Analog/RF Circuit Design Techniques for Nanometerscale IC Technologies

CMOS evolution introduces several problems in analog design. Gate-leakage mismatch exceeds conventional matching tolerances requiring active cancellation techniques or alternative architectures. One strategy to deal with the use of lower supply voltages is to operate critical parts at higher supply voltages, by exploiting combinations of thin- and thick-oxide transistors. Alternatively, low voltage circuit techniques are successfully developed. In order to benefit from nanometer scale CMOS technology, more functionality is shifted to the digital domain, including parts of the RF circuits. At the same time, analog control for digital and digital control for analog emerges to deal with current and upcoming imperfections

Silicon on ferroelectric insulator field effect transistor (SOF-FET) a new device for the next generation ultra low power circuits

Title from PDF of title page, viewed on March 12, 2014Thesis advisor: Masud H. ChowdhuryVitaIncludes bibliographical references (pages 116-131)Thesis (M. S.)--School of Computer and Engineering. University of Missouri--Kansas City, 2013Field effect transistors (FETs) are the foundation for all electronic circuits and processors. These devices have progressed massively to touch its final steps in subnanometer level. Left and right proposals are coming to rescue this progress. Emerging nano-electronic devices (resonant tunneling devices, single-atom transistors, spin devices, Heterojunction Transistors rapid flux quantum devices, carbon nanotubes, and nanowire devices) took a vast share of current scientific research. Non-Si electronic materials like III-V heterostructure, ferroelectric, carbon nanotubes (CNTs), and other nanowire based designs are in developing stage to become the core technology of non-classical CMOS structures. FinFET present the current feasible commercial nanotechnology. The scalability and low power dissipation of this device allowed for an extension of silicon based devices. High short channel effect (SCE) immunity presents its major advantage. Multi-gate structure comes to light to improve the gate electrostatic over the channel. The new structure shows a higher performance that made it the first candidate to substitute the conventional MOSFET. The device also shows a future scalability to continue Moor’s Law. Furthermore, the device is compatible with silicon fabrication process. Moreover, the ultra-low-power (ULP) design required a subthreshold slope lower than the thermionic-emission limit of 60mV/ decade (KT/q). This value was unbreakable by the new structure (SOI-FinFET). On the other hand most of the previews proposals show the ability to go beyond this limit. However, those pre-mentioned schemes have publicized a very complicated physics, design difficulties, and process non-compatibility. The objective of this research is to discuss various emerging nano-devices proposed for ultra-low-power designs and their possibilities to replace the silicon devices as the core technology in the future integrated circuit. This thesis proposes a novel design that exploits the concept of negative capacitance. The new field effect transistor (FET) based on ferroelectric insulator named Silicon-On-Ferroelectric Insulator Field Effect Transistor (SOF-FET). This proposal is a promising methodology for future ultra-lowpower applications, because it demonstrates the ability to replace the silicon-bulk based MOSFET, and offers subthreshold swing significantly lower than 60mV/decade and reduced threshold voltage to form a conducting channel. The SOF-FET can also solve the issue of junction leakage (due to the presence of unipolar junction between the top plate of the negative capacitance and the diffused areas that form the transistor source and drain). In this device the charge hungry ferroelectric film already limits the leakage.Abstract -- List of illustrations - List of tables -- Acknowledgements -- Dedication -- Introduction -- Carbon nanotube field effect transistor -- Multi-gate transistors -FinFET -- Subthreshold swing -- Tunneling field effect transistors -- I-mos and nanowire fets -- Ferroelectric based field effect transistors -- An analytical model to approximate the subthreshold swing for soi-finfet -- Silicon-on-ferroelectric insulator field effect transistor (SOF-FET) -- Current-voltage characteristics of sof-fet -- Advantages, manufacturing process and future work of the proposed device -- Appendix -- Reference

A low-power reconfigurable logic array based on double-gate transistors

A fine-grained reconfigurable architecture based on double gate technology is proposed and analyzed. The logic function operating on the first gate of a double-gate (DG) transistor is reconfigured by altering the charge on its second gate. Each cell in the array can act as logic or interconnect, or both, contrasting with current field-programmable gate array structures in which logic and interconnect are built and configured separately. Simulation results are presented for a fully depleted SOI DG-MOSFET implementation and contrasted with two other proposals from the literature based on directed self-assembly

Two dimensional analytical threshold voltage modeling of dual material gate S-SOI mosfet

MOSFET (Metal Oxide Semiconductor Field Effect Transistor) is the one of the most important and widely used semiconductor devices used in industry for various proposes. Two most important advantages of MOSFETs are their extremely low power dissipation and small area required for fabrication, i.e high packing density .With the advance of technology the feature sizes of MOSFETs are reduced continuously to increase the packing density of very large scale integration (VLSI) circuits. With continuous shrinkage of device geometrics on threshold voltage causes strong deviations from long channel behavior. The effect of such decrease in channel length is called SCE (Short channel Effect). A two dimensional Poisson equation needs to be solved in order to understand the effect of SCE.SCE (Short Channel Effect) is the effect of reduction in the channel length of MOSFET which results in significant differences from ideal characteristic like channel length modulation, carrier velocity saturation, two dimensional charge sharing, drain induced barrier lowering (DIBL), drain source series resistance and punch through. In order to minimize the effect of short channel effect various different modeling has been introduced. Among them DG MOSFET (Double Gate MOSFET), SOI MOSFET (Silicon-On Insulator MOSFET) are particularly important. In this thesis, a two dimensional threshold voltage model is developed for a Dual Material Gate Fully Depleted Strained Silicon on Insulator (DMG-FD-S-SOI) MOSFET considering the interface trap charges. The interface trap charges during the pre and post fabrication process are a common phenomenon, and these charges can’t be neglected in nano scale devices. For finding out the surface potential, parabolic approximation is utilized to solve 2D Poisson’s equation in the channel region. Further, the virtual cathode potential method is used to formulate the threshold voltage

DESIGN, COMPACT MODELING AND CHARACTERIZATION OF NANOSCALE DEVICES

Electronic device modeling is a crucial step in the advancement of modern nanotechnology and is gaining more and more interest. Nanoscale complementary metal oxide semiconductor (CMOS) transistors, being the backbone of the electronic industry, are pushed to below 10 nm dimensions using novel manufacturing techniques including extreme lithography. As their dimensions are pushed into such unprecedented limits, their behavior is still captured using models that are decades old. Among many other proposed nanoscale devices, silicon vacuum electron devices are regaining attention due to their presumed advantages in operating at very high power, high speed and under harsh environment, where CMOS cannot compete. Another type of devices that have the potential to complement CMOS transistors are nano-electromechanical systems (NEMS), with potential applications in filters, stable frequency sources, non-volatile memories and reconfigurable and neuromorphic electronics

A polymorphic hardware platform

In the domain of spatial computing, it appears that platforms based on either reconfigurable datapath units or on hybrid microprocessor/logic cell organizations are in the ascendancy as they appear to offer the most efficient means of providing resources across the greatest range of hardware designs. This paper encompasses an initial exploration of an alternative organization. It looks at the effect of using a very fine-grained approach based on a largely undifferentiated logic cell that can be configured to operate as a state element, logic or interconnect - or combinations of all three. A vertical layout style hides the overheads imposed by reconfigurability to an extent where very fine-grained organizations become a viable option. It is demonstrated that the technique can be used to develop building blocks for both synchronous and asynchronous circuits, supporting the development of hybrid architectures such as globally asynchronous, locally synchronous

A Process Variation Tolerant Self-Compensation Sense Amplifier Design

As we move under the aegis of the Moore\u27s law, we have to deal with its darker side with problems like leakage and short channel effects. Once we go beyond 45nm regime process variations also have emerged as a significant design concern.Embedded memories uses sense amplifier for fast sensing and typically, sense amplifiers uses pair of matched transistors in a positive feedback environment. A small difference in voltage level of applied input signals to these matched transistors is amplified and the resulting logic signals are latched. Intra die variation causes mismatch between the sense transistors that should ideally be identical structures. Yield loss due to device and process variations has never been so critical to cause failure in circuits. Due to growth in size of embedded SRAMs as well as usage of sense amplifier based signaling techniques, process variations in sense amplifiers leads to significant loss of yield for that we need to come up with process variation tolerant circuit styles and new devices. In this work impact of transistor mismatch due to process variations on sense amplifier is evaluated and this problem is stated. For the solution of the problem a novel self compensation scheme on sense amplifiers is presented on different technology nodes up to 32nm on conventional bulk MOSFET technology. Our results show that the self compensation technique in the conventional bulk MOSFET latch type sense amplifier not just gives improvement in the yield but also leads to improvement in performance for latch type sense amplifiers. Lithography related CD variations, fluctuations in dopant density, oxide thickness and parametric variations of devices are identified as a major challenge to the classical bulk type MOSFET. With the emerging nanoscale devices, SIA roadmap identifies FinFETs as a candidate for post-planar end-of-roadmap CMOS device. With current technology scaling issues and with conventional bulk type MOSFET on 32nm node our technique can easily be applied to Double Gate devices. In this work, we also develop the model of Double Gate MOSFET through 3D Device Simulator Damocles and TCAD simulator. We propose a FinFET based process variation tolerant sense amplifier design that exploits the back gate of FinFET devices for dynamic compensation against process variations. Results from statistical simulation show that the proposed dynamic compensation is highly effective in restoring yield at a level comparable to that of sense amplifiers without process variations. We created the 32nm double gate models generated from Damocles 3-D device simulations [25] and Taurus Device Simulator available commercially from Synopsys [47] and use them in the nominal latch type sense amplifier design and on the Independent Gate Self Compensation Sense Amplifier Design (IGSSA) to compare the yield and performance benefits of sense amplifier design on FinFET technology over the conventional bulk type CMOS based sense amplifier on 32nm technology node effective in restoring yield at a level comparable to that of sense amplifiers without process variations. We created the 32nm double gate models generated from Damocles 3-D device simulations [25] and Taurus Device Simulator available commercially from Synopsys [47] and use them in the nominal latch type sense amplifier design and on the Independent Gate Self Compensation Sense Amplifier Design (IGSSA) to compare the yield and performance benefits of sense amplifier design on FinFET technology over the conventional bulk type CMOS based sense amplifier on 32nm technology node