Cross-Layer Resiliency Modeling and Optimization: A Device to Circuit Approach

The never ending demand for higher performance and lower power consumption pushes the VLSI industry to further scale the technology down. However, further downscaling of technology at nano-scale leads to major challenges. Reduced reliability is one of them, arising from multiple sources e.g. runtime variations, process variation, and transient errors. The objective of this thesis is to tackle unreliability with a cross layer approach from device up to circuit level

IC design for reliability

textAs the feature size of integrated circuits goes down to the nanometer scale, transient and permanent reliability issues are becoming a significant concern for circuit designers. Traditionally, the reliability issues were mostly handled at the device level as a device engineering problem. However, the increasing severity of reliability challenges and higher error rates due to transient upsets favor higher-level design for reliability (DFR). In this work, we develop several methods for DFR at the circuit level. A major source of transient errors is the single event upset (SEU). SEUs are caused by high-energy particles present in the cosmic rays or emitted by radioactive contaminants in the chip packaging materials. When these particles hit a N+/P+ depletion region of an MOS transistor, they may generate a temporary logic fault. Depending on where the MOS transistor is located and what state the circuit is at, an SEU may result in a circuit-level error. We analyze SEUs both in combinational logic and memories (SRAM). For combinational logic circuit, we propose FASER, a Fast Analysis tool of Soft ERror susceptibility for cell-based designs. The efficiency of FASER is achieved through its static and vector-less nature. In order to evaluate the impact of SEU on SRAM, a theory for estimating dynamic noise margins is developed analytically. The results allow predicting the transient error susceptibility of an SRAM cell using a closedform expression. Among the many permanent failure mechanisms that include time-dependent oxide breakdown (TDDB), electro-migration (EM), hot carrier effect (HCE), and negative bias temperature instability (NBTI), NBTI has recently become important. Therefore, the main focus of our work is NBTI. NBTI occurs when the gate of PMOS is negatively biased. The voltage stress across the gate generates interface traps, which degrade the threshold voltage of PMOS. The degraded PMOS may eventually fail to meet timing requirement and cause functional errors. NBTI becomes severe at elevated temperatures. In this dissertation, we propose a NBTI degradation model that takes into account the temperature variation on the chip and gives the accurate estimation of the degraded threshold voltage. In order to account for the degradation of devices, traditional design methods add guard-bands to ensure that the circuit will function properly during its lifetime. However, the worst-case based guard-bands lead to significant penalty in performance. In this dissertation, we propose an effective macromodel-based reliability tracking and management framework, based on a hybrid network of on-chip sensors, consisting of temperature sensors and ring oscillators. The model is concerned specifically with NBTIinduced transistor aging. The key feature of our work, in contrast to the traditional tracking techniques that rely solely on direct measurement of the increase of threshold voltage or circuit delay, is an explicit macromodel which maps operating temperature to circuit degradation (the increase of circuit delay). The macromodel allows for costeffective tracking of reliability using temperature sensors and is also essential for enabling the control loop of the reliability management system. The developed methods improve the over-conservatism of the device-level, worstcase reliability estimation techniques. As the severity of reliability challenges continue to grow with technology scaling, it will become more important for circuit designers/CAD tools to be equipped with the developed methods.Electrical and Computer Engineerin

Charge Collection Physical Modeling for Soft Error Rate Computational Simulation in Digital Circuits

This chapter describes a new computational approach for accurately modeling radiation-induced single-event transient current and charge collection at circuit level. This approach, called random-walk drift-diffusion (RWDD), is a fast Monte Carlo particle method based on a random-walk process that takes into account both diffusion and drift of carriers in a non-constant electric field both in space and time. After introducing the physical insights of the RWDD model, the chapter details the practical implementation of the method using an object-oriented programming language and its parallelization on graphical processing units. Besides, the capability of the approach to treat multiple node charge collection is presented. The chapter also details the coupling of the model either with an internal routine or with SPICE for circuit solving. Finally, the proposed approach is illustrated at device and circuit level, considering four different test vehicles in 65 nm technologies: a stand-alone transistor, a CMOS inverter, a SRAM cell and a flip-flop circuit. RWDD results are compared with data obtained from a full three-dimensional (3D) numerical approach (TCAD simulations) at transistor level. The importance of the circuit feedback on the charge-collection process is also demonstrated for devices connected to other circuit nodes

プレーナーガタオヨビフィンフェットガタエスラムニオケルチジョウホウシャセンキインシングルイベントアップセットニカンスルジッケンテキケンキュウ

T. Kato et al., "Muon-Induced Single-Event Upsets in 20-nm SRAMs: Comparative Characterization With Neutrons and Alpha Particles," in IEEE Transactions on Nuclear Science, vol. 68, no. 7, pp. 1436-1444, July 2021, doi: 10.1109/TNS.2021.3082559

Impact of Bias Temperature Instability on Soft Error Susceptibility

In this paper, we address the issue of analyzing the effects of aging mechanisms on ICs' soft error (SE) susceptibility. In particular, we consider bias temperature instability (BTI), namely negative BTI in pMOS transistors and positive BTI in nMOS transistors that are recognized as the most critical aging mechanisms reducing the reliability of ICs. We show that BTI reduces significantly the critical charge of nodes of combinational circuits during their in-field operation, thus increasing the SE susceptibility of the whole IC. We then propose a time dependent model for SE susceptibility evaluation, enabling the use of adaptive SE hardening approaches, based on the ICs lifetime

Cross-layer Soft Error Analysis and Mitigation at Nanoscale Technologies

This thesis addresses the challenge of soft error modeling and mitigation in nansoscale technology nodes and pushes the state-of-the-art forward by proposing novel modeling, analyze and mitigation techniques. The proposed soft error sensitivity analysis platform accurately models both error generation and propagation starting from a technology dependent device level simulations all the way to workload dependent application level analysis

FPGA‐SRAM Soft Error Radiation Hardening

Due to integrated circuit technology scaling, a type of radiation effects called single event upsets (SEUs) has become a major concern for static random access memories (SRAMs) and thus for SRAM‐based field programmable gate arrays (FPGAs). These radiation effects are characterized by altering data stored in SRAM cells without permanently damaging them. However, SEUs can lead to unpredictable behavior in SRAM‐based FPGAs. A new hardening technique compatible with the current FPGA design workflows is presented. The technique works at the cell design level, and it is based on the modulation of cell transistor channel width. Experimental results show that to properly harden an SRAM cell, only some transistors have to be increased in size, while others need to be minimum sized. So, with this technique, area can be used in the most efficient way to harden SRAMs against radiation. Experimental results on a 65‐nm complementary metal‐oxide‐semiconductor (CMOS) SRAM demonstrate that the number of SEU events can be roughly reduced to 50% with adequate transitory sizing, while area is kept constant or slightly increased

Supply Voltage Dependence of Heavy Ion Induced SEEs on 65nm CMOS Bulk SRAMs

The power consumption of Static Random Access Memory (SRAM) has become an important issue for modern integrated circuit design, considering the fact that they occupy large area and consume significant portion of power consumption in modern nanometer chips. SRAM operating in low power supply voltages has become an effective approach in reducing power consumption. Therefore, it is essential to experimentally characterize the single event effects (SEE) of hardened and unhardened SRAM cells to determine their appropriate applications, especially when a low supply voltage is preferred. In this thesis, a SRAM test chip was designed and fabricated with four cell arrays sharing the same peripheral circuits, including two types of unhardened cells (standard 6T and sub-threshold 10T) and two types of hardened cells (Quatro and DICE). The systems for functional and radiation tests were built up with power supply voltages that ranged from near threshold 0.4 V to normal supply 1 V. The test chip was irradiated with alpha particles and heavy ions with various linear energy transfers (LETs) at different core supply voltages, ranging from 1 V to 0.4 V. Experimental results of the alpha test and heavy ion test were consistent with the results of the simulation. The cross sections of 6T and 10T cells present much more significant sensitivities than Quatro and DICE cells for all tested supply voltages and LET. The 10T cell demonstrates a more optimal radiation performance than the 6T cell when LET is small (0.44 MeV·cm2/mg), yet no significant advantage is evident when LET is larger than this. In regards to the Quatro and DICE cells, one does not consistently show superior performance over the other in terms of soft error rates (SERs). Multi-bit upsets (MBUs) occupy a larger portion of total SEUs in DICE cell when relatively larger LET and smaller supply voltage are applied. It explains the loss in radiation tolerance competition with Quatro cell when LET is bigger than 9.1 MeV·cm2/mg and supply voltage is smaller than 0.6 V. In addition, the analysis of test results also demonstrated that the error amount distributions follow a Poisson distribution very well for each type of cell array

Study of Radiation-Tolerant SRAM Design

Static Random Access Memories (SRAMs) are important storage components and widely used in digital systems. Meanwhile, with the continuous development and progress of aerospace technologies, SRAMs are increasingly used in electronic systems for spacecraft and satellites. Energetic particles in space environments can cause single event upsets normally referred as soft errors in the memories, which can lead to the failure of systems. Nowadays electronics at the ground level also experience this kind of upset mainly due to cosmic neutrons and alpha particles from packaging materials, and the failure rate can be 10 to 100 times higher than the errors from hardware failures. Therefore, it is important to study the single event effects in SRAMs and develop cost-effective techniques to mitigate these errors. The objectives of this thesis are to evaluate the current mitigation techniques of single event effects in SRAMs and develop a radiation-tolerant SRAM based on the developed techniques. Various radiation sources and the mechanism of their respective effects in Complementary Metal-Oxide Semiconductors(CMOS) devices are reviewed first in the thesis. The radiation effects in the SRAMs, specifically single event effects are studied, and various mitigation techniques are evaluated. Error-correcting codes (ECC) are studied in the thesis since they can detect and correct single bit errors in the cell array, and it is a effective method with low overhead in terms of area, speed, and power. Hamming codes are selected and implemented in the design of the SRAM, to protect the cells from single event upsets in the SRAM. The simulation results show they can prevent the single bit errors in the cell arrays with low area and speed overhead. Another important and vulnerable part of SRAMs in radiation environments is the sense amplifier. It may not generate the correct output during the reading operation if it is hit by an energetic particle. A novel fault-tolerant sense amplifier is introduced and validated with simulations. The results showed that the performance of the new design can be more than ten times better than that of the reference design. When combining the SRAM cell arrays protected with ECC and the radiation-tolerant hardened sense amplifiers, the SRAM can achieve high reliability with low speed and area overhead