Extreme ultraviolet radiation from pulsed discharges: A new access to "nanoscopy" and "nanolytics"

Both, microscopic and analytic techniques using light (IR, VIS, UV) or X-rays reach their limits when dealing with mesoscopic or nanoscale samples. Conventional instrumentation for nanotechnology do the jobs as long as surface properties or thin layers are investigated, but lack of sufficient penetration and / or resolution when bulk properties of the samples become relevant. Using photons, only the Extreme Ultraviolet (XUV) spectral range comprising EUV, soft-X-rays, VUV offers an outstanding combination of features needed for structuring and analyzing of matter on the 10 to 1000 nm lateral and vertical scale: XUV-radiation is traditionally exploited at beamlines at large storage-ring facilities like BESSY II. The fact that the roadmap of the semiconductor industry drives the development of the basic components required, allows to disseminate EUV-technology to laboratories for nanosciences and nanotechnology

Large-Field Ion-Optics for Projection and Proximity Printing and for Mask-Less Lithography (ML2)

Recent studies carried out with Infineon Technologies have shown the utility of Ion Projection Lithography (IPL) for the manufacturing of integrated circuits. In cooperation with IBM Storage Technology Division the patterning of magnetic films by resist-less Ion Projection Direct Structuring (IPDS) has been demonstrated. With masked ion beam proximity techniques unique capabilities for lithography on non-planar (curved) surfaces are outlined. Designs are presented for a masked ion beam proximity lithography (MIBPL) exposure tool with sub - 20 nm resolution capability within 88 mmo exposure fields. The possibility of extremely high reduction ratios (200:1) for high-volume ion projection mask-less lithography (IP-ML2) is discussed

Large-Field Ion-Optics for Projection and Proximity Printing and for Mask-Less Lithography (ML2)

Recent studies carried out with Infineon Technologies have shown the utility of Ion Projection Lithography (IPL) for the manufacturing of integrated circuits. In cooperation with IBM Storage Technology Division the patterning of magnetic films by resist-less Ion Projection Direct Structuring (IPDS) has been demonstrated. With masked ion beam proximity techniques unique capabilities for lithography on non-planar (curved) surfaces are outlined. Designs are presented for a masked ion beam proximity lithography (MIBPL) exposure tool with sub - 20 nm resolution capability within 88 mmo exposure fields. The possibility of extremely high reduction ratios (200:1) for high-volume ion projection mask-less lithography (IP-ML2) is discussed

LIBRA-LiTE: A commercial size light ion fusion power plant

SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekDEGerman

LIBRA - a light ion beam fusion conceptual reactor design

Copy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEDEGerman

Minjingu phosphate rock availability in low-pH highly weathered soil as affected by added salts

Concentrations and identity of ions in the soil solution may affect soil phosphorus (P) reactions and P availability. In this study, the magnitude of these reactions was evaluated following the application of Minjingu phosphate rock (MPR) combined with chloride and carbonate salts of Na and Ca within an incubation experiment. Twenty-one days later NaOH-P and HCl-P were determined. This investigation was undertaken with the aim of identifying the role of Ca-ion activity in the liquid phase on the solubilization of MPR and formation of insoluble Ca-P phases. The increase in pH was higher with Na2CO3 than with CaCO3, while both CaCl2 and NaCl resulted in slight decreases in pH. The dissolution of MPR was higher overall when MPR was applied singularly than for the combined application of the phosphate rock with salts of calcium or sodium after 60 days of incubation. Dissolution of MPR decreased as levels of CaCO3 or CaCl2 increased but the decrease was more pronounced in CaCO3-treated than in CaCl2-treated soils. Ca-ion activity in the liquid phase is the main factor responsible for the insolubilization of MPR and the formation of insoluble Ca-P phases (HCl P). The formation of Ca-P solid phases increased with the concentration of Ca-ions, and was governed by the pH and nature of the accompanying anion. For soils with low levels of exchangeable cations and where liming is a recommended intervention measure, Ca from lime will form insoluble P phases and reduce the dissolution of PR and P availability to plants