Sputtered TiN thin films for improved corrosion resistance

The general corrosion characteristics of TiN thin films deposited onto type 304 and 316 stainless steel by RF sputtering from a compound TiN target was investigated. In general, TiN film morphology and stoichiometry can vary considerably from film to film depending on deposition parameters and thus can play a major role in the corrosion behaviors of these films. Parametric models of the sputtering process were developed using statistial methods for design and analysis and studying the influence of a combination of variables on the properties of the TiN. The process parameters included RF power, N2 partial presure, total gas pressure, substrate temperature and bias. A number of optimum conditions based on different responses were selected and corrosion testing of these films was carried out potentiostatically in 0.1N HCI and 0.1M NaCl solutions at 25°C. © 1991

Direito privado e contemporaneidade: desafios e perspectivas do direito privado no século XXI: volume II

- Divulgação dos SUMÁRIOS das obras recentemente incorporadas ao acervo da Biblioteca Ministro Oscar Saraiva do STJ. Em respeito à Lei de Direitos Autorais, não disponibilizamos a obra na íntegra.- Localização na estante: 347 D598p- Felipe Peixoto Braga Netto e Michael César Silva são os organizadores da obra