Quasi-two-dimensional superconductivity in wurtzite-structured InN films

[[abstract]]C-axis oriented InN films with wurtzite structure were grown on sapphire (0001) substrate by MOCVD method. Superconductivity with transition onset temperature Tc,onset around 3.5 K has been characterized by magnetotransport measurements in fields up to 9 Tesla for films with carrier concentration in the range of 1×1019 cm–3 to 7×1020 cm–3. Among them, the film with a nitridation buffer layer has the highest zero-resistance temperature Tc0 of 2 K. The normal-state magnetoresistance follows Kohler's rule ΔR /R ∝ (H /R)2, indicating that there is a single species of charge carrier with single scattering time at all points on the Fermi surface. The extrapolated value of zero-temperature upper critical field Hc 2ab (0) and Hc 2c (0) is estimated to be 5900 G and 2800 G, respectively, giving rise to the anisotropy parameter about 2.1. The angular dependence of the upper critical field is in good agreement with the behavior predicted by Lawrence-Doniach model in the two-dimensional (2D) limit strongly suggesting that the InN film is a quasi-2D superconductor. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)[[notice]]補正完畢[[incitationindex]]SCI[[booktype]]紙

Non-intrinsic superconductivity in InN epilayers: role of Indium Oxide

In recent years there have been reports of anomalous electrical resistivity and the presence of superconductivity in semiconducting InN layers. By a careful correlation of the temperature dependence of resistivity and magnetic susceptibility with structural information from highresolution x-ray diffraction measurements we show that superconductivity is not intrinsic to InN and is seen only in samples that show traces of oxygen impurity. We hence believe that InN is not intrinsically a superconducting semiconductor.Comment: pdf file with figure

Phase mapping of aging process in InN nanostructures: oxygen incorporation and the role of the zincblende phase

Uncapped InN nanostructures undergo a deleterious natural aging process at ambient conditions by oxygen incorporation. The phases involved in this process and their localization is mapped by Transmission Electron Microscopy (TEM) related techniques. The parent wurtzite InN (InN-w) phase disappears from the surface and gradually forms a highly textured cubic layer that completely wraps up a InN-w nucleus which still remains from original single-crystalline quantum dots. The good reticular relationships between the different crystals generate low misfit strains and explain the apparent easiness for phase transformations at room temperature and pressure conditions, but also disable the classical methods to identify phases and grains from TEM images. The application of the geometrical phase algorithm in order to form numerical moire mappings, and RGB multilayered image reconstructions allows to discern among the different phases and grains formed inside these nanostructures. Samples aged for shorter times reveal the presence of metastable InN:O zincblende (zb) volumes, which acts as the intermediate phase between the initial InN-w and the most stable cubic In2O3 end phase. These cubic phases are highly twinned with a proportion of 50:50 between both orientations. We suggest that the existence of the intermediate InN:O-zb phase should be seriously considered to understand the reason of the widely scattered reported fundamental properties of thought to be InN-w, as its bandgap or superconductivity.Comment: 18 pages 7 figure

Raman spectroscopy of InN films grown on Si

We have used Raman spectroscopy to study indium nitride thin films grown by molecular beam epitaxy on (111) silicon substrates at temperatures between 450 and 550 C. The Raman spectra show well defined peaks at 443, 475, 491, and 591 cm{-1}, which correspond to the A_1(TO), E_1(TO), E_2^{high}, and A_1(LO) phonons of the wurtzite structure, respectively. In backscattering normal to the surface the A_1(TO) and E_1(TO) peaks are very weak, indicating that the films grow along the hexagonal c axis. The dependence of the peak width on growth temperature reveals that the optimum temperature is 500 C, for which the fullwidth of the E_2^{high} peak has the minimum value of 7 cm{-1}. This small value, comparable to previous results for InN films grown on sapphire, is evidence of the good crystallinity of the films.Comment: 3 pages, 1 eps figure, RevTe

Raman scattering by longitudinal optical phonons in InN nanocolumns grown on Si(111) and Si(001) substrates

Raman measurements in high-quality InN nanocolumns and thin films grown on both Si(1 1 1) and Si(1 0 0) substrates display a low-energy coupled LO phonon–plasmon mode together with uncoupled longitudinal optical (LO) phonons. The coupled mode is attributed to the spontaneous accumulation of electrons on the lateral surfaces of the nanocolumns, while the uncoupled ones originates from the inner part of the nanocolumns. The LO mode in the columnar samples appears close to the E1(LO) frequency. This indicates that most of the incident light is entering through the lateral surfaces of the nanocolumns, resulting in pure longitudinal–optical mode with quasi-E1 symmetry. For increasing growth temperature, the electron density decreases as the growth rate increases. The present results indicate that electron accumulation layers do not only form on polar surfaces of InN, but also occur on non-polar ones. According to recent calculations, we attribute the electron surface accumulation to the temperature dependent In-rich surface reconstruction on the nanocolumns sidewalls

Mie-resonances, infrared emission and band gap of InN

Mie resonances due to scattering/absorption of light in InN containing clusters of metallic In may have been erroneously interpreted as the infrared band gap absorption in tens of papers. Here we show by direct thermally detected optical absorption measurements that the true band gap of InN is markedly wider than currently accepted 0.7 eV. Micro-cathodoluminescence studies complemented by imaging of metallic In have shown that bright infrared emission at 0.7-0.8 eV arises from In aggregates, and is likely associated with surface states at the metal/InN interfaces.Comment: 4 pages, 5 figures, submitted to PR

Inelastic light scattering spectroscopy of semiconductor nitride nanocolumns

International audienceA review of inelastic light scattering measurements on group III-nitride nanocolumns grown by molecular beam epitaxy is presented. The nanocolumns are hexagonal, high quality single crystals with diameters in the range of 20 to 100 nm, with no traces of extended defects. GaN nanocolumns grown on bare Si substrates with both (111) and (100) orientation display narrow phonon peaks, indicating the absence of strain inhomogeneities. This opens the possibility of efficient integration of the nanocolumns as optoelectronic devices with the complementary metal oxide semiconductor technology. Measurements of the E2 phonon frequency on AlGaN nanocolumns indicate a linear dependence of the Al concentration on the Al relative flux, up to 60%. The E2 peak width increases with Al content due to phonon damping by alloy scattering. Inelastic light scattering measurements in InN nanocolumns display a coupled LO phonon-plasmon mode together with uncoupled phonons. The coupled mode is not observed in a reference compact sample. The origin of the coupled mode is attributed to spontaneous accumulation of electrons at the lateral surfaces of the nanocolumns. The presence of free electrons in the nanocolumns is confirmed by infrared reflectance measurements