Lattice strain distribution resolved by X-ray Bragg-surface diffraction in an Si matrix distorted by embedded FeSi2 nanoparticles

Out-of-plane and primarily in-plane lattice strain distributions, along the two perpendicular crystallographic directions on the subsurface of a silicon layer with embedded FeSi2 nanoparticles, were analyzed and resolved as a function of the synchrotron X-ray beam energy by using omega:phi mappings of the (111) and (111) Bragg-surface diffraction peaks. the nanoparticles, synthesized by ion-beam-induced epitaxial crystallization of Fe+-implanted Si(001), were observed to have different orientations and morphologies (sphere-and plate-like nanoparticles) within the implanted/recrystallized region. the results show that the shape of the synthesized material singularly affects the surrounding Si lattice. the lattice strain distribution elucidated by the nonconventional X-ray Bragg-surface diffraction technique clearly exhibits an anisotropic effect, predominantly caused by plate-shaped nanoparticles. This type of refined detection reflects a key application of the method, which could be used to allow discrimination of strains in distorted semiconductor substrate layers.Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)FAPEMACoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)UNIFESP, Inst Ciencia & Tecnol ICT, BR-12231280 Sao Jose Dos Campos, SP, BrazilUniv Fed Maranhao, Dept Fis CCET, BR-65085580 Sao Luis, MA, BrazilUniv Fed Maranhao, CCSST, BR-65900410 Imperatriz, MA, BrazilUniv Fed Rio Grande do Sul, Inst Fis, Programa Posgrad Ciencias Mat PGCIMAT, BR-91501970 Porto Alegre, RS, BrazilCEA, Leti Minatec Campus, F-38054 Grenoble, FranceUniv Estadual Campinas, Inst Fis Gleb Wataghin IFGW, BR-13083859 Campinas, SP, BrazilUNIFESP, Inst Ciencia & Tecnol ICT, BR-12231280 Sao Jose Dos Campos, SP, BrazilCAPES: 2358-09-3Web of Scienc

Purcell enhancement of silicon W centers in circular Bragg grating cavities

Generating single photons on demand in silicon is a challenge to the scalability of silicon-on-insulator integrated quantum photonic chips. While several defects acting as artificial atoms have recently demonstrated an ability to generate antibunched single photons, practical applications require tailoring of their emission through quantum cavity effects. In this work, we perform cavity quantum electrodynamics experiments with ensembles of artificial atoms embedded in silicon-on-insulator microresonators. The emitters under study, known as W color centers, are silicon tri-interstitial defects created upon self-ion implantation and thermal annealing. The resonators consist of circular Bragg grating cavities, designed for moderate Purcell enhancement ($F_p=12.5$) and efficient luminescence extraction ($\eta_{coll}=40\%$ for a numerical aperture of 0.26) for W centers located at the mode antinode. When the resonant frequency mode of the cavity is tuned with the zero-phonon transition of the emitters at 1218 nm, we observe a 20-fold enhancement of the zero-phonon line intensity, together with a two-fold decrease of the total relaxation time in time-resolved photoluminescence experiments. Based on finite-difference time-domain simulations, we propose a detailed theoretical analysis of Purcell enhancement for an ensemble of W centers, considering the overlap between the emitters and the resonant cavity mode. We obtain a good agreement with our experimental results assuming a quantum efficiency of $65 \pm 10 \%$ for the emitters in bulk silicon. Therefore, W centers open promising perspectives for the development of on-demand sources of single photons, harnessing cavity quantum electrodynamics in silicon photonic chips

Unraveling structural and compositional information in 3D FinFET electronic devices

Non-planar Fin Field Effect Transistors (FinFET) are already present in modern devices. The evolution from the well-established 2D planar technology to the design of 3D nanostructures rose new fabrication processes, but a technique capable of full characterization, particularly their dopant distribution, in a representative (high statistics) way is still lacking. Here we propose a methodology based on Medium Energy Ion Scattering (MEIS) to address this query, allowing structural and compositional quantification of advanced 3D FinFET devices with nanometer spatial resolution. When ions are backscattered, their energy losses unfold the chemistry of the different 3D compounds present in the structure. The FinFET periodicity generates oscillatory features as a function of backscattered ion energy and, in fact, these features allow a complete description of the device dimensions. Additionally, each measurement is performed over more than thousand structures, being highly representative in a statistical meaning. Finally, independent measurements using electron microscopy corroborate the proposed methodolog

Defect engineering in H and He implanted Si

The present work relates an investigation of H and He coimplanted (001)-Si substrates. The phenomena of blistering and exfoliation were studied by SEM as a function of the implantation parameters (energy, fluence, current and H/He ration) and annealing protocol. A window behavior as function of the implanted fluence was observed and two distinct fluence dependents mechanisms of exfoliation were indentified and discussed. The microstructure of the implanted samples was studied using TEM and related to ballistic effects and stress-strain dependent interactions. The strain was measured using DRX and a model to describe the stress-strain distribution into the implanted layer is developed. A new phenomenon of delamination of thin layer from implanted Si substrates was observed to emerge from particular implantation conditions. The behavior was studied and explained using fracture mechanics concepts and contrasted to blistering/exfoliation processes. Finally, the elastic interaction between He and H plate-like precipitates giving rise to arranged nanostructure was demonstrated and studied using TEM. An elasticity based model was developed to understand the behavior. The result set the basis for further developments of nanostructures within a crystalline matrix by manipulating preferential orientations of precipitates in nanometric scale.Ce travail porte sur l'étude des phénomènes induits par implantation d'hydrogène et/ou d'hélium dans le silicium monocristallin. Le cloquage et l'exfoliation dus à la coimplantation d'hélium et d'hydrogène ont été étudiés en fonction des paramètres d'implantation (énergie, fluence, courant, rapport H/He) et des conditions de recuit. Un comportement de type fenêtre à été observé dont le maximum de surface exfoliée dépend uniquement de la fluence. Deux mécanismes d'exfoliation liés aux régimes de fluence ont été identifiés et discutés. D'autre part, la microstructure des échantillons a été étudié par MET, et les déformations ont été mesurées par diffraction des Rayons X. Un modèle décrivant la distribution des contraintes dans le substrat implanté a été proposé. Le phénomène de delamination des substrats qui apparaît pour des conditions particulières d'implantation a également été étudié, comparé aux phénomènes de cloquage et exfoliation, et expliqué en utilisant des concepts de la mécanique de la fracture. Enfin, l'interaction élastique entre précipités d'He et d'H a été étudiée pour des profils d'implantation superposés et décalés. Dans ce dernier cas, nous avons montré que le champ de contraintes générées par les plaquettes d'hélium en surpression pouvait être utilisé comme source locale de contraintes pour contrôler la formation et la croissance de plaquettes d'hydrogène. Afin d'interpréter nos résultats expérimentaux, nous avons développé un modèle basé sur l'interaction élastique pour la nucléation des précipités dans un solide semi-infini

Relaxação de "buffer layers" de SiGe em Si(100) através de implantação iônica de hélio

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H-induced subcritical crack propagation and interaction phenomena in (001) Si using He-cracks templates

H and He ion implantations allow the formation of nanocracks within controlled subsurface depths in semiconducting materials. Upon annealing, crack propagation and coalescence provides a way of cutting monocrystalline thin films. Here, the mechanisms of coalescence by crack-tip interactions are depicted in 001 Si wafers. Starting from overpressurized He-cracks, subcritical propagation was activated by diffusional H. Nanocrack interaction can occur by elastic forces, causing tip folding, or by plastic deformation forming extended defects. These observations are discussed and modeled using elasticity and fracture mechanics. The model suggests that kinetic effects in the cutting process depend on the crack interplanar separations

Application of the O-lattice theory for the reconstruction of the high-angle near 90? tilt Si(1 1 0)/(0 0 1) boundary created by wafer bonding

International audienceThis work presents an experimental and theoretical identification of defects and morphologies of a high-angle near-90° tilt Si boundary created by direct wafer bonding. Two samples with different twist misorientations, between the layer and the (0 0 1) substrate, were studied using conventional transmission electron microscopy (TEM) and geometric phase analysis of high-resolution TEM images. The O-lattice theory was used for atom reconstruction of the interface along the direction. It is demonstrated that to preserve covalent bonding across the interface, it should consist of facets intersected by maximum of six planes with three 90° Shockley dislocations per facet. It is shown that a particular atom reconstruction is needed at transition points from one facet to another. The presence or absence of deviation from exact 90° tilt of the layer with respect to the substrate is shown to be related directly to the undulations of the interface. It is demonstrated that the latter has an influence on the Burgers vector of the dislocations adjusting in-plane twist misorientation. A general model for cubic face-centered materials for an arbitrary 〈1 1 0〉sub,lay tilt interface is proposed, which predicts the net Burgers vector and the spacing between dislocations necessary to realize transition from the lattice of the substrate (layer) to the layer (substrate)

Orientation of H platelets under local stress in Si

Hydrogen is implanted into 001 silicon under the strain field of previously formed overpressurized helium plates. Upon thermal annealing, the hydrogen atoms precipitate into platelet structures oriented within specific 111 or 001 variant determined through the local symmetry of the strain. The behavior is understood in terms of elastic interactions and is described via energy minimization calculations, predicting the formation and distribution of each platelet orientation variant. Our results demonstrate the concept that sublocal organized arrangements of precipitates can be obtained within nanosize domains using local strain fields