Trap-assisted tunnelling and Shockley-Read-Hall lifetime of extended defects in In.53Ga.47As p+n junction

Several In.53Ga.47As p+n junctions with various extended defect densities (EDDs) have been grown by metalorganic vapor phase epitaxy (MOVPE), by carefully controlling the growth conditions. After fabrication, T-dependent J-V, C-V and double DLTS (DDLTS) are performed to extract the electrical field dependence of the extended defect levels. From this characterization, it is derived that the extended defects dominate the electrical field enhancement factor Gamma regardless of the value of the EDD and significantly increases the leakage current under reverse bias (i.e., decrease the Shockley-Read-Hall lifetime). These impacts are strongly connected to a "band-like" density of states of extended defects E2 at E-C-0.32 eV by comparing the DDLTS and T-dependent J-V characteristics. On the other hand, the reference sample (without EDs) surprisingly exhibits an even stronger field dependence with lower leakage current. Nevertheless, no straightforward candidate point defects can be found in this sample and the possible explanation are discussed

Quotient probabilistic normed spaces and completeness results

Quotient spaces of probabilistic normed spaces have never been considered. This note is a first attempt to fill this gap: the quotient space of a PN space with respect to one of its subspaces is introduced and its properties are studied. Finally, we investigate the completeness relationship among the PN spaces considered

Lifetime enhanced transport in silicon due to spin and valley blockade

We report the observation of Lifetime Enhanced Transport (LET) based on perpendicular valleys in silicon by transport spectroscopy measurements of a two-electron system in a silicon transistor. The LET is manifested as a peculiar current step in the stability diagram due to a forbidden transition between an excited state and any of the lower energy states due perpendicular valley (and spin) configurations, offering an additional current path. By employing a detailed temperature dependence study in combination with a rate equation model, we estimate the lifetime of this particular state to exceed 48 ns. The two-electron spin-valley configurations of all relevant confined quantum states in our device were obtained by a large-scale atomistic tight-binding simulation. The LET acts as a signature of the complicated valley physics in silicon; a feature that becomes increasingly important in silicon quantum devices.Comment: 4 pages, 4 figures. (The current version (v3) is the result of splitting up the previous version (v2), and has been completely rewritten

Level Spectrum of Single Gated As Donors

We study the electrical transport through single As donors incorporated in the channel of a FinFET, i.e. a donor in a three-terminal geometry. By means of spectroscopic measurements in conjuction with a NEMO-3D model, we can identify the excited states and associate them with either the donors Coulomb potential, a triangular well at the interface or a hybridized combination of the two. The correspondence between the transport measurements, the theoretical model and the local environment provides an atomic understanding of actual gated donors in a nanostructure

A hybrid double-dot in silicon

We report electrical measurements of a single arsenic dopant atom in the tunnel-barrier of a silicon SET. As well as performing electrical characterization of the individual dopant, we study series electrical transport through the dopant and SET. We measure the triple points of this hybrid double dot, using simulations to support our results, and show that we can tune the electrostatic coupling between the two sub-systems.Comment: 11 pages, 6 figure

Stark tuning of the charge states of a two-donor molecule in silicon

Gate control of phosphorus donor based charge qubits in Si is investigated using a tight-binding approach. Excited molecular states of P2+ are found to impose limits on the allowed donor separations and operating gate voltages. The effects of surface (S) and barrier (B) gates are analyzed in various voltage regimes with respect to the quantum confined states of the whole device. Effects such as interface ionization, saturation of the tunnel coupling, sensitivity to donor and gate placement are also studied. It is found that realistic gate control is smooth for any donor separation, although at certain donor orientations the S and B gates may get switched in functionality. This paper outlines and analyzes the various issues that are of importance in practical control of such donor molecular systems.Comment: 8 pages, 9 figure

AC NBTI of Ge pMOSFETs: Impact of Energy Alternating Defects on Lifetime Prediction

For the first time, AC lifetime in Si-cap/Ge and GeO2/Ge pMOSFETs is investigated and it must not be predicted by the conventional DC stress method with a measurement delay. This is because the energy alternating defects are generated in Ge devices but not in Si, which introduces additional generation under DC stress

ESD characterization of planar InGaAs devices

We present a comprehensive study of ESD reliability (TLP) on planar nMOSFETs with In0.53Ga0.47As as the channel material. Two types of traps are found during ESD stress. They are formed through independent mechanisms: transient Ef-lowering induced pre-existing e-traps discharging in the gate stack and hot hole induced e-traps generation through impact ionization in the InP buffer. These two types of traps explain the observed walk-out of off-state channel leakage current as well as the two-stage current conduction phenomena in the TLP measurement. The generated e-traps are permanent and can introduce detrimental conduction current harmful to the device performance. By properly selecting the buffer material, these defects can be removed

Electric field reduced charging energies and two-electron bound excited states of single donors in silicon

We present atomistic simulations of the D0 to D- charging energies of a gated donor in silicon as a function of applied fields and donor depths and find good agreement with experimental measure- ments. A self-consistent field large-scale tight-binding method is used to compute the D- binding energies with a domain of over 1.4 million atoms, taking into account the full bandstructure of the host, applied fields, and interfaces. An applied field pulls the loosely bound D- electron towards the interface and reduces the charging energy significantly below the bulk values. This enables formation of bound excited D-states in these gated donors, in contrast to bulk donors. A detailed quantitative comparison of the charging energies with transport spectroscopy measurements with multiple samples of arsenic donors in ultra-scaled FinFETs validates the model results and provides physical insights. We also report measured D-data showing for the first time the presence of bound D-excited states under applied fields