Controlling germanium CMP selectivity through slurry mediation by surface active agents

Due to copyright restrictions, the access to the full text of this article is only available via subscription.New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing is germanium which enables improved device performance through better channel mobility in shallow trench isolation (STI) applications for advanced circuits. This paper focuses on controlling germanium/silica selectivity for advanced STI CMP applications through slurry modification by surface active agents. Surface adsorption characteristics of cationic and anionic surfactants on germanium and silica wafers are analyzed in order to control selectivity as well as the defectivity performance of the CMP applications. The effects of surfactant charge and concentration (up to self-assembly) are studied in terms of slurry stability, material removal rates and surface defectivity. Surface charge manipulation by the surfactant adsorption on the germanium surface is presented as the main criteria on the selection of the proper surfactant/oxidizer systems for CMP. The outlined correlations are systematically presented to highlight slurry modification criteria for the desired selectivity results. Consequently, the paper evaluates the slurry selectivity control and improvement criteria for the new materials introduced to microelectronics applications with CMP requirement by evaluating the germanium silica system as a model application.European Commissio

3B Yazıcı Teknolojilerindeki Kullanılan Yöntemler ve Gelişmeler Üzerine Bir Derleme

Günümüzün umut vadeden teknolojisi olarak eklemeli imalat (Eİ) veya 3B yazıcı teknolojileri farklı alanlarda kullanılabilecek ürünlerin/parçaların üretilmesi konusunda dikkatleri üzerine çekmektedir. 3B yazıcı teknolojileri ile farklı malzemeler kullanılarak istenilen mekanik ve yapısal özelliklere sahip parçalar üretilebilmektedir. Bu teknolojiler geleneksel üretim yöntemlerine göre parça tasarımında esneklik, üretim sürecinde ise malzeme, enerji ve maliyet tasarrufu sağlamaktadır. Bu çalışmada, 3B yazıcı teknolojileri, Amerikan Test ve Malzeme Derneği (ASTM) tarafından yapılan sınıflandırma temel alınarak yedi ana baslık altında sınıflandırılmıştır. Eİ yöntemleri çalışma prensibi ve kullanılan malzeme türü dikkate alınarak anlatılmış ve 3B yazıcılar ile yapılan çalışmalar incelenmiştir. Çalışmadan elde edilen sonuçlar, 3B yazıcı teknolojilerinde polimerler, metal ve alaşımları, seramikler ve kompozit malzemelerin hammadde olarak kullanılabildiği ve baskı sonrası ikincil işlemler ile oldukça yüksek mekanik özelliklere sahip parçaların üretilebildiğini göstermektedir. Diğer yandan, 3B baskı teknolojilerinin otomotiv, savunma, havacılık ve demiryolu taşımacılığı da dahil olmak üzere çok çeşitli endüstriyel sektörlerde kolayca prototip oluşturma ve bileşenlerin üretiminde yeni ufuklar açacağı beklenmektedir. Ancak 3B teknolojilerinde kullanılan malzeme sayısı şu an için oldukça sınırlıdır ve çalışmalar bu teknolojilerde kullanılabilecek yeni malzemelerin araştırılması üzerine yoğunlaşmalıdır

Evaluation of Anaesthetic Approaches in Transcatheter Aortic Valv Implantation Procedures

Objective:Transcatheter aortic valve implantation (TAVI) has emerged as an alternative to surgical aortic valve replacement and has become a popular treatment modality for inoperable or patients at high surgical risk with severe aortic stenosis. We aimed to evaluate our perioperative anaesthetic experiences with patients undergoing TAVI under sedation or general anaesthesia (GA).Methods:One hundred and fifty-nine patients who underwent TAVI procedures were enrolled. Effects on TAVI outcomes of sedation and GA were compared.Results:The duration of surgery and anaesthesia was significantly longer in patients who received GA. Insertion site complication and post-TAVI pacemaker implantation rates were similar between the groups, but the frequency of intraoperative complications (10% vs. 0.8%; P=0.015), intraoperative hypotension (35.3% vs. 70%; P < 0.001), and acute kidney injury (12.6% vs. 27.5%; P=0.028) was significantly higher in the GA group. Stroke occurred in seven patients, and all were in the sedation group.Conclusion:GA is related to increased procedure time and acute kidney injury; therefore, local anaesthesia and sedation may be the first option in patients undergoing TAVI

Improving selectivity on germanium CMP applications

Due to copyright restrictions, the access to the full text of this article is only available via subscription.In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical planarization applications. It was observed that the very strong or loose self-assembled surfactant structures can help obtain selectivity on the silica/germanium systems. Simultaneously, good defectivity control with a sufficient material removal rate was obtained. The surface charges manipulated by the surfactant adsorption and the hydrophobic nature of the germanium surface were main criteria on the selection of the proper surfactant/oxidizer system. In addition, impact of surfactant addition on particle-particle interactions controlling slurry stability was also investigated in the paper.European Commissio

KURUTMA İŞLEMİNİN ÜZÜMLERDE BULUNAN PESTİSİTLER ÜZERİNE ETKİSİ

Bu çalışmada üzümlerde bulunan chlorpyrifos, diazinon, dimethoate ve methidathion pestisitlerininkurutma kinetikleri belirlenmiştir. Güneşte ve farklı sıcaklılarda (50°C'de 72 saat, 60°C'de 60 saat,70°C'de 48 saat, 80°C'de 36 saat süre ile) hava akımlı etüvde kurutma işlemi olmak üzere iki farklı kurutmaişlemi uygulanmıştır. Güneşte kurutma işleminde chlorpyrifos, diazinon ve methidathion pestisitlerininyarılanma ömürleri sırasıyla 5.64, 6.42 ve 5.25 gün olarak bulunmuştur. Dimethoate verileri 0., 1. ve 2.derece kinetik uyumu göstermemiştir. Sıcaklık yükseldikçe pestisitlerin parçalanması artmıştır. Dimethoate,diazinon, chlorpyrifos ve methidathionun aktivasyon enerjileri sırasıyla 42.02, 42.18, 42.01 ve 41.08J/mol olarak hesaplanmıştır.In this study, drying kinetics of chlorpyrifos, diazinon, dimethoate and methidathion pesticides ongrape samples were determined. Grapes were dried under two conditions: by sunlight (for 21 days)and in a ventilated oven at different temperatures (at 50 &deg;C for 72 hrs, at 60 &deg;C for 60 hrs, at 70 &deg;C for 48hrs, at 80&deg;C for 36 hrs). During sun drying, half-lives of chlorpyrifos, diazinon and methidathion were5.64, 6.42 and 5.25 days, respectively. The data for dimethoate did not fit 0th,, 1stand 2ndorder kinetics.During oven-drying, the pesticides followed the first order kinetic model. When the temperatureincreased, degradation of pesticides raised. The activation energies of dimethoate, diazinon, chlorpyrifosand methidathion were calculated as 42.02, 42.18, 42.01 and 41.08 J/mol, respectively

Endoscopic pilonidal sinus treatment (EPSiT) in the pediatric age group: Short-term results

BACKGROUND: This study aims to evaluate the short term outcomes of the Endoscopic pilonidal sinus treatment (EPSiT) in the pediatric age group

Evaluation of infection resistance of biological implants through CMP based micro-patterning

Due to copyright restrictions, the access to the full text of this article is only available via subscription.Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim is to quantify the effect of controlled surface roughness on the infection resistance of the titanium based bio-materials which are commonly used for orthopedic devices and dental implants. To modify the surface roughness of the surfaces in a controlled manner, Chemical Mechanical Polishing (CMP) technique, which is extensively used in semiconductor industry for the planarization of the interlayer dielectrics and metals, is utilized. To determine the infection resistance of the created films with varying surface roughness, bacteria growth response was studied on titanium plates after CMP.European Commissio

Improving the scalability of ILP-based multi-relational concept discovery system through parallelization

Due to the increase in the amount of relational data that is being collected and the limitations of propositional problem definition in relational domains, multi-relational data mining has arisen to be able to extract patterns from relational data. In order to cope with intractably large search space and still to be able to generate high-quality patterns. ILP-based multi-relational data mining and concept discovery systems employ several search strategies and pattern limitations. Another direction to cope with the large search space is using parallelization. By parallel data mining, improvement in time efficiency and scalability can be provided without further limiting the language patterns. In this work, we describe a method for concept discovery with parallelization on an ILP-based concept discovery system. The non-parallel algorithm, namely Concept Rule Induction System (CRIS), is modified in such a way that the parts that involve high amount of query processing, which causes bottleneck, are reorganized in a data parallel way. The resulting algorithm is called, Parallel CRIS (pCRIS). A set of experiments is conducted in order to evaluate the performance of the proposed method