531 research outputs found
Selective deposition of aluminum from selectively excited metalorganic source by the rf plasma
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A thru-only de-embedding method for on-wafer characterization of multiport networks 13 0 A thru-only de-embedding method for on-wafer characterization of multiport networks
Get PDFFull Duplex Transmission Operation of a 2.45-GHz Asynchronous Spread Spectrum Modem Using a SAW Convolver
Get PDFComplete Planarization of via Holes with Aluminum by Selective and Nonselective Chemical Vapor Deposition
Get PDFDistributed Sensing Via Inductively Coupled Single-Transistor Chaotic Oscillators: A New Approach and Its Experimental Proof-of-Concept
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Multilevel metallization based on Al CVD
Get PDF科研費報告書収録論文(課題番号:08555073・基盤研究(A)(2)・H8～H10/研究代表者:坪内, 和夫/超LSI多層配線A1CVD装置の開発
Novel Metal Electrodeposition and the Recent Application
No full textGold and noble metals have been attractive to humans from ancient times because of their beautiful features. In modern society, noble metals, especially gold, play important roles as components in electronic devices because of their high electrical conductivity, chemical stability, and density. In the field of MEMS devices, the demand for continuous miniaturization and sensitivity enhancement is always high. Especially for MEMS accelerometers, sensitivity is affected by Brownian noise, and components with sufficient mass are needed to suppress this noise. Therefore, it is difficult to reduce the dimensions of components to allow further miniaturization of the device. This book presents recent progress in noble metal electrodeposition and applications of gold-based materials in the realization of highly sensitive CMOS-MEMS accelerometers
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