Real time scatterometry: a new metrology for in situ microelectronics process control

In situ and real time control of the different process steps in semiconductor device manufacturing becomes a critical challenge, especially for the lithography and plasma etching processes. Real time scatterometry is among the few solutions able to meet the requirement for in line monitoring. In this paper we demonstrate that real time scatterometry can be used as a real time monitoring technique during the resist trimming process. For validation purposes the real time scatterometry measurements are compared with 3D Atomic Force Microscopy measurements made in the same process conditions. The agreement between both is excellent

Suppression of Parasitic Nonlinear Processes in Spontaneous Four-Wave Mixing with Linearly Uncoupled Resonators

We report on a signal-to-noise ratio characterizing the generation of identical photon pairs of more than 4 orders of magnitude in a ring resonator system. Parasitic noise, associated with single-pump spontaneous four-wave mixing, is essentially eliminated by employing a novel system design involving two resonators that are linearly uncoupled but nonlinearly coupled. This opens the way to a new class of integrated devices exploiting the unique properties of identical photon pairs in the same optical mode

Si and SiN High-Q microresonators for quantum and nonlinear optics applications

International audienc

Evaluation of methods for noise-free measurement of LER/LWR using synthesized CD-SEM images

International audienc

HBr/O 2 plasma treatment followed by a bake for photoresist linewidth roughness smoothing

International audienc

A novel method based on AFM to study LER transfer during complex gate stack patterning

International audienc

Atomic force microscopy studyof photoresist sidewalls smoothing and line edge roughness transfer during gate patterning

International audienc

Ar+ bombardment of 193 nm photoresist: Morphological effects

International audienc

Mass spectrometry studies of resist trimming processes in HBr/O2 and Cl2/O2 chemistries

International audienc

Advanced Gate dimension control for R2R loop implementation in an industrial environment

International audienc