Internal friction and its thermal evolution on 304 L stainless steel films

Internal friction has been measured between 300 and 760K on 304 L stainless steel (SS) using a vibrating reed device. The 0.6 µm thick samples were deposited with ion beam sputtering technique on (100) silicon substrate. It has been shown that the damping level is considerably reduced by annealing between 500 and 760K. The calculated activation energy and the reaction order, using the Johnson-Mehl-Avrami (J-M-H) kinetic enable us to assume that the observed mechanism is closely related to microstructural rearrangements located at grain boundaries.Internal friction has been measured between 300 and 760K on 304 L stainless steel (SS) using a vibrating reed device. The 0.6 µm thick samples were deposited with ion beam sputtering technique on (100) silicon substrate. It has been shown that the damping level is considerably reduced by annealing between 500 and 760K. The calculated activation energy and the reaction order, using the Johnson-Mehl-Avrami (J-M-H) kinetic enable us to assume that the observed mechanism is closely related to microstructural rearrangements located at grain boundaries

Strain mapping by non destructive method: Laue microdiffraction

n/

Atomic environment and interfacial structural order of TiAlN/Mo multilayers

Multilayered TiAlN/Mo coatings were deposited by dc reactive magnetron sputtering in a custom-made chamber. In order to assess the composition of these coatings, a combined study of Extended X-ray Absorption Fine Structure (EXAFS) and Rutherford Backscattering Spectrometry (RBS) experiments were performed. Through the simulation of the EXAFS spectra, giving the local environment of the titanium atoms inside the nitride (TiAlN), a cubic phase has been evidenced with aluminium atoms occupying titanium sites. For modulation periods in the range of 3.6–11.8 nm, RBS simulations on these multilayers also enabled the determination of the level of intermixing that occurs at the interfaces as a function of the negative bias voltage and number of layers. It was observed that the intermixing width could be as high as 2.1 nm for the roughest samples (larger periods) or as low as 0.4 nm for those with the sharpest interfaces (smaller periods).Comunidade Europeia (CE). Fundo Europeu de Desenvolvimento Regional (FEDER) -Ministério da Ciência e Tecnologia.Cooperação Científica e Tecnológica Internacional (ICCTI) - Ambassade de France in Portugal - Project no. 543 B3/2001.Fundação para a Ciência e a Tecnologia (FCT) - Programa Operacional “Ciência, Tecnologia, Inovação - POCTI/32670/CTM/2000

Corrosion behaviour of substoichiometric TiNx films produced by DC magnetron sputtering

The present work describes the corrosion behaviour of substoichiometric TiNx films obtained by dc reactive magnetron sputtering. The coatings thickness ranged from 1.7 to 4.2 µm and the nitrogen content varied between 0 and 55 at. %. According to structural characterization by XRD, the films revealed a hexagonal α-Ti phase with a strong [002] orientation for low nitrogen contents. For nitrogen contents of 20% and 30%, the ε-Ti2N phase appears with a [200] orientation and further increasing of nitrogen content showed that the δ-TiN phase was dominant. Potentiodynamic polarisation and Electrochemical Impedance Spectroscopy (EIS) techniques were used to study the corrosion properties of TiNx films when immersed in artificial sweat solutions. Results of potentiodynamic polarisation tests showed that all films have a high corrosion resistance reflected by corrosion current densities values lower than 0.7µA/cm2. Also, EIS tests corroborated the results obtained in the polarisation tests, showing that films containing low percentages of nitrogen (less than 8 %) reveal the best corrosion resistance. Further increases in nitrogen content lead to a decrease in corrosion resistance. An exception to this behaviour was found for the film, with 30 % N. This sample presents an excellent corrosion resistance which increases with the immersion time. Higher nitrogen contents (52 and 55 %) promote a relative increase in the corrosion resistance when compared with 45 and 50 at % films, but never reaching values obtained for nitrogen contents lower than 30 % at.Fundação para a Ciência e a Tecnologia - (FCT

Structural evolution in ZrNxOy thin films as a function of temperature

Single-layered zirconium oxynitride (ZrNxOy) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere. The variation of the flow rate of the reactive gases enabled changes in the composition and structure of the films. X-ray diffraction (XRD) and glancing incidence X-ray diffraction (GIXRD) were used to study the as-deposited films and their structural changes during or after heat treatment, from 400 to 900 °C, in controlled atmosphere and in vacuum.http://www.sciencedirect.com/science/article/B6TVV-4DPYN97-6/1/3785b40b130ad12af7221c230d2968c

Corrosion behaviour of single layered ZrNxOy thin films in artificial sweat solutions

Applications of coloured thin films can be found on the production of high-quality consumer products, such as eyeglass frames, wristwatch casings and wristbands. These components should possess scratch and corrosion resistant surfaces through the desired lifetime. Recently, metal oxynitrides, MeNxOy (Me = early transition metal) were proposed for decorative applications. In these materials, variations on the amount of oxygen allow the film properties to be tailored, originating a wide range of colours. Additionally, these materials should also fulfil the wear and corrosion requirements above referred. In the present work the corrosion behaviour of single layered zirconium oxynitride, ZrNxOy films, immersed in artificial sweat solutions, is described. Films were produced by rf reactive magnetron sputtering at a constant substrate temperature of 300 ºC, from a pure Zr target. The main processing variable was the flow rate of reactive. The corrosion resistance was evaluated by potentiodynamic polarisation tests and Electrochemical Impedance Spectroscopy (EIS) at different immersion times, at room temperature. The corrosion resistance of the films is strongly affected by the O/N ratio. A slight tendency to improving the corrosion resistance of the films was found with the increasing in the atomic fraction of oxygen. Nevertheless, pitting was found in all samples. However, the amount of pits seems to be strongly dependent not only on the composition of the film, but also on the processing-induced defects distribution.European Union, FCT- Portugal and European community (FEDER)

Tribocorrosion behaviour of zrNxOy thin films for decorative applications

The main aim of this work is the investigation of the tribocorrosion behaviour of single layered zirconium oxynitride, ZrNxOy, thin films in alternative linear regime of sliding and immersed in an artificial sweat solution at room temperature. The films were produced by rf reactive magnetron sputtering, using a pure Zr target at a constant temperature of 300º C. Two different sets of samples were produced. In the first set of films the substrate bias voltage was the main variable, whereas in the second set, the flow rate of reactive gases (oxygen/nitrogen ratio) was varied. The control of the amount of oxygen allowed the film properties to be tailored from those of covalent zirconium nitride to those of the correspondent ionic oxide. During the wear test both the open circuit potential and the corrosion current were monitored. Also, Electrochemical Impedance Spectroscopy (EIS) tests were performed before and after sliding in order to evaluate, in detail, the modification of the protective character of the coating introduced by the joint action of wear and corrosion. The modifications of the coating microstructure and/or chemical composition induced by the variation of the deposition parameters was also evaluated and correlated with the corrosion mechanisms occurring in each system

Corrosion resistance of ZrNxOy thin films obtained by rf reactive magnetron sputtering

The main aim of this work is the investigation of the corrosion resistance of single layered zirconium oxynitride, ZrNxOy, thin films in artificial sweat solution at ambient emperature. The films were produced by rf reactive magnetron sputtering, using a pure Zr target at a constant temperature of 300 8C. Two different sets of samples were produced. In the first set of films, the substrate bias voltage was the main variable, whereas in the second set, the flow rate of reactive gases (oxygen/nitrogen ratio) was varied. The control of the amount of oxygen allowed the film properties to be tailored from those of covalent zirconium nitride to those of the correspondent ionic oxide. The corrosion behaviour was evaluated by potentiodynamic polarization and Electrochemical Impedance Spectroscopy (EIS) tests. The analysis of EIS data provided detailed information of the corrosion processes occurring at the surface of the system throughout the immersion time. The modifications of the coating microstructure and/or chemical composition induced by the variation of the deposition parameters were also evaluated and correlated with the corrosion mechanisms occurring in each system

Property change in ZrNxOy thin films: effect of the oxygen fraction and bias voltage

The main purpose of this work consists on the preparation of single layered zirconium oxynitride, ZrNxOy, thin films, deposited by rf reactive magnetron sputtering. The depositions were carried out by varying the process parameters such as substrate bias voltage and flow rate of the reactive gases. Independently of O content, the samples prepared with oxygen fractions revealed crystalline structures basically constituted by face centred cubic ZrN grains. Atomic force microscopy (AFM) observation showed lower values of surface roughness for low oxygen fractions and a second region where roughness grows significantly, corresponding to the highest oxygen fractions. Ion bombardment promoted a continuous smoothing of the surface up to a bias voltage of -66 V. At a bias voltage of -75 V, roughening is again observed. The small increase of film hardness in low oxygen fractions ZrNxOy films was attributed to lattice distortions occurring as a result of the possible oxygen incorporation within the ZrN lattice and also grain size reduction. Residual stresses appeared to be an important parameter to explain the observed behaviour, namely in the group of samples prepared with variation in the bias voltage. Regarding colour variations, it was observed a clear dependence of the obtained colorations with oxygen fraction.http://www.sciencedirect.com/science/article/B6TW0-4D98KMK-9/1/e9723e69843e56c913d089e23ec8ff2