Implémentation de PCM (Process Compact Models) pour l’étude et l’amélioration de la variabilité des technologies CMOS FDSOI avancées

Recently, the race for miniaturization has seen its growth slow because of technological challenges it entails. These barriers include the increasing impact of the local variability and processes from the increasing complexity of the manufacturing process and miniaturization, in addition to the difficult of reducing the channel length. To address these challenges, new architectures, very different from the traditional one (bulk), have been proposed. However these new architectures require more effort to be industrialized. Increasing complexity and development time require larger financial investments. In fact there is a real need to improve the development and optimization of devices. This work gives some tips in order to achieve these goals. The idea to address the problem is to reduce the number of trials required to find the optimal manufacturing process. The optimal process is one that results in a device whose performance and dispersion reach the predefined aims. The idea developed in this thesis is to combine TCAD tool and compact models in order to build and calibrate what is called PCM (Process Compact Model). PCM is an analytical model that establishes linkages between process and electrical parameters of the MOSFET. It takes both the benefits of TCAD (since it connects directly to the process parameters electrical parameters) and compact (since the model is analytic and therefore faster to calculate). A sufficiently robust predictive and PCM can be used to optimize performance and overall variability of the transistor through an appropriate optimization algorithm. This approach is different from traditional development methods that rely heavily on scientific expertise and successive tests in order to improve the system. Indeed this approach provides a deterministic and robust mathematical framework to the problem. The concept was developed, tested and applied to transistors 28 and 14 nm FD-SOI and to TCAD simulations. The results are presented and recommendations to implement it at industrial scale are provided. Some perspectives and applications are likewise suggested.Récemment, la course à la miniaturisation a vue sa progression ralentir à cause des défis technologiques qu’elle implique. Parmi ces obstacles, on trouve l’impact croissant de la variabilité local et process émanant de la complexité croissante du processus de fabrication et de la miniaturisation, en plus de la difficulté à réduire la longueur du canal. Afin de relever ces défis, de nouvelles architectures, très différentes de celle traditionnelle (bulk), ont été proposées. Cependant ces nouvelles architectures demandent plus d’efforts pour être industrialisées. L’augmentation de la complexité et du temps de développement requièrent de plus gros investissements financier. De fait il existe un besoin réel d’améliorer le développement et l’optimisation des dispositifs. Ce travail donne quelques pistes dans le but d’atteindre ces objectifs. L’idée, pour répondre au problème, est de réduire le nombre d’essai nécessaire pour trouver le processus de fabrication optimal. Le processus optimal est celui qui conduit à un dispositif dont les performances et leur dispersion atteignent les objectifs prédéfinis. L’idée développée dans cette thèse est de combiner l’outil TCAD et les modèles compacts dans le but de construire et calibrer ce que l’on appelle un PCM (Process Compact Model). Un PCM est un modèle analytique qui établit les liens entre les paramètres process et électriques du MOSFET. Il tire à la fois les bénéfices de la TCAD (puisqu’il relie directement les paramètres process aux paramètres électriques) et du modèle compact (puisque le modèle est analytique et donc rapide à calculer). Un PCM suffisamment prédictif et robuste peut être utilisé pour optimiser les performances et la variabilité globale du transistor grâce à un algorithme d’optimisation approprié. Cette approche est différente des méthodes de développement classiques qui font largement appel à l’expertise scientifique et à des essais successifs dans le but d’améliorer le dispositif. En effet cette approche apporte un cadre mathématique déterministe et robuste au problème.Le concept a été développé, testé et appliqué aux transistors 28 et 14 nm FD-SOI ainsi qu’aux simulations TCAD. Les résultats sont exposés ainsi que les recommandations nécessaires pour implémenter la technique à échelle industrielle. Certaines perspectives et applications sont de même suggérées

White organic light-emitting diodes with an ultra-thin premixed emitting layer

We described an approach to achieve fine color control of fluorescent White Organic Light-Emitting Diodes (OLED), based on an Ultra-thin Premixed emitting Layer (UPL). The UPL consists of a mixture of two dyes (red-emitting 4-di(4'-tert-butylbiphenyl-4-yl)amino-4'-dicyanovinylbenzene or fvin and green-emitting 4-di(4'-tert-butylbiphenyl-4-yl)aminobenzaldehyde or fcho) premixed in a single evaporation cell: since these two molecules have comparable structures and similar melting temperatures, a blend can be evaporated, giving rise to thin films of identical and reproducible composition compared to those of the pre-mixture. The principle of fine color tuning is demonstrated by evaporating a 1-nm-thick layer of this blend within the hole-transport layer (4,4'-bis[N-(1-naphtyl)-N-phenylamino]biphenyl (\alpha-NPB)) of a standard fluorescent OLED structure. Upon playing on the position of the UPL inside the hole-transport layer, as well as on the premix composition, two independent parameters are available to finely control the emitted color. Combined with blue emission from the heterojunction, white light with Commission Internationale de l'Eclairage 1931 color coordinates (0.34, 0.34) was obtained, with excellent color stability with the injected current. The spectrum reveals that the fcho material does not emit light due to efficient energy transfer to the red-emitting fvin compound but plays the role of a host matrix for fvin, allowing for a very precise adjustment of the red dopant amount in the device

Operating mechanism of the organic metal-semiconductor field-effect transistor (OMESFET)

International audienceOrganic metal-semiconductor field-effect transistors (OMESFETs) were fabricated with a polycrystalline organic semiconductor (pentacene) and characterized in order to systematically analyze their operation mechanism. Impedance measurements confirmed full depletion of the thick pentacene film (1 μm) due to the low doping concentration of unintentional doping (typically less than 10^14 cm^−3). The necessity of developing a specific device model for OMESFET is emphasized as the classical (inorganic) MESFET theory based on the depletion modulation is not applicable to a fully-depleted organic semiconductor. By means of joint electrical measurements and numerical simulation, it is pointed out that the gate voltage controls the bulk distribution of injected carriers, so that the competition between the gate and drain currents is critical for determining the operation mode. Finally, the geometrical effect is investigated with comparing a number of transistors with various channel widths and lengths

Prevalence and abundance of lactic acid bacteria in raw milk associated with forage types in dairy cow feeding

Lactic acid bacteria (LAB) found in milk can be responsible for organoleptic defects in cheese. In order to identify the source of LAB thatcouldpotentiallydevelop during cheesemaking, we evaluated theirprevalence and abundanceinmilk according to thetype of forage usedin dairy cow feeding. Foragesand bulk tank milk were sampled three times on 24farms using either hay alone (control), or grass or legume silagesupplemented or not with corn silage. Both types of silageswere either noninoculated, orinoculated with commercial preparations containing at least a Lactobacillus buchneristrainalong with Lactobacillus casei, Lactobacillus plantarum, Enterococcus faecium,or Pediococcus pentosaceus. Our resultsindicate that LAB viable counts in milksamples (2.56log cfu/mL) did not differaccording to the type of forage used. A total of 1239 LAB were isolated and identified by partial 16S rRNA gene sequencing. Although inoculation increased lactobacilli abundance in grass silage by 35%, we did not observe an effect on the LAB profile of milk. Indeed, there was no significant difference in milk LAB prevalence and abundanceaccording tothe type of forage(P >0.05). Moreover, isolates belonging to the L.buchnerigroup wererarely found in bulk tank milk (3/481isolates). Random amplified polymorphic DNA typing of 406LAB isolates revealed theplausibletransfer of some strains from silage to milk (~6%). Thus, forage is only a minor contributor to LAB contamination of milk

Capacitive behavior of pentacene-based diodes: Quasistatic dielectric constant and dielectric strength

International audienceThe capacitive behavior of pentacene films was investigated in the metal-semiconductor-metal (MSM) diode structure. Impedance analysis of diodes with a thick pentacene layer up to 1012 nm showed a full depletion of the organic layer. This observation allowed us to regard the MSM diode as a parallel-plate capacitor in the reverse-bias regime without current flow. Under forward-bias, the diode was evaluated through frequency-dependent impedance measurements by using an equivalent circuit composed of a single parallel resistance-capacitance circuit. The analysis of the data in both the reverse and forward bias regime led us to electrical methods for quantifying dielectric properties of pentacene

Flexible organic–inorganic hybrid layer encapsulation for organic opto-electronic devices

In this work we produce and study the flexible organic–inorganic hybrid moisture barrier layers for the protection of air sensitive organic opto-electronic devices. The inorganic amorphous silicon nitride layer (SiNx:H) and the organic PMMA [poly (methyl methacrylate)] layer are deposited alternatingly by using hot wire chemical vapor deposition (HW-CVD) and spin-coating techniques, respectively. The effect of organic–inorganic hybrid interfaces is analyzed for increasing number of interfaces. We produce highly transparent (∼80% in the visible region) hybrid structures. The morphological properties are analysed providing a good basis for understanding the variation of the water vapor transmission rate (WVTR) values. A minimum WVTR of 4.5 × 10−5g/m2day is reported at the ambient atmospheric conditions for 7 organic/inorganic interfaces. The hybrid barriers show superb mechanical flexibility which confirms their high potential for flexible applications.The authors would like to thank Dr. J.C. Vanel for help in electrical characterizations used in this study. The first author (S.M) acknowledges the financial support from Direction des Relations Extérieures, Ecole Polytechnique during his thesis

Influence of low energy argon plasma treatment on the moisture barrier performance of hot wire-CVD grown SiNx multilayers

The reliability and stability are key issues for the commercial utilization of organic photovoltaic devices based on flexible polymer substrates. To increase the shelf-lifetime of these devices, transparent moisture barriers of silicon nitride (SiNx) films are deposited at low temperature by hot wire CVD (HW-CVD) process. Instead of the conventional route based on organic/inorganic hybrid structures, this work defines a new route consisting in depositing multilayer stacks of SiNx thin films, each single layer being treated by argon plasma. The plasma treatment allows creating smoother surface and surface atom rearrangement. We define a critical thickness of the single layer film and focus our attention on the effect of increasing the number of SiNx single-layers on the barrier properties. A water vapor transmission rate (WVTR) of 2 x 10-4 g/(m2 day) is reported for SiNx multilayer stack and a physical interpretation of the plasma treatment effect is given.Direction des Relations Extérieures, Ecole PolytechniquePICS (French–Portuguese No. 5336) projec

Monitoring Scheduling for Home Gateways

International audienceIn simple and monolithic systems such as our current home gateways, monitoring is often overlooked: the home user can only reboot the gateway when there is a problem. In next-generation home gateways, more services will be available (pay-per-view TV, games. . . ) and different actors will provide them. When one service fails, it will be impossible to reboot the gateway without disturbing the other services. We propose a management framework that monitors remote gateways. The framework tests response times for various management activities on the gateway, and provides reference time/performance ratios. The values can be used to establish a management schedule that balances the rate at which queries can be performed with the resulting load that the query will induce locally on the gateway. This allows the manager to tune the ratio between the reactivity of monitoring and its intrusiveness on performance