32 research outputs found
CHARACTERIZATION OF DIELECTRIC FILMS ON SEMICONDUCTOR SUBSTRATES BY LEAKY-MODES MEASUREMENT
No full textLe concept et la technique de mesure des modes à fuite en optique intégrée sont utilisés pour la caractérisation de films diélectriques déposés sur des substrats absorbants et de haut indice de réfraction.The concept and measurement technique of leaky modes in integrated optics are applied to the characterization of dielectric films on lossy and high index substrates
Optimization of the Depth of Focus based on the analysis of the diffraction orders in the pupil plane
No full textInternational audienc
Complementary double exposure technique (CODE), solutions to the two-dimensional structures of 90nm node
No full textComplementary Double Exposure Technique (CODE): a way to print 80nm and 65nm gate level using a double exposure binary mask approach
No full textInternational audienc
Using the CODE technique to print complex two-dimensional structures in a 90 nm ground rule process
No full textUsing the CODE technique to print complex two-dimensional structures in a 90 nm ground rule process
No full textCombination of multiple focal planes and PSM in study of proximity effects for sub 120nm node with KrF and ArF lithography
No full textInternational audienc
