity of nanorod diameter, which degrades with increased growth duration. Facet-dependent indium incorporation of GaN/InGaN/GaN core-shell layers regrown onto the etched nanorods is observed by high-resolution cathodoluminescence imaging. Sharp features corresponding to diffracted wave-guide modes in angle-resolved photoluminescence measurements are evidence of the uniformity of the full core-shell structure grown on ordered etched nanorods

Quantum well engineering in InGaN/GaN core-shell nanorod structures

We report the ability to control relative InN incorporation in InGaN/GaN quantum wells (QWs) grown on the semi-polar and non-polar facets of a core-shell nanorod LED structure by varying the growth conditions. A study of the cathodoluminescence emitted from series of structures with different growth temperatures and pressures for the InGaN QW layer revealed that increasing the growth pressure had the effect of increasing InN incorporation on the semi-polar facets, while increasing the growth temperature improves the uniformity of light emission from the QWs on the non-polar facets.</p

Quantum well engineering in InGaN/GaN core-shell nanorod structures

We report the ability to control relative InN incorporation in InGaN/GaN quantum wells (QWs) grown on the semi-polar and non-polar facets of a core-shell nanorod LED structure by varying the growth conditions. A study of the cathodoluminescence emitted from series of structures with different growth temperatures and pressures for the InGaN QW layer revealed that increasing the growth pressure had the effect of increasing InN incorporation on the semi-polar facets, while increasing the growth temperature improves the uniformity of light emission from the QWs on the non-polar facets

Structural and optical emission uniformity of m-plane InGaN single quantum wells in core-shell nanorods

Controlling the long-range homogeneity of core-shell InGaN/GaN layers is essential for their use in light-emitting devices. This paper demonstrates variations in optical emission energy as low as ~7 meV.µm-1 along the m-plane facets from core-shell InGaN/GaN single quantum wells as measured through high-resolution cathodoluminescence hyperspectral imaging. The layers were grown by metal organic vapor phase epitaxy on etched GaN nanorod arrays with a pitch of 2 µm. High-resolution transmission electron microscopy and spatially-resolved energy-dispersive X-ray spectroscopy measurements demonstrate a long-range InN-content and thickness homogeneity along the entire 1.2 μm length of the m-plane. Such homogeneous emission was found on the m-plane despite the observation of short range compositional fluctuations in the InGaN single quantum well. The ability to achieve this uniform optical emission from InGaN/GaN core-shell layers is critical to enable them to compete with and replace conventional planar light-emitting devices

Polarization dependent infrared reflectivity studies of Si-doped MOCVD grown GaN/Sapphire epilayers

Comprehensive experimental and theoretical studies are reported on the infrared reflectance (IRR)/transmittance (IRT) spectra to empathize the vibrational and structural properties of Si-doped GaN films grown on sapphire substrate using metal-organic chemical vapor deposition technique. Systematic analysis of the IRR/IRT spectra is achieved in the framework of a 4 × 4 transfer matrix methodology by meticulously including both the surface roughness and effective transition layer. With careful simulations, we have demonstrated that it is possible to achieve a very good fit to the polarization dependent reflectivity spectra of Si-doped GaN/Sapphire – allowing to ascertain film thickness d, charge carrier concentration N, root-mean squared roughness and many other parameters. In the context of Berreman effect, our investigations of IRT spectra for an ultrathin Si-doped GaN film in the oblique geometry has provided a direct evidence of identifying the optical phonons and coupled plasmon-longitudinal-optical phonon modes, in good agreement with the IRR and Raman scattering spectroscopy (RSS) data. From these results, we strongly believe that the measurements of IRT spectra in obliquely incident radiation should be considered as a complementary tool to the RSS for epitomizing doped III-Ns and/or any other ultrathin films of technologically important compound semiconductor materials