PENGEMBANGAN LAYOUT CADDY TOOLS LACI 1 UNTUK MENCIPTAKAN KERAPIAN TEMPAT PENYIMPANAN ALAT PADA BENGKEL JPTO FT UNY

Tujuan proyek akhir ini meliputi beberapa hal yaitu 1) Merancang dan membuat tempat penyimpanan kunci-kunci service sepeda motor yang lebih rapi, 2) memperbaiki tempat penyimpanan kunci-kunci service sepeda motor di bengkel JPTO FT UNY agar dapat berfungsi dengan normal kembali, 3)melakukan pengujian perubahan tempat penyimpanan kunci-kunci untuk melakukan tune up sepeda motor guna mengetahui fungsional penggunaan kunci-kunci service sepeda motor di bengkel JPTO FT UNY. Proses pembuatan layout tempat penyimpanan kunci-kunci service ini dilakukan berdasarkan identifikasi kebutuhan seperti pendataan jumlah kunci-kunci service sepeda motor pada cady tools layer satu, mencari ukuran, luasan dan bahan yang akan digunakan. Setelah mendapatkan data-data tersebut maka dibuatlah sebuah desain layout tempat penyimpanan kunci-kunci service sepeda motor pada layer satu sesuai dengan kebutuhan di dalam bengkel sepeda motor. Dalam pembuatan tempat penyimpanan kunci-kunci service tersebut dilakukan beberapa proses seperti pencetakan dudukan tempat penyimpanan kunci-kunci service menggunakan mesin laser cut, lalu dilakukan perakitan semua komponen caddy tools. Langkah terakhir yaitu melakukan pengujian guna mengetahui perbedaan antara tempat penyimpanan kunci-kunci service yang belum mengalami perubahan dan yang sudah mengalami perubahan tersebut. Hasil dari proses-proses ini yaitu caddy tools dapat berfungsi dengan normal kembali, terlihat rapi karena kunci-kunci ytang berada di dalam caddy tools sudah sesuai dengan dudukan yang sudah dilakukan pengembangan

White paper on the future of plasma science and technology in plastics and textiles

International audienceThis white paper considers the future of plasma science and technology related to the manufacturing and modifications of plastics and textiles, summarizing existing efforts and the current state-of-art for major topics related to plasma processing techniques. It draws on the frontier of plasma technologies in order to see beyond and identify the grand challenges which we face in the following 5–10 years. To progress and move the frontier forward, the paper highlights the major enabling technologies and topics related to the design of surfaces, coatings and materials with nonequilibrium plasmas. The aim is to progress the field of plastics and textile production using advanced plasma processing as the key enabling technology which is environmentally friendly, cost-efficient, and offers high-speed processing

Two layer barrier on polymeric substrate

Plasma treatment apparatus for treating a substrate (6) comprising at least two opposing electrodes (2, 3) and a treatment space (5). The at least two electrodes (2, 3) are connected to a plasma control unit (4) for generating an atmospheric pressure glow discharge plasma in the treatment space (5). A gas supply device (8) provides a gas mixture in the treatment space (5). In operation,a first layer of inorganic material is deposited on a polymeric substrate using a gas composition comprising oxygen having a concentration of 2 % or less, while the power supply provides an energy of 30 J/cm2 or less. A second layer of inorganic material is deposited on the first layer using a gas composition comprising oxygen having a concentration of 3 % or higher. During the second layer formation the power supply provides an energy of 40 J/cm2 or higher

Substrate structure grown by plasma deposition

Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent a, a growth exponent ss and a dynamic exponent z, wherein the growth exponent ss has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure

Method and arrangement for generating and controlling a discharge plasma

Method and arrangement for controlling a discharge plasma in a discharge space having at least two spaced electrodes. A gas or gas mixt. is introduced in the discharge space, and a power supply for energizing the electrodes is provided for applying an a.c. plasma energizing voltage to the electrodes. At least one current pulse is generated and causes a plasma current and a displacement current. Means for controlling the plasma are provided and arranged to apply a displacement current rate of change for controlling local c.d. variations assocd. with a plasma variety having a low ratio of dynamic to static resistance, such as filamentary discharges. By damping such fast variations using a pulse forming circuit, a uniform glow discharge plasma was obtained

Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions

Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixture under atmospheric pressure conditions, energizing the electrodes by applying an AC energizing voltage (Va) to the electrodes, and controlling the energizing voltage (Va) such that at plasma generation a sharp relative decrease of displacement current is provided

Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (apg)

Method and arrangement for generating an atmospheric pressure glow (APG) plasma (1), wherein the plasma (1) is generated in a discharge space (10) between a plurality of electrodes (3, 4). A dielectric (2) is present on at least one of the electrodes (4), which dielectric (2) has a boundary surface with the plasma (1) enabling interactions between the plasma (1) and the boundary surface of the dielectric (2). The dielectric (2) is arranged for releasing electrons contributing to the plasma (1) from the boundary surface by the interactions

Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)

Method and arrangement ( 1 ) for generating an atmospheric pressure glow plasma APG ( 7 ), where in a plurality of electrodes, ( 4, 5 ) are arranged defining a discharge space ( 10 ) for forming said plasma ( 7 ). The electrodes ( 4,5 ) are connected to a power supply ( 8 ) providing an AC-voltage having a frequency of at least 50 kHz to the electrodes ( 4,5 ). A gaseous substance ( 6 ) is provided in said discharge space and comprises t least one of a group of argon, nitrogen and air

Arrangement, method and electrode for generating a plasma

The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space (7) between at least a pair of electrodes (1, 2), which electrodes (1, 2) are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes (1) has a boundary surface (6) with the discharge space (7). The boundary surface is comprised of one or more alternately arranged conductive (4) and insulating regions (5). The invention further relates to an electrode (1) for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface (3) treatment purposes

Variable roughness development in statically deposited SiO\u3csub\u3e2\u3c/sub\u3e thin films:a spatially resolved surface morphology analysis

\u3cp\u3eFor the first time a systematic analysis of the growth front evolution of statically deposited silica films in an atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) reactor was carried out. The growth front evolution was studied as a function of time and position in the reactor. Focussed beam spectroscopic ellipsometry was used to assess the local film growth rate and atomic force microscopy (AFM) to analyse the surface roughness development. Spatially resolved AFM analysis showed a strong dependence of the rms roughness on the position, and consequently on the thickness and local deposition rate (LDR), in the reactor. Time resolved surface morphology analysis at two specific positions at high and low LDR indicated different growth exponents β = 0.33 and β = 0.11, respectively. From the analysis of the static roughness development in the AP-PECVD reactor certain limitations on the deposition time and the maximum LDR for dynamic or web rolled deposition conditions have been elucidated. Moreover, the system is characterized by a set of roughness exponents = 0.9, = 1.6 and global roughness exponent = 2.3. The different values of α indicate an anomalous scaling behaviour of the system whereas different growth exponents β suggest a breakdown of the anti-shadowing mechanism.\u3c/p\u3