Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometry

Optical scatterometry is the state of art optical inspection technique for quality control in lithographic process. As such, any boost in its performance carries very relevant potential in semiconductor industry. Recently we have shown that coherent Fourier scatterometry (CFS) can lead to a notably improved sensitivity in the reconstruction of the geometry of printed gratings. In this work, we report on implementation of a CFS instrument, which confirms the predicted performances. The system, although currently operating at a relatively low numerical aperture (NA = 0.4) and long wavelength (633 nm) allows already the reconstruction of the grating parameters with nanometer accuracy, which is comparable to that of AFM and SEM measurements on the same sample, used as reference measurements. Additionally, 1 nm accuracy in lateral positioning has been demonstrated, corresponding to 0.08% of the pitch of the grating used in the actual experiment

Lorentz Beams

A new kind of tridimensional scalar optical beams is introduced. These beams are called Lorentz beams because the form of their transverse pattern in the source plane is the product of two independent Lorentz functions. Closed-form expression of free-space propagation under paraxial limit is derived and pseudo non-diffracting features pointed out. Moreover, as the slowly varying part of these fields fulfils the scalar paraxial wave equation, it follows that there exist also Lorentz-Gauss beams, i.e. beams obtained by multipying the original Lorentz beam to a Gaussian apodization function. Although the existence of Lorentz-Gauss beams can be shown by using two different and independent ways obtained recently from Kiselev [Opt. Spectr. 96, 4 (2004)] and Gutierrez-Vega et al. [JOSA A 22, 289-298, (2005)], here we have followed a third different approach, which makes use of Lie's group theory, and which possesses the merit to put into evidence the symmetries present in paraxial Optics.Comment: 11 pages, 1 figure, submitted to Journal of Optics

Phase retrieval between overlapping orders in coherent Fourier scatterometry using scanning

Non-interferometric phase retrieval from the intensity measurements in Coherent Fourier Scatterometry (CFS) is presented using a scanningfocused spot. Formulae to determine the state of polarization of the scattered light and to retrieve the phase difference between overlappingscattered orders are given. The scattered far field is rigorously computed and the functionality of the method is proved with experimentalresults

Initial Experience With Single-Isocenter Radiosurgery to Target Multiple Brain Metastases Using an Automated Treatment Planning Software: Clinical Outcomes and Optimal Target Volume Margins Strategy

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Scanning effects in coherent fourier scatterometry

Incoherent Fourier Scatterometry (IFS) is a successful tool for high accuracy nano-metrology. As this method uses only far field measurements, it is very convenient from the point of view of industrial applications. A recent development is Coherent Fourier Scatterometry (CFS) in which incoherent illumination is replaced by a coherent one. Through sensitivity analyses using rigorous electromagnetic simulations, we show that the use of coherence and multiple scanning makes Coherent Fourier Scatterometry (CFS) more sensitive than Incoherent Fourier Scatterometry (IFS). We also report that in Coherent Fourier Scatterometry it is possible to determine the position of the sample with respect to the optical axis of the system to a precision dependent only on the experimental noise