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Razlike u periodu rehabilitacije kod dve tehnike grafta za rekonstrukciju prednje ukr{tene veze (LCA): tetive semitendinozus / gracilis – ligament patel

/ PRIKAZ SLU^AJA UDK 616.718.5-001.5-057-089

Profesionalni traumatizam je jedan od naju~estaliji

Original scientific paper

The effect of reversing current deposition on the apparent density of electrolytic copper powde

masivnog krvarenja uzrokovanog Dieulafoy lezijom fundusa ‘eluca

Dieulafoy lezija predstavlja redak, ali zna~ajan izvor gastrointestinalnog krvarenja, koje potencijalno ugro‘ava ‘ivot pacijenta. Procenjuje se da uzrokuje 3-4 % svih hemoragija iz gornjeg dela gastrointestinalnog trakta (GIT). Krvarenje nastaje iz abnormalne, velike i erodirane submukozne arterije, udru‘ene sa minimalnim mukoznim defektom. Lezija je naj~e{}e lokalizovana u proksimalnom delu ‘eluca. Pacijent star 42 godine upu}en je u na{u ustanovu iz regionalnog Zdravstvenog centra sa znacima krvarenja iz proksimalnih partija GIT-a. U prethodna 24 sata pre prijema u na{u ustanovu ima

Original scientific paper

The protolytic equilibria of bromazepam, an ampholyte sparingly soluble in water, in homogeneous and heterogeneous systems were studied in the pH range 0–14 at 25 ºC and at ionic strength of 0.1 mol/dm3 (NaCl). On the basis of 13C-NMR spectra, the protonation site was predicted – in acidic media the pyridine nitrogen of bormazepam is protonated. The acidity constants of bromazepam were determined spectrophotometrically (pKa1 2.83 and pKa2 11.60) and potentiometrically (pKa1 2.99). In the heterogeneous system the following equilibrium constants were determined: Ks0 = �HA � (pKs0 3.44), Ks1 = �H2A + �/�H3O + � (pKs1 0.61), and Ks2 = �A-��H3O + � (pKs2 15.04)

Nanophotonic integration in state-of-the-art CMOS foundries

We demonstrate a monolithic photonic integration platform that leverages the existing state-of-the-art CMOS foundry infrastructure. In our approach, proven XeF2 post-processing technology and compliance with electronic foundry process flows eliminate the need for specialized substrates or wafer bonding. This approach enables intimate integration of large numbers of nanophotonic devices alongside high-density, high-performance transistors at low initial and incremental cost. We demonstrate this platform by presenting grating-coupled, microring-resonator filter banks fabricated in an unmodified 28 nm bulk-CMOS process by sharing a mask set with standard electronic projects. The lithographic fidelity of this process enables the high-throughput fabrication of second-order, wavelength-division-multiplexing (WDM) filter banks that achieve low insertion loss without post-fabrication trimming