7 research outputs found

    Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes

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    A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments
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