Electron Mobility and Magneto Transport Study of Ultra-Thin Channel Double-Gate Si MOSFETs

We report on detailed room temperature and low temperature transport properties of double-gate Si MOSFETs with the Si well thickness in the range 7-17 nm. The devices were fabricated on silicon-on-insulator wafers utilizing wafer bonding, which enabled us to use heavily doped metallic back gate. We observe mobility enhancement effects at symmetric gate bias at room temperature, which is the finger print of the volume inversion/accumulation effect. An asymmetry in the mobility is detected at 300 K and at 1.6 K between the top and back interfaces of the Si well, which is interpreted to arise from different surface roughnesses of the interfaces. Low temperature peak mobilities of the reported devices scale monotonically with Si well thickness and the maximum low temperature mobility was 1.9 m2/Vs, which was measured from a 16.5 nm thick device. In the magneto transport data we observe single and two sub-band Landau level filling factor behavior depending on the well thickness and gate biasing

Intervalley-Scattering Induced Electron-Phonon Energy Relaxation in Many-Valley Semiconductors at Low Temperatures

We report on the effect of elastic intervalley scattering on the energy transport between electrons and phonons in many-valley semiconductors. We derive a general expression for the electron-phonon energy flow rate at the limit where elastic intervalley scattering dominates over diffusion. Electron heating experiments on heavily doped n-type Si samples with electron concentration in the range $3.5-16.0\times 10^{25}$ m$^{-3}$ are performed at sub-1 K temperatures. We find a good agreement between the theory and the experiment.Comment: v2: Notations changed: $\Delta_i$ --> $\delta v_i$, $\tau_{eff}$ removed. Eq. (1) changed, Eq. (2) added and complete derivation of Eq. (3) included. Some further discussion about single vs. many valley added [3rd paragraph after Eq. (7)]. End notes removed and new reference added [Kragler and Thomas]. Typos in references correcte

Double Gate Bias Dependency of Low Temperature Conductivity of SiO2-Si-SiO2 Quantum Wells

The gate bias dependency of conductivity is examined in two Si quantum wells with well thickness tw = 7 nm and tw = 14 nm. The conductivity of the thinner device behaves smoothly whereas the thicker device shows strong non-monotonic features as a function of gate voltages. We show that a strong minimum in conductivity occurs close to the threshold of second sub-band. Another minimum is seen at high electron density at symmetric well potential. This feature is addressed to sub-band wave function delocalization in the quantization direction.Comment: To appear in the Proceedings of ICPS28th (Vienna, Austria, July 24-28, 2006

Superconducting MoSi nanowires

We have fabricated disordered superconducting nanowires of molybdenium silicide. A molybdenium nanowire is first deposited on top of silicon, and the alloy is formed by rapid thermal annealing. The method allows tuning of the crystal growth to optimise, e.g., the resistivity of the alloy for potential applications in quantum phase slip devices and superconducting nanowire single-photon detectors. The wires have effective diameters from 42 to 79 nm, enabling the observation of crossover from conventional superconductivity to regimes affected by thermal and quantum fluctuations. In the smallest diameter wire and at temperatures well below the superconducting critical temperature, we observe residual resistance and negative magnetoresistance, which can be considered as fingerprints of quantum phase slips

Ex-situ Tunnel Junction Process Technique Characterized by Coulomb Blockade Thermometry

We investigate a wafer scale tunnel junction fabrication method, where a plasma etched via through a dielectric layer covering bottom Al electrode defines the tunnel junction area. The ex-situ tunnel barrier is formed by oxidation of the bottom electrode in the junction area. Room temperature resistance mapping over a 150 mm wafer give local deviation values of the tunnel junction resistance that fall below 7.5 % with an average of 1.3 %. The deviation is further investigated by sub-1 K measurements of a device, which has one tunnel junction connected to four arrays consisting of N junctions (N = 41, junction diameter 700 nm). The differential conductance is measured in single-junction and array Coulomb blockade thermometer operation modes. By fitting the experimental data to the theoretical models we found an upper limit for the local tunnel junction resistance deviation of ~5 % for the array of 2N+1 junctions. This value is of the same order as the minimum detectable deviation defined by the accuracy of our experimental setup

Electron-Acoustic Phonon Energy Loss Rate in Multi-Component Electron Systems with Symmetric and Asymmetric Coupling Constants

We consider electron-phonon (\textit{e-ph}) energy loss rate in 3D and 2D multi-component electron systems in semiconductors. We allow general asymmetry in the \textit{e-ph} coupling constants (matrix elements), i.e., we allow that the coupling depends on the electron sub-system index. We derive a multi-component \textit{e-ph}power loss formula, which takes into account the asymmetric coupling and links the total \textit{e-ph} energy loss rate to the density response matrix of the total electron system. We write the density response matrix within mean field approximation, which leads to coexistence of\ symmetric energy loss rate $F_{S}(T)$ and asymmetric energy loss rate $F_{A}(T)$ with total energy loss rate $F(T)=F_{S}(T)+F_{A}(T)$ at temperature $T$. The symmetric component F_{S}(T) $is equivalent to the conventional single-sub-system energy loss rate in the literature, and in the Bloch-Gr\"{u}neisen limit we reproduce a set of well-known power laws$F_{S}(T)\propto T^{n_{S}}$, where the prefactor and power$n_{S}$depend on electron system dimensionality and electron mean free path. For$F_{A}(T)$we produce a new set of power laws F_{A}(T)\propto T^{n_{A}}$. Screening strongly reduces the symmetric coupling, but the asymmetric coupling is unscreened, provided that the inter-sub-system Coulomb interactions are strong. The lack of screening enhances $F_{A}(T)$ and the total energy loss rate $F(T)$. Especially, in the strong screening limit we find $F_{A}(T)\gg F_{S}(T)$. A canonical example of strongly asymmetric \textit{e-ph} matrix elements is the deformation potential coupling in many-valley semiconductors.Comment: v2: Typos corrected. Some notations changed. Section III.C is embedded in Section III.B. Paper accepted to PR

Diffusion-emission theory of photon enhanced thermionic emission solar energy harvesters

Numerical and semi-analytical models are presented for photon-enhanced-thermionic-emission (PETE) devices. The models take diffusion of electrons, inhomogeneous photogeneration, and bulk and surface recombination into account. The efficiencies of PETE devices with silicon cathodes are calculated. Our model predicts significantly different electron affinity and temperature dependence for the device than the earlier model based on a rate-equation description of the cathode. We show that surface recombination can reduce the efficiency below 10% at the cathode temperature of 800 K and the concentration of 1000 suns, but operating the device at high injection levels can increase the efficiency to 15%.Comment: 5 pages, 4 figure

Lifetimes of Confined Acoustic Phonons in Ultra-Thin Silicon Membranes

We study the relaxation of coherent acoustic phonon modes with frequencies up to 500 GHz in ultra-thin free-standing silicon membranes. Using an ultrafast pump-probe technique of asynchronous optical sampling, we observe that the decay time of the first-order dilatational mode decreases significantly from \sim 4.7 ns to 5 ps with decreasing membrane thickness from \sim 194 to 8 nm. The experimental results are compared with theories considering both intrinsic phonon-phonon interactions and extrinsic surface roughness scattering including a wavelength-dependent specularity. Our results provide insight to understand some of the limits of nanomechanical resonators and thermal transport in nanostructures

Primary thermometry in the intermediate Coulomb blockade regime

We investigate Coulomb blockade thermometers (CBT) in an intermediate temperature regime, where measurements with enhanced accuracy are possible due to the increased magnitude of the differential conductance dip. Previous theoretical results show that corrections to the half width and to the depth of the measured conductance dip of a sensor are needed, when leaving the regime of weak Coulomb blockade towards lower temperatures. In the present work, we demonstrate experimentally that the temperature range of a CBT sensor can be extended by employing these corrections without compromising the primary nature or the accuracy of the thermometer.Comment: 8 pages, 4 figure

Electrons and holes in Si quantum well: a room-temperature transport and drag resistance study

We investigate carrier transport in a single 22 nm-thick double-gated Si quantum well device, which has independent contacts to electrons and holes. Conductance, Hall density and Hall mobility are mapped in a broad double-gate voltage window. When the gate voltage asymmetry is not too large only either electrons or holes occupy the Si well and the Hall mobility shows the fingerprints of volume inversion/accumulation. At strongly asymmetric double-gate voltage an electric field induced electron-hole (EH) bi-layer is formed inside the well. The EH drag resistance R_{he} is explored at balanced carrier densities: R_{he} decreases monotonically from 860 to 37 Ohms when the electron and hole density is varied between ~0.4-1.7x10^{16} m^{-2}