Study of the characteristics current-voltage and capacitance-voltage in nitride GaAs Schottky diode

This article reports the study of Au/GaN/GaAs Schottky diodes, where the thin GaN film is prepared by nitridation of GaAs substrates with thicknesses of 0.7 and 0.8 nm. The resulting GaN sample with thickness 0.8 nm is then treated with an annealing operation (heating to 620 °C) to improve the current transport. The current-voltage (I-V) and capacitance-voltage (C-V) of the Au/GaN/GaAs structures were investigated at room temperature. In fact, the I-V characteristics show that the annealed sample has low series resistance (Rs) and ideality factor (n) (63 Ω, 2.27 respectively) when compared to the values obtained in the untreated sample (1.83 kΩ, 3.31 respectively). The formation of the GaN layer on the gallium arsenide surface is investigated through calculation of the interface state density NSS with and without the presence of series resistance Rs. The value of the interface state density NSS(E) close to the mid-gap was estimated to be in the order of 4.7×1012 cm-2 eV-1 and 1.02× 1013 cm-2 eV-1 with and without the annealing operation, respectively. However, nitridation with the annealing operation at 620 °C improves the electrical properties of the resultant Schottky diode

Моделювання анормальної поведінки діода Шотткі на основі 6H-SiC за допомогою функції Ламберта

Проведено електричне дослідження Ni i Ti металевих контактів Шотткі на епітаксійних шарах n-6H-SiC методом вольт-амперної характеристики. Ni/6H-SiC демонструє неоднорідну поведінку висоти бар'єру. Модель термоелектронної емісії поєднується з функцією Ламберта, щоб отримати явну форму рівняння Шотткі, а також визначити кількість гілок, необхідних для моделювання аномальної поведінки. Неоднорідну висоту бар'єру для досліджуваного переходу Ni/6H-SiC можна відтворити за допомогою моделі, що включає дві гілки Шотткі, які дають низький (L) і високий (H) бар'єри Шотткі ( L ϕbn = 0,92 еВ; H ϕbn = 1,56 еВ), а також низький і високий коефіцієнти ідеальності (nL = 1,93; nH = 1,23).Electrical study of Ni and Ti metals of Schottky contacts on n-6H-SiC epitaxial layers is performed, by current-voltage (I-V) characterization. Ni/6H-SiC shows inhomogeneous barrier height behavior. Thermionic emission model is coupled with the Lambert function to obtain an explicit form of the Schottky equation as well as to specify the number of branches necessary for modeling the abnormal behavior. The inhomogeneous barrier height for the investigated Ni/6H-SiC junction can be reproduced by a model that includes two Schottky branches, which give a low (L) and a high (H) Schottky barriers ( L ϕbn = 0.92 eV, H ϕbn = 1.56 eV), as well as give a low and a high ideality factors (nL = 1.93, nH = 1.23)

Comparative study of ionic bombardment and heat treatment on the electrical behavior of Au/GaN/n-GaAs Schottky diodes

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Effect of metallic contacts diffusion on Au/GaAs and Au/GaN/GaAs SBDs electrical quality during their fabrication process

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Abstracts of 1st International Conference on Computational & Applied Physics

This book contains the abstracts of the papers presented at the International Conference on Computational & Applied Physics (ICCAP’2021) Organized by the Surfaces, Interfaces and Thin Films Laboratory (LASICOM), Department of Physics, Faculty of Science, University Saad Dahleb Blida 1, Algeria, held on 26–28 September 2021. The Conference had a variety of Plenary Lectures, Oral sessions, and E-Poster Presentations. Conference Title: 1st International Conference on Computational & Applied PhysicsConference Acronym: ICCAP’2021Conference Date: 26–28 September 2021Conference Location: Online (Virtual Conference)Conference Organizer: Surfaces, Interfaces, and Thin Films Laboratory (LASICOM), Department of Physics, Faculty of Science, University Saad Dahleb Blida 1, Algeria