Lempeää pakottamista : Teatteri-ilmaisun ohjaajan tutkimus omasta ammatillisesta kasvusta

Tämä opinnäytetyö on toteutettu hermeneuttis – fenomenologisena tutkimuksena, jonka lisätukena tutkija käytti elämäkerrallista dialogia. Tässä opinnäytetyössä tutkija pohti omaa ammatillista kasvuaan ja kompetenssia toimiessaan taideopettajan työssä. Käytännön osuutena tutkija suunnitteli ja toteutti fyysisen ilmaisun kurssin Tamperelaisen harrastajateatterin jäsenille. Opinnäytetyössä tutkija valitsi kolme näkökulmaa, joiden kautta hän tarkasteli omaa opettajuuttaan sekä tarkasteli saamaansa palautetta kurssilleen osallistuneilta ihmisiltä. Opinnäytetyössä tutkija avaa kehittämäänsä opettamisen filosofiaa ja siitä, kuinka se näkyy hänen omassa opettamisessaan. Tästä opettamisen tavasta tekijä käyttää nimitystä Lempeä pakottaminen. Opinnäytetyön aikana tutkija pohti omaa näkemystään opettamisesta sekä opettajana toimimisesta ja työ onkin tarkoitettu niille, jotka ovat kiinnostuneita taideopettajan työstä ja ammatillisen kasvun prosessista luovassa työssä. Tämä opinnäytetyö auttoi tutkijaa hahmottamaan omaa kompetenssiaan toimia vastuutehtävissä sekä selkeytti hänen näkemyksiään opettajan työstä taidealalla.This thesis was carried out as a hermeneutic-phenomenological study, supported by biographical dialogue. In this thesis the researcher explored his own professional growth and his competence as a teacher. In the practical part the researcher designed and implemented a course in physical expression to the members of a Tampere amateur theatre. The researcher chose three perspectives through which he considered his own teacher identity, and reviewed the feedback received from the people who participated in his class. In the thesis the researcher tells about a teaching philosophy that he has developed himself and how this method shows in his way of teaching. He calls this method the method of gentle forcing. During the thesis the researcher pondered his own vision of teaching and working as a teacher. The thesis is meant for those who are interested in the art teacher’s work and the process of professional growth in creative work. This study helped the researcher to perceive his own competence to act in the positions of responsibility and clarified how he sees the teacher’s work in the field of art

Kaksi- ja kolmitasoisten kolmivaiheisten avaruusvektorimoduloitujen PWM vaihtosuuntaajien lähdön harmonisten vertailu

The usage of renewable energy sources is growing. These sources, such as photovoltaic devices and wind turbines, are connected to the power grids via inverters. Power electronic inverters produce non-sinusoidal voltages and increase the amount of unwanted distortion in the grids. Standards define the quality of the electricity in the power grids. Therefore, it is sensible to study the phenomena and methods to reduce the harmonic distortion in the outputs of different inverter topologies. LCL filters are used to suppress the harmonic components in the output waveforms of the grid connected inverters. The filter is one of the most expensive component in drive systems. The amount of harmonics can also be decreased by adding voltage levels to the inverter’s DC bus, optimizing the switching sequences and increasing the switching frequency. Therefore, better output harmonic performance can be achieved with the same LCL filter by using three-level inverter instead of two-level inverter. Three-level inverter also enables higher switching frequency. However, some additional costs are created, such as more semiconductor switches are needed, and the device requires more complex control system. The main issue in this thesis is to compare output harmonics between two- and three-level inverters. The studied topologies are two-level voltage source inverter and three-level neutral-point-clamped inverter. A detailed space vector modulation method is explained for these inverters. Requirements for a well implemented space vector modulator are also discussed. Space vector pulse width modulators are created using MATLAB® and Simulink®. Output harmonic performance is compared by simulations with different switching frequencies and modulation indexes under linear modulation region. The simulations show that increasing the switching frequency reduces the phase current’s harmonics. The switching frequency doesn’t have similar effect on the line-to-line voltage’s total harmonic distortion value. It only increase the frequencies where the voltage’s harmonic components occur. It’s also shown, that the voltage’s and current’s THD values in the NPC inverter are half of the THD values in the VSI. The modulation index has an effect on both, the line-to-line voltage’s and phase current’s THD values. When the modulation index is reduced, the voltage’s and current’s THD values are increased. Small modulation index value reduces the difference between output performance of the VSI and NPC inverters

Atomic Layer Deposition of Noble Metal Oxide and Noble Metal Thin Films

Atomic layer deposition (ALD) is a chemical gas phase deposition method to grow thin films which are highly uniform and conformal over large and complex substrate areas. Film growth in ALD is precise, remarkably repeatable, and combined with unparalleled control of the film thickness. These inherent properties make ALD an attractive method to deposit thin films for advanced technological applications such as microelectronics and nanotechnology. One material group in ALD which has matured in ten years and proven to be of wide technological importance is noble metals. The purpose of this study was to investigate noble metal oxide film growth by ALD. The ALD of noble metal oxides has been very limited compared to the noble metal growth. Another aim was to examine noble metal film deposition at temperatures lower than required in the earlier ALD noble metal processes. In addition, the selection of noble metals that can be grown by ALD was expanded with osmium. The results of the study showed that oxides of iridium, rhodium, platinum, and palladium can be deposited from the common noble metal precursors using ozone as the reactant at temperatures below 200 °C. The development of ozone-based ALD noble metal oxide processes led further on to the low temperature deposition of noble metals by adding a reductive molecular hydrogen step after every oxidative ozone step. The noble metal deposition via noble metal oxide growth was achieved at lower temperatures than required with the common oxygen-based ALD noble metal processes. Film growth rates, resistivities, purities, and surface roughnesses resulting from the studied noble metal oxide and noble metal processes were reasonable. The processes showed some shortcomings but offer an alternative thermal ALD pathway to deposit noble metals and noble metal oxides compared to the oxygen-based ALD processes. Keywords: atomic layer deposition, ALD, noble metal oxide, noble metal, thin film, ozoneAtomikerroskasvatus (Atomic Layer Deposition, ALD) on kemiallinen ohutkalvojen kasvatusmenetelmä, joka kehitettiin Suomessa 1970-luvulla. ALD-menetelmässä kiinteä pinta altistetaan vuoronperään erillisille kaasumaisille lähtöaineiksi kutsutuille yhdisteille, jotka reagoivat hallitusti pinnan kanssa. Toistamalla vuoroittaisia lähtöainealtistuksia pinnan päälle muodostuu ohut, paksuudeltaan nanomittakaavassa oleva pinnoite eli ohutkalvo. ALD-menetelmässä ohutkalvon kasvu on hyvin täsmällistä ja erittäin toistettavaa, jonka johdosta ohutkalvon paksuus on tarkasti säädeltävissä. Ohutkalvo muodostuu myös erittäin tasalaatuisena ja tasapaksuna laajojen, hyvinkin monimuotoisten pintojen päälle. Ominaisuuksiensa ansiosta ALD on erittäin kiinnostava menetelmä moniin kehittyneisiin sovelluksiin mikroelektroniikan ja nanoteknologian saralla. ALD-menetelmällä kasvatettavien materiaalien kirjo on hyvin monipuolinen; tosin perinteisesti metalliohutkalvojen kasvattaminen on ollut hyvin haastavaa. Poikkeuksen on osin muodostanut ryhmä jalometalleja, jotka ovat laajalti hyödynnettävissä monissa sovelluksissa. Jalometalliryhmään luetaan kuuluvaksi rutenium, osmium, rodium, iridium, palladium, platina, hopea ja kulta. ALD-menetelmällä kasvatetut ensimmäiset jalometalliohutkalvot raportoitiin kymmenen vuotta sitten. Siitä lähtien ALD-jalometallit ovat olleet laajan tutkimuksen kohteena, niin uusien lähtöaineiden, kasvatusprosessien kuin täydentävien jalometallienkin osalta. Väitöskirjassa esitetään kattava kirjallisuuskatsaus jalometalliohutkalvojen ALD-tutkimuksen nykytilasta. Vastaavasti jalometalliyhdisteiden kuten oksidiohutkalvojen kasvatus on ollut hyvin rajallista, joten väitöskirjatyössä keskityttiin tarkastelemaan ALD-menetelmän käyttöä jalometallioksidiohutkalvojen kasvatuksessa. Myös jalometalliohutkalvojen kasvatusta tutkittiin alhaisemmissa kasvatuslämpötiloissa kuin ALD-menetelmässä on aiemmin yleisesti vaadittu. Lisäksi väitöstyössä onnistuttiin kasvattamaan osmiumohutkalvoja ensimmäisen kerran ALD-menetelmällä. Väitöskirjatyön tulokset osoittavat, että iridium-, rodium-, platina-, ja palladiumoksidiohutkalvoja voidaan kasvattaa ALD-menetelmällä alle 200 °C lämpötilassa käyttäen otsonia ja yleisiä, tyypillisiä jalometallilähtöaineita. Otsonipohjaisten jalometallioksidiprosessien kehittäminen johti edelleen jalometallikalvojen muodostumiseen, kun jokaisen hapettavan otsonialtistuksen jälkeen pinta altistettiin pelkistävälle vetykaasulle. Väitöskirjatyössä kehitetyt otsonipohjaiset kasvatusprosessit tarjoavat vaihtoehtoisen tavan kasvattaa jalometalli- ja jalometallioksidiohutkalvoja aiempiin happipohjaisiin ALD-kasvatusprosesseihin verrattuna

Topographic and electronic contrast of the graphene moir\'e on Ir(111) probed by scanning tunneling microscopy and non-contact atomic force microscopy

Epitaxial graphene grown on transition metal surfaces typically exhibits a moir\'e pattern due to the lattice mismatch between graphene and the underlying metal surface. We use both scanning tunneling microscopy (STM) and atomic force microscopy (AFM) experiments to probe the electronic and topographic contrast of the graphene moir\'e on the Ir(111) surface. While STM topography is influenced by the local density of states close to the Fermi energy and the local tunneling barrier height, AFM is capable of yielding the 'true' surface topography once the background force arising from the van der Waals (vdW) interaction between the tip and the substrate is taken into account. We observe a moir\'e corrugation of 35$\pm$10 pm, where the graphene-Ir(111) distance is the smallest in the areas where the graphene honeycomb is atop the underlying iridium atoms and larger on the fcc or hcp threefold hollow sites.Comment: revised versio

Satellite-Assisted Multi-Connectivity in Beyond 5G

Due to the ongoing standardization and deployment activities, satellite networks will be supplementing the 5G and beyond Terrestrial Networks (TNs). For the satellite communications involved to be as efficient as possible, techniques to achieve that should be used. Multi-Connectivity (MC), in which a user can be connected to multiple Next Generation Node Bs simultaneously, is one such technique. However, the technique is not well-researched in the satellite environment. In this paper, an algorithm to activate MC for users in the weakest radio conditions is introduced. The algorithm operates dynamically, considering deactivation of MC to prioritize users in weaker conditions when necessary. The algorithm is evaluated with a packet-level 5G non-terrestrial network system simulator in a scenario that consists of a TN and transparent payload low earth orbit satellite. The algorithm outperforms the benchmark algorithms. The usage of MC with the algorithm increases the mean throughput of the users by 20.3% and the 5th percentile throughput by 83.5% compared to when MC is turned off.Comment: Accepted to be published in: 24th IEEE International Symposium on a World of Wireless, Mobile and Multimedia Networks (WoWMoM), June 12-15 2023, Boston, Massachusett

Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditions

Van der Waals epitaxy holds great promise in producing high-quality films of 2D materials. However, scalable van der Waals epitaxy processes operating at low temperatures and low vacuum conditions are lacking. Herein, atomic layer deposition is used for van der Waals epitaxy of continuous multilayer films of 2D materials HfS2, MoS2, SnS2, and ZrS2 on muscovite mica and PbI2 on sapphire at temperatures between 75 degrees C and 400 degrees C. For the metal sulfides on mica, the main epitaxial relation is MS2 mica. Some domains rotated by 30 degrees are also observed corresponding to the MS2 mica alignment. In both cases, the presence of domains rotated by 60 degrees (mirror twins) is also expected. For PbI2 on sapphire, the epitaxial relation is PbI2 Al2O3 with no evidence of 30 degrees domains. For all of the studied systems there is relatively large in-plane mosaicity and in the PbI2/Al2O3 system some non-epitaxial domains are also observed. The study presents first steps of an approach towards a scalable and semiconductor industry compatible van der Waals epitaxy method.Peer reviewe

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

Abstract Rhenium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over a wide deposition temperature range using fast, simple, and robust surface reactions between rhenium pentachloride and ammonia. Films are grown and characterized for compositions, surface morphologies and roughnesses, crystallinities, and resistivities. Conductive rhenium subnitride films of tunable composition are obtained at deposition temperatures between 275 and 375 °C, whereas pure rhenium metal films grow at 400 °C and above. Even a just 3 nm thick rhenium film is continuous and has a low resistivity of about 90 µΩ cm showing potential for applications for which also other noble metals and refractory metals have been considered.Peer reviewe

Pyridinethiol-Assisted Dissolution of Elemental Gold in Organic Solutions

Dissolution of elemental gold in organic solutions is a contemporary approach to lower the environmental burden associated with gold recycling. Herein, we describe fundamental studies on a highly efficient method for the dissolution of elemental Au that is based on DMF solutions containing pyridine-4-thiol (4-PSH) as a reactive ligand and hydrogen peroxide as an oxidant. Dissolution of Au proceeds through several elementary steps: isomerization of 4-PSH to pyridine-4-thione (4-PS), coordination with Au-0, and then oxidation of the Au-0 thione species to Au-I simultaneously with oxidation of free pyridine thione to elemental sulfur and further to sulfuric acid. The final dissolution product is a Au-I complex bearing two 4-PS ligands and SO42- as a counterion. The ligand is crucial as it assists the oxidation process and stabilizes and solubilizes the formed Au cations.Peer reviewe

Do the ecological drivers of lake littoral communities match and lead to congruence between organism groups?

Lake littoral environments are heterogeneous, and different organisms typically show specific responses to this environmental variation. We examined local environmental and spatial factors affecting lake littoral biodiversity and the structuring of assemblages of phytoplankton, zooplankton and macroinvertebrates within and among three basins of a large lake system. We explored congruence of species composition and species richness among the studied organism groups to evaluate their general indicator potential to represent spatial variation in other groups. We expected that effects of water chemistry on plankton assemblages were stronger than effects of habitat characteristics. In contrast, we anticipated stronger effects of habitat on macroinvertebrates due to their mainly benthic mode of life. We also expected that within-basin spatial effects would be strongest on macroinvertebrates and weakest on phytoplankton. We predicted weak congruence in assemblage composition and species richness among the organism groups. Phytoplankton assemblages were mainly structured by the shared effects of water chemistry and large-scale spatial factors. In contrast to our expectations, habitat effects were stronger than water chemistry effects on zooplankton assemblages. However, as expected, macroinvertebrate species composition and richness were mainly affected by habitat conditions. Among-group congruence was weak for assemblage composition and insignificant for richness. Albeit weak, congruence was strongest between phytoplankton and zooplankton assemblages, as we expected. In summary, our analyses do not support the idea of using a single organism group as a wholesale biodiversity indicator

Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

We have developed a low-temperature atomic layer deposition (ALD) process for depositing crystalline and phase pure spinel cobalt oxide (Co3O4) films at 120 °C using [Co(tBu2DAD)2] and ozone as coreagent. X-ray diffraction, UV–vis spectroscopy, atomic force microscopy, field emission scanning electron microscopy, X-ray photoelectron spectroscopy, and time-of-flight elastic recoil detection analysis were performed to characterize the structure and properties of the films. The as-deposited Co3O4 films are crystalline with a low amount of impurities (<2% C and <5% H) despite low deposition temperatures. Deposition of Co3O4 onto thin TiO2 photoanodes (100 nm) for water oxidation resulted in 30% improvement of photocurrent (after 10 ALD cycles yielding small Co3O4 particles) as compared to pristine TiO2 films), and exhibited no detrimental effects on photocurrent response up to 300 deposition cycles (approximately 35 nm thick films), demonstrating the applicability of the developed ALD process for deposition of effective catalyst particles and layers in photoelectrochemical water-splitting devices.Peer reviewe