272 research outputs found

    Acta zoologica Fennica 70

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    Promoting self-regulated learning in preschoolers

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    Self-regulated learning (SRL) is important for a person's school career and their later academic success, and it should therefore be fostered as early as possible. Nevertheless, research focusing on the promotion of SRL in preschoolers is limited. The present study aims to examine the efficacy of an SRL intervention based on a longitudinal control-group-design for preschoolers (direct-level intervention) and their kindergarten teachers (indirect-level intervention). The SRL intervention took place in either a) an autonomous learning environment, where SRL learning strategies were practiced with no special focus on the stimulation of communicative abilities or b) in a social-interactive learning environment, where SRL learning strategies were practiced while communicative abilities were stimulated. The sample consisted of 189 preschoolers (49.5% ♀, 50.5% ♂, mean age: 5.6 years, SD = .47 years) and 30 kindergarten teachers. SRL and general self-regulation ability (gSR) served as performance measures. The results of the paired t-tests revealed an increase in SRL and gSR for preschoolers irrespective of the condition, while a group-differential intervention benefit for preschoolers (i.e. direct-autonomous or direct-interactive intervention) could not be confirmed by the applied repeated measures ANOVA and contrast analyses. Further, we did not find any substantial benefit from teacher intervention (i.e. indirect intervention) analysed by non-parametric Wilcoxon test. This unexpected result is discussed in light of methodical considerations. Nevertheless, the study provides important implications for future intervention studies.&nbsp

    Bias-voltage photoconductance and photoluminescence for the determination of silicon-dielectric interface properties in SiO2/Al2O3 stacks

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    This paper presents an advanced measurement method for controlling the surface charge carrier density of passivated silicon wafers during photoconductance and photoluminescence measurements, by employing semitransparent poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) electrodes with an applied bias voltage. This is employed to study and analyze charge carrier dynamics in dielectric layers by measuring their direct influence on effective lifetime. With this method, the carrier population at the surface and the effective carrier lifetimes of n- and p-type samples can be investigated, from which the fixed charge carrier density Qf of the passivation can be extracted. Additionally, the defect density Dit can also be derived from the minimum lifetime values at flatband voltage. In SiO2/Al2O3 stacks with varying SiO2 interlayer thickness, it was shown that by changing the SiO2 thickness, the carrier density Qf can be tuned to a wide range of values, which corresponds to the results obtained in other studies. An increase in interlayer thickness resulted in a decrease in Qf. Varying the SiO2 thickness, the behavior of the respective effective lifetime under bias voltage also changes, exhibiting hysteresis-like effects, which are attributed to additional charges getting trapped at the surface during bias-voltage application. This effect is much more pronounced for samples with a thinner SiO2 layer as well as for the n-type samples. Additionally, the doping type also influences the magnitude of Qf, with p-type samples generally reaching lower absolute values. It was also shown that aging of the samples had a significant effect on the measured Qf, which was increased compared to the initial Qf of the passivation. This effect was more pronounced for the n-type samples. The measurements were realized by a cost-effective and easy-to-use microcontroller-based potentiostat, which can be used as a simple add-on to existing photoconductance or photoluminescence measurement setups

    Diffractive Backside Structures via Nanoimprint Lithography

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    AbstractFor decreasing thicknesses of wafer based silicon solar cells, photon management structures to maintain high quantum efficiencies will gain importance. Diffractive gratings on the wafer back side can be designed to achieve very high path length enhancements, especially for weakly absorbed infrared radiation. This technologically demanding concept has to be realised using processes with upscaling potential. Therefore, we present a fabrication process for producing photonic structures in silicon based on interference lithography and nanoimprint lithography (NIL).We realised linear as well as crossed gratings of different depths, which were etched into the wafer back side. Polarisation dependent reflection measurements were made to get information about potential absorption enhancement as well as the occurrence of parasitic absorption in the metal reflector. This is conducted for a PECVD silicon oxide buffer layer between grating and reflector as well as a spin coated silicon oxide layer. Besides these optical characterisations, we further investigated the electrical properties of the back surface, where we applied a concept in which electrical and optical properties are decoupled. This is realised by a layer stack on the wafer back side, consisting of a thin Al2O3 passivation and a doped amorphous silicon layer

    N-type Black Silicon Solar Cells

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    Black silicon is an interesting surface texture for solar cells because of its extremely low reflectance on a wide wavelength range and acceptance angle. In this paper we present how black silicon (b-Si) texturization can be applied on the boron doped front surface of an n-type solar cell resulting in an efficiency of 18.7%. We show that the highly boron doped emitter can be formed on black silicon without losing its good optical properties and that atomic layer deposited aluminum oxide provides good surface passivation on these boron doped b-Si emitters.Peer reviewe

    Passivation of black silicon boron emitters with atomic layer deposited aluminum oxide

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    The nanostructured surface – also called black silicon (b-Si) – is a promising texture for solar cells because of its extremely low reflectance combined with low surface recombination obtained with atomic layer deposited (ALD) thin films. However, the challenges in keeping the excellent optical properties and passivation in further processing have not been addressed before. Here we study especially the applicability of the ALD passivation on highly boron doped emitters that is present in crystalline silicon solar cells. The results show that the nanostructured boron emitters can be passivated efficiently using ALD Al2O3 reaching emitter saturation current densities as low as 51 fA/cm2. Furthermore, reflectance values less than 0.5% after processing show that the different process steps are not detrimental for the low reflectance of b-Si.Peer reviewe

    Full-Wafer Roller-NIL Processes for Silicon Solar Cell Texturisation

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    The highest solar cell efficiencies both for c-Si and mc-Si were reached using template based texturing processes. Especially for mc-Si the benefit of a defined texture, the so called honeycomb texture, was demonstrated impressively. However, up until now, no industrially feasible process has been available to pattern the necessary etching masks with the sufficient resolution. Roller-Nanoimprint Lithography (Roller-NIL) has the potential to overcome these limitations and to allow high quality pattern transfers, even in the sub-micron regime, in continuous in-line processes. Therefore, this etch-mask patterning technique is a suitable solution to bring such elaborate features like the honeycomb texture to an industrial realization. Beyond that, this fast printing-like technology opens up new possibilities to introduce promising concepts like photonic structures into solar cells

    Silicon solar cell–integrated stress and temperature sensors for photovoltaic modules

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    We propose silicon solar cell–integrated stress and temperature sensors as a new approach for the stress and temperature measurement in photovoltaic (PV) modules. The solar cell–integrated sensors enable a direct and continuous in situ measurement of mechanical stress and temperature of solar cells within PV modules. In this work, we present a proof of concept for stress and temperature sensors on a silicon solar cell wafer. Both sensors were tested in a conventional PV module setup. For the stress sensor, a sensitivity of (−47.41 ± 0.14)%/GPa has been reached, and for the temperature sensor, a sensitivity of (3.557 ± 0.008) × 10−3^{-3} K−1^{-1} has been reached. These sensors can already be used in research for increased measurement accuracy of the temperature and the mechanical stress in PV modules because of the implementation at the precise location of the solar cells within a laminate stack, for process evaluation, in‐situ measurements in reliability tests, and the correlation with real exposure to climates

    Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

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    Light trapping is becoming of increasing importance in crystalline silicon solar cells as thinner wafers are used to reduce costs. In this work, we report on light trapping by rear-side diffraction gratings produced by nano-imprint lithography using interference lithography as the mastering technology. Gratings fabricated on crystalline silicon wafers are shown to provide significant absorption enhancements. Through a combination of optical measurement and simulation, it is shown that the crossed grating provides better absorption enhancement than the linear grating, and that the parasitic reflector absorption is reduced by planarizing the rear reflector, leading to an increase in the useful absorption in the silicon. Finally, electro-optical simulations are performed of solar cells employing the fabricated grating structures to estimate efficiency enhancement potential
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