139 research outputs found

    Multifunctional Magnetoelectric Materials for Device Applications

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    Mutiferroics are a novel class of next generation multifunctional materials, which display simultaneous magnetic spin, electric dipole, and ferroelastic ordering, and have drawn increasing interest due to their multi-functionality for a variety of device applications. Since single-phase materials exist rarely in nature with such cross-coupling properties, an intensive research activity is being pursued towards the discovery of new single-phase multiferroic materials and the design of new engineered materials with strong magneto-electric (ME) coupling. This review article summarizes the development of different kinds of multiferroic material: single-phase and composite ceramic, laminated composite, and nanostructured thin films. Thin-film nanostructures have higher magnitude direct ME coupling values and clear evidence of indirect ME coupling compared with bulk materials. Promising ME coupling coefficients have been reported in laminated composite materials in which signal to noise ratio is good for device fabrication. We describe the possible applications of these materials

    A ferroelectric memristor

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    Memristors are continuously tunable resistors that emulate synapses. Conceptualized in the 1970s, they traditionally operate by voltage-induced displacements of matter, but the mechanism remains controversial. Purely electronic memristors have recently emerged based on well-established physical phenomena with albeit modest resistance changes. Here we demonstrate that voltage-controlled domain configurations in ferroelectric tunnel barriers yield memristive behaviour with resistance variations exceeding two orders of magnitude and a 10 ns operation speed. Using models of ferroelectric-domain nucleation and growth we explain the quasi-continuous resistance variations and derive a simple analytical expression for the memristive effect. Our results suggest new opportunities for ferroelectrics as the hardware basis of future neuromorphic computational architectures

    Lanthanide-assisted deposition of strongly electro-optic PZT thin films on silicon: toward integrated active nanophotonic devices

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    The electro-optical properties of lead zirconate titanate (PZT) thin films depend strongly on the quality and crystallographic orientation of the thin films. We demonstrate a novel method to grow highly textured PZT thin films on silicon using the chemical solution deposition (CSD) process. We report the use of ultrathin (5–15 nm) lanthanide (La, Pr, Nd, Sm) based intermediate layers for obtaining preferentially (100) oriented PZT thin films. X-ray diffraction measurements indicate preferentially oriented intermediate Ln2O2CO3 layers providing an excellent lattice match with the PZT thin films grown on top. The XRD and scanning electron microscopy measurements reveal that the annealed layers are dense, uniform, crack-free and highly oriented (>99.8%) without apparent defects or secondary phases. The EDX and HRTEM characterization confirm that the template layers act as an efficient diffusion barrier and form a sharp interface between the substrate and the PZT. The electrical measurements indicate a dielectric constant of ∼650, low dielectric loss of ∼0.02, coercive field of 70 kV/cm, remnant polarization of 25 μC/cm2, and large breakdown electric field of 1000 kV/cm. Finally, the effective electro-optic coefficients of the films are estimated with a spectroscopic ellipsometer measurement, considering the electric field induced variations in the phase reflectance ratio. The electro-optic measurements reveal excellent linear effective pockels coefficients of 110 to 240 pm/V, which makes the CSD deposited PZT thin film an ideal candidate for Si-based active integrated nanophotonic devices

    Tailoring ferroelectric properties of 0.37BiScO3-0.63PbTiO3 thin films using a multifunctional LaNiO3 interlayer

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    Functional oxide thin films integrated into CMOS technology often exhibit degraded properties with respect to bulk materials because of complex interfacial phenomena. In this contribution, we demonstrate that a sol-gel LaNiO3 (LNO) interlayer deposited onto the surface of a Pt/TiO2/SiO2/Si substrate prior to growth of sol-gel BiScO3-PbTiO3 (BSPT) films acts: i) to seed nucleation of perovskite structured; ii) to template growth to give controlled orientation and enhanced crystallinity and iii) as a sink for oxygen vacancies (VO). The LNO interlayer therefore not only improves the ferroelectric, piezoelectric and dielectric properties but also reduces leakage current and prevents degradation of the remanent polarization during fatigue tests. We propose that the use of a LNO interfacial layer may offer a generic solution to interfacial degradation in functional oxide films

    Evidence for Room-Temperature Weak Ferromagnetic and Ferroelectric Ordering in Magnetoelectric Pb(Fe0.634W0.266Nb0.1)O3 Ceramic

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    We report the evidence of weak ferromagnetic and ferroelectric ordering in polycrystalline Pb(Fe0.634 W0.266Nb0.1)O3 (0.8(PbFe2/3W1/3)O3�0.2Pb(Fe1/2Nb1/2) O3) (PFWN) ceramic at room temperature. The Pb(Fe0.634 W0.266Nb0.1)O3solid solution synthesized through the columbite method. The obtained single-phase Pb(Fe0.634 W0.266Nb0.1)O3ceramic was subjected to X-ray diffraction, neutron diffraction, magnetization, Mössbauer spectroscopy, and ferroelectric measurements. The X-ray diffraction and neutron diffraction pattern confirms the formation of single phase without any traces of pyrochlore phases, having cubic structure with Pm-3m space group. The Rietveld refinements were carried out on both patterns, and ND data confirms the G-type antiferromagnetic structure with propagation vector (k = 1/2, 1/2, and 1/2). However, along with the antiferromagnetic ordering of the Fe spins, we also observed the existence of weak ferromagnetism. This result was confirmed through (i) a clear opening of hysteresis (M � H) loop, (ii) bifurcation of the field-cooled (FC) and zero-field-cooled (ZFC) susceptibilities, (iii) spin-glass behavior, and (iv) Mössbauer spectroscopy. © 2016, Springer Science+Business Media New York

    Improved electrocaloric effect in (100)-oriented Pb0.97La0.02(Zr0.57Sn0.38Ti0.05)O3 antiferroelectric thick film by interface engineering

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    In this work, 1.5-μm Pb0.97La0.02(Zr0.57Sn0.38Ti0.05)O3 antiferroelectric thick films with and without a ZrO2 thin layer were deposited on LaNiO3(100)/Si(100) substrates. The effects of ZrO2 thin layer on the microstructure, electrical properties, and especial electrocaloric effect of the antiferroelectric films were studied in detail. Although the films both with and without ZrO2 buffer layer displayed (100)-preferred orientation, possessed dense and uniform surface microstructure, the ZrO2-buffered films have an enlarged grain size by 27%, compared with the thick films without the buffer layer. Accordingly, the dielectric constant and saturate polarization of this antiferroelectric thick films was improved by the insertion of ZrO2 thin layer, and simultaneously its leakage current was slightly reduced. As a result, a great improvement in cooling character caused by ferroelectric–antiferroelectric phase switching, was realized in the ZrO2-buffered films
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