7 research outputs found
Radiation effects in nanosized clusters
In this communication we present results of computer simulation of radiationenhanced
processes in nanosized ferromagnetic clusters under the irradiation by elementary
particles and ions. Dynamic defects and possibility of their experimental monitoring
are considered. Radiation resistance of nanostructured materials is characterized by the
size of instability region for knocked-out atom. Heating and thermoelastic effects on
defect structure and materials functionality are discussed.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/2085
Formation of silicon-based nanostructures by compression plasma flows
The use of compression flows (CPF) for the formation of metal and silicide nanostructures for data storage devices, thermoelectric materials and solar cells is presented.
The action of CPF with injected metallic powder results in the formation of coatings composed of spherical clusters with complex structure: each submicron cluster (0,1-0,2 ΞΌm radius) is formed from a number of nanosized ones (10-25 nm radius). The
action of CPF on binary βmetal-siliconβ systems provides formation of branched silicon dendrites (tip radius ~ 200 nm, primary spacing ~ 1,2 ΞΌm); interdendritic space is filled
with nanostructured (50-100 nm) βsilicide-siliconβ and βmonosilicide-disilicideβ composite due to melting of the surface layer, rapid solidification (~ 10-3 m/s) and constitutional overcooling. Mechanisms of formation of nanostructured composites on silicon surface and in thick surface layers is discussed in terms of order parameter evolution and non-equilibrium solidification models.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/2086
Nanostructured formations and coatings created on the surface of materials exposed to compression plasma flows
The paper presents the results of investigations on changing silicon and aluminium morphology under the action of compression plasma flows generated by the quasi-stationary plasma accelerator (magnetoplasma compressor type). The feasibility of spraying nanostructured metal films by compression flows was demonstrated. The resulting single-layer coating consists of spherical particles measuring 50 to 200 nm. Such particles bonded to each other cover a surface relief including flat areas and regular structures developing during plasma action. The state and composition of a sample surface were studied by SEM- and EXD-methodsΠΡΠ΅Π΄ΡΡΠ°Π²Π»Π΅Π½ΠΎ ΡΠ΅Π·ΡΠ»ΡΡΠ°ΡΠΈ Π΄ΠΎΡΠ»ΡΠ΄ΠΆΠ΅Π½Ρ Π·ΠΌΡΠ½ΠΈ ΠΌΠΎΡΡΠΎΠ»ΠΎΠ³ΡΡ ΠΏΠΎΠ²Π΅ΡΡ
Π½Ρ ΠΏΠ»Π°ΡΡΠΈΠ½ ΠΊΡΠ΅ΠΌΠ½ΡΡ ΠΉ Π°Π»ΡΠΌΡΠ½ΡΡ ΠΏΡΠΈ Π²ΠΏΠ»ΠΈΠ²Ρ Π½Π° Π½ΠΈΡ
ΠΊΠΎΠΌΠΏΡΠ΅ΡΡΠΉΠ½ΠΈΠΌΠΈ ΠΏΠ»Π°Π·ΠΌΠΎΠ²ΠΈΠΌΠΈ ΠΏΠΎΡΠΎΠΊΠ°ΠΌΠΈ, ΡΠΎ Π³Π΅Π½Π΅ΡΡΡΡΡΡΡ ΠΊΠ²Π°Π·ΡΡΡΠ°ΡΡΠΎΠ½Π°ΡΠ½ΠΈΠΌ ΠΏΠ»Π°Π·ΠΌΠΎΠ²ΠΈΠΌ ΠΏΡΠΈΡΠΊΠΎΡΡΠ²Π°ΡΠ΅ΠΌ ΡΠΈΠΏΡ ΠΌΠ°Π³Π½ΡΡΠΎΠΏΠ»Π°Π·ΠΌΠΎΠ²ΠΈΠΉ ΠΊΠΎΠΌΠΏΡΠ΅ΡΠΎΡ. ΠΡΠΎΠ΄Π΅ΠΌΠΎΠ½ΡΡΡΠΎΠ²Π°Π½ΠΎ ΠΌΠΎΠΆΠ»ΠΈΠ²ΡΡΡΡ Π½Π°Π½Π΅ΡΠ΅Π½Π½Ρ Π½Π° ΠΏΡΠ΄ΠΊΠ»Π°Π΄ΠΊΠΈ Π½Π°Π½ΠΎΡΡΡΡΠΊΡΡΡΠ½ΠΈΡ
ΠΌΠ΅ΡΠ°Π»Π΅Π²ΠΈΡ
ΠΏΠΎΠΊΡΠΈΡΡ Π·Π° Π΄ΠΎΠΏΠΎΠΌΠΎΠ³ΠΎΡ ΠΊΠΎΠΌΠΏΡΠ΅ΡΡΠΉΠ½ΠΈΡ
ΠΏΠΎΡΠΎΠΊΡΠ².ΠΡΠ΅Π΄ΡΡΠ°Π²Π»Π΅Π½Ρ ΡΠ΅Π·ΡΠ»ΡΡΠ°ΡΡ ΠΈΡΡΠ»Π΅Π΄ΠΎΠ²Π°Π½ΠΈΠΉ ΠΈΠ·ΠΌΠ΅Π½Π΅Π½ΠΈΡ ΠΌΠΎΡΡΠΎΠ»ΠΎΠ³ΠΈΠΈ ΠΏΠΎΠ²Π΅ΡΡ
Π½ΠΎΡΡΠΈ ΠΏΠ»Π°ΡΡΠΈΠ½ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ ΠΈ Π°Π»ΡΠΌΠΈΠ½ΠΈΡ ΠΏΡΠΈ Π²ΠΎΠ·Π΄Π΅ΠΉΡΡΠ²ΠΈΠΈ Π½Π° Π½ΠΈΡ
ΠΊΠΎΠΌΠΏΡΠ΅ΡΡΠΈΠΎΠ½Π½ΡΠΌΠΈ ΠΏΠ»Π°Π·ΠΌΠ΅Π½Π½ΡΠΌΠΈ ΠΏΠΎΡΠΎΠΊΠ°ΠΌΠΈ, Π³Π΅Π½Π΅ΡΠΈΡΡΠ΅ΠΌΡΠΌΠΈ ΠΊΠ²Π°Π·ΠΈΡΡΠ°ΡΠΈΠΎΠ½Π°ΡΠ½ΡΠΌ ΠΏΠ»Π°Π·ΠΌΠ΅Π½Π½ΡΠΌ ΡΡΠΊΠΎΡΠΈΡΠ΅Π»Π΅ΠΌ ΡΠΈΠΏΠ° ΠΌΠ°Π³Π½ΠΈΡΠΎΠΏΠ»Π°Π·ΠΌΠ΅Π½Π½ΡΠΉ ΠΊΠΎΠΌΠΏΡΠ΅ΡΡΠΎΡ. ΠΡΠΎΠ΄Π΅ΠΌΠΎΠ½ΡΡΡΠΈΡΠΎΠ²Π°Π½Π° Π²ΠΎΠ·ΠΌΠΎΠΆΠ½ΠΎΡΡΡ Π½Π°Π½Π΅ΡΠ΅Π½ΠΈΡ Π½Π° ΠΏΠΎΠ΄Π»ΠΎΠΆΠΊΠΈ Π½Π°Π½ΠΎΡΡΡΡΠΊΡΡΡΠ½ΡΡ
ΠΌΠ΅ΡΠ°Π»Π»ΠΈΡΠ΅ΡΠΊΠΈΡ
ΠΏΠΎΠΊΡΡΡΠΈΠΉ Ρ ΠΏΠΎΠΌΠΎΡΡΡ ΠΊΠΎΠΌΠΏΡΠ΅ΡΡΠΈΠΎΠ½Π½ΡΡ
ΠΏΠΎΡΠΎΠΊΠΎΠ²
Blister formation in ZrN/SiN multilayers after He irradiation
International audienceThe work is dedicated to the investigation of blister formation in ZrN/SiNx multilayer films irradiated with He ions (30β―keV) and annealed in a vacuum at 600β―Β°C. Multilayer films were prepared by reactive magnetron sputter-deposition on Si wafers under Arβ―+β―N2 plasma discharges. ZrN/SiNx films were deposited by sequential sputtering from elemental Zr and Si3N4 targets at substrate temperature of 300β―Β°C, with ZrN and SiNx layer thickness varying from 2 to 10β―nm. According to transmission electron microscopy (TEM), the multilayer films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. Surface morphology changes of ZrN/SiNx films irradiated with He ions (30β―keV) and annealed in a vacuum at 600β―Β°C were studied by scanning electron (SEM) and atomic-force microscopy (AFM) methods. It has been found that under He ions (30β―keV) irradiation ZrN/SiNx multilayer films remain resistant to blistering and flaking up to fluence of 8Β·1016β―cmβ2. The investigations have shown influence of the crystalline and amorphous layer thicknesses on the character and damage degree of the multilayer films surface as a result of post-radiation annealing at 600β―Β°C. In this work potential processes (mechanisms) of blister formation and flacking in ZrN/SiNx multilayer systems are discussed