Indiana’s outlook for 2020

The government sector also produces about 8 percent of output.8 Over the past year, various media have reported conflicting information about the extent of impacts from tariffs on imports and exports in America. [...]any attempt to accurately quantify the impact of the current trade war on the Indiana economy at this point, would be impossible. [...]with the exception of one year (2009), Indiana has led the nation in manufacturing employment since 1996, when Indiana took the manufacturing mantle from North Carolina (see Table l).9 While nearly one in every five Indiana jobs is in manufacturing, the overweighting in the manufacturing sector is even more pronounced in terms of GSP. Yet, Hoosier farmers (totaling over 94,000 in 2017) as individuals are certainly affected by the trade war.11 According to the Indiana State Department of Agriculture (2019), Indiana was the eighth-largest agricultural exporter in the country as of 2017, the 10th-largest farming state, and in the top five among U.S. states that produce ducks, popcorn, ice cream, tomatoes, pumpkins, turkeys, corn, soybeans, watermelons and hogs. [...]farming accounts for a relatively small number of jobs available to Hoosiers and has been declining for many decades. [...]farming is not an accurate representative to gauge our economic condition in the near future

On the dimensionally correct kinetic theory of turbulence for parallel propagation

Yoon and Fang [Phys. Plasmas 15, 122312 (2008)] formulated a second-order nonlinear kinetic theory that describes the turbulence propagating in directions parallel/anti-parallel to the ambient magnetic field. Their theory also includes discrete-particle effects, or the effects due to spontaneously emitted thermal fluctuations. However, terms associated with the spontaneous fluctuations in particle and wave kinetic equations in their theory contain proper dimensionality only for an artificial one-dimensional situation. The present paper extends the analysis and re-derives the dimensionally correct kinetic equations for three-dimensional case. The new formalism properly describes the effects of spontaneous fluctuations emitted in three-dimensional space, while the collectively emitted turbulence propagates predominantly in directions parallel/anti-parallel to the ambient magnetic field. As a first step, the present investigation focuses on linear wave-particle interaction terms only. A subsequent paper will include the dimensionally correct nonlinear wave-particle interaction terms

On the dimensionally correct kinetic theory of turbulence for parallel propagation

Yoon and Fang [Phys. Plasmas 15, 122312 (2008)] formulated a second-order nonlinear kinetic theory that describes the turbulence propagating in directions parallel/anti-parallel to the ambient magnetic field. Their theory also includes discrete-particle effects, or the effects due to spontaneously emitted thermal fluctuations. However, terms associated with the spontaneous fluctuations in particle and wave kinetic equations in their theory contain proper dimensionality only for an artificial one-dimensional situation. The present paper extends the analysis and re-derives the dimensionally correct kinetic equations for three-dimensional case. The new formalism properly describes the effects of spontaneous fluctuations emitted in three-dimensional space, while the collectively emitted turbulence propagates predominantly in directions parallel/anti-parallel to the ambient magnetic field. As a first step, the present investigation focuses on linear wave-particle interaction terms only. A subsequent paper will include the dimensionally correct nonlinear wave-particle interaction terms

Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization

Ruthenium (Ru) thin films were grown on thermally-grown SiO2 substrates using atomic layer deposition (ALD) by a sequential supply of (ethylbenzene)(1,3-cyclohexadiene)Ru(0) (EBCHDRu, C14H18Ru), and molecular oxygen (O-2) at deposition temperatures ranging from 140 to 350 degrees C. A self-limiting film growth was confirmed at the deposition temperature of 225 degrees C and the growth rate was 0.1 nm/cycle on the SiO2 substrate with a negligible number of incubation cycles (approximately 2 cycles). Plan-view transmission electron microscopy analysis showed that nucleation was started after only 3 ALD cycles and the maximum nuclei density of 1.43 x 10(12)/cm(2) was obtained after 5 ALD cycles. A continuous Ru film with a thickness of similar to 4 nm was formed after 40 ALD cycles. The film resistivity was decreased with increasing deposition temperature, which was closely related to its crystallinity, microstructure, and density, and the minimum resistivity of similar to 14 mu Omega-cm was obtained at the deposition temperature of 310 degrees C. The step coverage was approximately 100% at trench (aspect ratio: 4.5) with the top opening size of similar to 25 nm. Finally, the ALD-Ru film was evaluated in terms of its performance as a seed layer for Cu electroplating. (c) 2013 Elsevier B.V. All rights reserved

Low frequency electromagnetic fluctuations in Kappa magnetized plasmas

The present paper provides a theoretical approach for the evaluation of the low frequency spontaneously emitted electromagnetic (EM) fluctuations in Kappa magnetized plasmas, which include the kinetic Alfven, fast magnetosonic/whistler, kinetic slow mode, ion Bernstein cyclotron modes, and higher-order modes. The model predictions are consistent with particle-in-cell simulations. Effects of suprathermal particles on low frequency fluctuations are studied by varying the power index, either for ions (kappa(i)) or for electrons (kappa(e)). Computations for an arbitrary wave vector orientation and wave polarization provide the intensity of spontaneous emissions to be enhanced in the presence of suprathermal populations. These results strongly suggest that spontaneous fluctuations may significantly contribute to the EM fluctuations observed in space plasmas, where suprathermal Kappa distributed particles are ubiquitous

Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant

Ruthenium (Ru) thin films were grown by atomic layer deposition using IMBCHRu [(eta 6-1-Isopropyl-4-MethylBenzene)(eta 4-CycloHexa-1,3-diene)Ruthenium(0)] as a precursor and a nitrogen-hydrogen mixture (N-2/H-2) plasma as a reactant, at the substrate temperature of 270 degrees C. In the wide range of the ratios of N-2 and total gas flow rates (fN(2)/N-2+H-2) from 0.12 to 0.70, pure Ru films with negligible nitrogen incorporation of 0.5 at.% were obtained, with resistivities ranging from similar to 20 to similar to 30 mu Omega cm. A growth rate of 0.057 nm/cycle and negligible incubation cycle for the growth on SiO2 was observed, indicating the fast nucleation of Ru. The Ru films formed polycrystalline and columnar grain structures with a hexagonal-close-packed phase. Its resistivity was dependent on the crystallinity, which could be controlled by varying the deposition parameters such as plasma power and pulsing time. Cu was electroplated on a 10-nm-thick Ru film. Interestingly, it was found that the nitrogen could be incorporated into Ru at a higher reactant gas ratio of 0.86. The N-incorporated Ru film (similar to 20 at.% of N) formed a nanocrystalline and non-columnar grain structure with the resistivity of similar to 340 mu Omega cm. (C) 2012 Elsevier B. V. All rights reserved