High-Resolution Kinoform X-Ray Optics Printed via 405 nm 3D Laser Lithography

Efficient focusing of X-rays is essential for high-resolution X-ray microscopy. Diffractive X-ray optics called kinoforms offer the highest focusing efficiencies in theory. However, they have long remained unavailable due to their challenging nanofabrication. Recently, various X-ray optic geometries including kinoforms have been realized using 3D laser lithography at near-infrared wavelengths. As the smallest features (period) of the kinoform determines the resolving power, there is a natural drive to find ways to fabricate kinoforms with ever smaller features. Here, a custom-built 3D laser lithography setup with an excitation wavelength of 405 nm is used, which allows to half the smallest period of the kinoforms compared to previous work. A 40% improvement in scanning transmission X-ray microscopy image resolution, that is, a cutoff resolution of 145 nm, and an efficiency of 7.6% at 700 eV is achieved. A reconstructed pixel size of 18.5 nm, reaching the limit imposed by the design of the microscopy set-up, is demonstrated through ptychographic imaging of a magnetic sample which has a strongly reduced contrast mechanism. Moreover, X-ray lenses manufactured by 405 nm 3D laser lithography have the potential to become much less expensive than X-ray lenses made by other means

Scanning Transmission X-ray Microscopy with X-ray Fluorescence Detection at the XUV Beamline P04, PETRA III, DESY

The presented scanning transmission x-ray microscope (STXM), build on top of our existing modular platform (FlexIX) for high resolution imaging experiments, allows versatile investigations of different samples. The FlexIX endstation allows to switch between a Full Field and a STXM mode. For the STXM mode we use a spatialy resolved detector together with an energy dispersive detector, this allows to investigate the morphology and the chemical or elemental distribution of the sample simultaneous. The combination of the nanoscopy endstation and the XUV beamline P04 results in a powerful tool for investigations of life science samples.BMBF, 05K13UL1, Verbundprojekt 05K2013 - Hochauflösende Bildgebung: Hochauflösende Bildgebung im EUV- und weichen Röntgenbereich bei PETRA III und FLASH. Teilprojekt 1

High amp; 8208;Resolution Kinoform X Ray Optics Printed via 405 nm 3D Laser Lithography

Efficient focusing of X rays is essential for high resolution X ray microscopy. Diffractive X ray optics called kinoforms offer the highest focusing efficiencies in theory. However, they have long remained unavailable due to their challenging nanofabrication. Recently, various X ray optic geometries including kinoforms have been realized using 3D laser lithography at near infrared wavelengths. As the smallest features period of the kinoform determines the resolving power, there is a natural drive to find ways to fabricate kinoforms with ever smaller features. Here, a custom built 3D laser lithography setup with an excitation wavelength of 405 nm is used, which allows to half the smallest period of the kinoforms compared to previous work. A 40 improvement in scanning transmission X ray microscopy image resolution, that is, a cutoff resolution of 145 nm, and an efficiency of 7.6 at 700 eV is achieved. A reconstructed pixel size of 18.5 nm, reaching the limit imposed by the design of the microscopy set up, is demonstrated through ptychographic imaging of a magnetic sample which has a strongly reduced contrast mechanism. Moreover, X ray lenses manufactured by 405 nm 3D laser lithography have the potential to become much less expensive than X ray lenses made by other mean

Excess-entropy scaling in supercooled binary mixtures

Supercooled liquids near the glass transition show remarkable non-Arrhenius transport phenomena, whose origin is yet to be clarified. Here, the authors use GPU molecular dynamics simulations for various binary mixtures in the supercooled regime to show the validity of a quasiuniversal excess-entropy scaling relation for viscosity and diffusion

Correction of axial position uncertainty and systematic detector errors in ptychographic diffraction imaging

Ptychography is a diffraction imaging method that allows one to solve inverse problems in microscopy with the ability to retrieve information about and correct for systematic errors. Here, we propose techniques to correct for axial position uncertainty, detector point spread, and inhomogeneous detector response using ptychography’s inherent self-calibration capabilities. The proposed methods are tested with visible light and x-ray experimental data. We believe that the results are important for precise calibration of ptychographic experimental setups and rigorous quantification of partially coherent beams by means of ptychography

High-resolution wavefront sensing of multi-spectral high-harmonic generation sources using ptychography

We perform high-resolution multi-spectral wavefront sensing on extreme ultraviolet sources produced by high-harmonic generation processes. Using ptychography, we show spectrally resolved complex-valued beam reconstructions for eight harmonics simultaneously, with a spatial resolution of 1 µm