Structure relationship - conduction properties in nanostructured W-Cu films

Des films minces de W et de W-Cu ont été déposés par co-pulvérisation GLAD à partir de deux cibles opposées de W et Cu. Chaque cible a été focalisée sur le centre du substrat avec un angle d'inclinaison α = 80°. Plusieurs séries d’échantillons ont été réalisées en faisant varier différents paramètres expérimentaux : la pression de travail, l’épaisseur des films ainsi que les intensités du courant des cibles. La nature des films préparés et leurs propriétés ont été étudiées pour comprendre les corrélations entre les caractéristiques structurales et les comportements électriques des films. Les paramètres expérimentaux jouent un rôle fondamental sur la forme des colonnes, leur angle de croissance, et sur la composition élémentaire des films colonnaires de W-Cu. Une variation systématique de ces paramètres a permis de relier certaines caractéristiques morphologiques et structurales aux propriétés de transport électronique dans ces films colonnaires. Le cuivre a été dissout chimiquement afin d’obtenir une structure plus poreuse, ceci dans l’objectif d’améliorer l’anisotropie électrique. Parallèlement à cette approche expérimentale, un modèle théorique a été développé pour comprendre les propriétés de conduction dans les films en tenant compte de la géométrie anisotrope des colonnes. Ce modèle a été appliqué aux films de W et W-Cu bruts et gravés.W and W-Cu thin films were deposited by the GLAD co-sputtering technique from two opposite targets: W and Cu. Each target was focused on the center of the substrate with a tilt angle of α = 80 °. Several series were prepared changing some experimental parameters: the sputtering pressure, the film’s thickness as well as the target currents. The nature of as-deposited films and their morphological properties were studied in order to understand the correlations between some structural characteristics and electrical behaviors of these structured films. The experimental parameters play a key-role on the shape of the columns, their angle of inclination, and the elemental composition of these W-Cu films. The influence of these parameters on the films morphology was demonstrated and related to the electronic transport properties in these columnar films. The copper was chemically etched in order to obtain a more porous structure, with the aim of improving the electrical anisotropy. A theoretical model was also developed in order to understand the electrical conductivity mechanism in these columnar films taking into account the anisotropic structure of the columns. This model was applied to W, as-deposited W-Cu and etched W-Cu films

Relations structure - propriétés de conduction dans des films W-Cu nanostructurés

W and W-Cu thin films were deposited by the GLAD co-sputtering technique from two opposite targets: W and Cu. Each target was focused on the center of the substrate with a tilt angle of α = 80 °. Several series were prepared changing some experimental parameters: the sputtering pressure, the film’s thickness as well as the target currents. The nature of as-deposited films and their morphological properties were studied in order to understand the correlations between some structural characteristics and electrical behaviors of these structured films. The experimental parameters play a key-role on the shape of the columns, their angle of inclination, and the elemental composition of these W-Cu films. The influence of these parameters on the films morphology was demonstrated and related to the electronic transport properties in these columnar films. The copper was chemically etched in order to obtain a more porous structure, with the aim of improving the electrical anisotropy. A theoretical model was also developed in order to understand the electrical conductivity mechanism in these columnar films taking into account the anisotropic structure of the columns. This model was applied to W, as-deposited W-Cu and etched W-Cu films.Des films minces de W et de W-Cu ont été déposés par co-pulvérisation GLAD à partir de deux cibles opposées de W et Cu. Chaque cible a été focalisée sur le centre du substrat avec un angle d'inclinaison α = 80°. Plusieurs séries d’échantillons ont été réalisées en faisant varier différents paramètres expérimentaux : la pression de travail, l’épaisseur des films ainsi que les intensités du courant des cibles. La nature des films préparés et leurs propriétés ont été étudiées pour comprendre les corrélations entre les caractéristiques structurales et les comportements électriques des films. Les paramètres expérimentaux jouent un rôle fondamental sur la forme des colonnes, leur angle de croissance, et sur la composition élémentaire des films colonnaires de W-Cu. Une variation systématique de ces paramètres a permis de relier certaines caractéristiques morphologiques et structurales aux propriétés de transport électronique dans ces films colonnaires. Le cuivre a été dissout chimiquement afin d’obtenir une structure plus poreuse, ceci dans l’objectif d’améliorer l’anisotropie électrique. Parallèlement à cette approche expérimentale, un modèle théorique a été développé pour comprendre les propriétés de conduction dans les films en tenant compte de la géométrie anisotrope des colonnes. Ce modèle a été appliqué aux films de W et W-Cu bruts et gravés

Contrasted morphologies in nanostructured Janus W-Cu columns

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Resistivity anisotropy of tilted columnar W and W–Cu thin films

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Accent 3"/&gt <w:LsdException Locked="false" Priority="67" Name="Medium Grid 1 Accent 3"/&gt <w:LsdException Locked="false" Priority="68" Name="Medium Grid 2 Accent 3"/&gt <w:LsdException Locked="false" Priority="69" Name="Medium Grid 3 Accent 3"/&gt <w:LsdException Locked="false" Priority="70" Name="Dark List Accent 3"/&gt <w:LsdException Locked="false" Priority="71" Name="Colorful Shading A

Qualitative evidence of the flexoelectric effect in a single multi-wall carbon nanotube by nanorobotic manipulation

International audienceThe flexoelectric effect corresponds to the linear variation of the electric polarization of a<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtmaterial subjected to a strain gradient (i.e. during its mechanical bending). Unlike</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtpiezoelectricity, it also exists in non-centrosymmetric materials. Furthermore, due to the</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtgradient term, its magnitude can increase as the size of the system decreases. Thanks to this</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gteffect, nanoscale systems could be used to harvest thermal vibration energy to power a</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtmicrodevice. These could be multi-wall carbon nanotubes since they are known to bend easily</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtin an elastic manner. However, it is very challenging to experimentally measure the</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtflexoelectric behavior of a single multi-wall carbon nanotube due to its small size (less than 50</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtnm in diameter), to the low level of induced charges and to the need to vary the imposed stress.</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtTo progress in this direction, a six-degree-of-freedom robot with a fiber tip is used inside a</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtdual-beam microscope to pick up a few single carbon nanotubes from a tangle and connect them</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtto the fiber tip. After ion-soldering the two tips, each carbon nanotube is dynamically bent</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtseveral times while monitoring the brightness of the bending area and its effective radius of</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtcurvature. This allowed us to demonstrate qualitatively the flexoelectric effect at the level of a</span&gt</font&gt</div&gt<div style=""&gt<font face="arial, helvetica"&gt<span style="font-size: 13px;"&gtsingle MWCNT.</span&gt</font&gt</div&g

Anisotropic conductivity enhancement in inclined W-Cu columnar films

International audienceTwo immiscible metals (W and Cu) were deposited using two metallic targets by GLAD co-sputtering. A wet chemical etching technique was implemented to remove the copper and modify the typical inclined microstructure into a more porous architecture. The electrical resistivity behavior of the co-sputtered W-Cu film was characterized as a function of temperature before and after wet chemical etching. The results show that the columnar microstructure exhibits metallic-like electrical properties. The average DC electrical resistivity ρ changes from 1.66 × 10−5 Ωm to 4.28 × 10−5 Ωm after etching. The anisotropy at room temperature is A = 1.8 ± 0.1 for as-deposited W-Cu film and reaches 2.8 ± 0.1 after the etching procedure

Anisotropic thermal conductivity of nanocolumnar W thin films

International audienceWe report on experimental investigations of the thermal conductivity in W thin films 350 nm thick sputter-deposited by glancing angle deposition (GLAD). The 3ω method is used to measure the in-plane thermal conductivity kx and ky for films deposited with a deposition angle α of 0° and 80°. For classical films (α = 0°), the thermal conductivity is 71 Wm-1K-1 for both x and y directions, whereas for GLAD films (α = 80°) the in-plane conduction strongly drops with kx = 3.2 Wm-1K-1 and ky = 4.8 Wm-1K-1. The in-plane thermal conductivity anisotropy is determined with a heat conduction favored in the direction perpendicular to the deposition axis (anisotropic ratio of 1.5), which is connected to the anisotropic columnar microstructure. Some correlations with the electrical conductivity are discussed showing a significant deviation from the Wiedemann-Franz law for the in-plane transport properties of GLAD W films

Correlation between structure and electrical resistivity of W-Cu thin films prepared by GLAD co-sputtering

International audienceW-Cu thin films were co-deposited by magnetron sputtering using the glancing angle deposition (GLAD) method. The deposition angle of W and Cu targets was fixed at 80°, and their currents were inversely and systematically changed from 50 to 140 mA. Scanning electron microscopy, X-ray fluorescence spectroscopy, and X-ray diffraction were used to investigate the morphology and the elemental composition of the films. Electrical properties were also studied by the van der Pauw technique. An increase of the W target current and a decrease of the Cu target produced an improvement of the inclined columnar and porous structure. The W-to-Cu weight concentration ratio was tuned from 0.68 up to 19. Wsingle bondCu films exhibited a diffracted signal corresponding to the (100) planes of the bcc tungsten structure for the highest W current intensities whereas the (111) peak due to the fcc copper phase was measured when the Cu target current increased. The dc electrical resistivity measured at room temperature was gradually changed from 3.59 × 10− 7 up to 9.90 × 10− 6 Ωm by means of an inverse variation of W and Cu target currents. The Cu-rich films exhibited a non-reversible resistivity vs. temperature evolution due to thermal oxidation whereas those co-sputtered with the highest W target currents showed a sudden increase of resistivity when the temperature was above 400 K

W-Cu sputtered thin films grown at oblique angles from two sources: Pressure and shielding effects

International audienceTwo series of W-Cu thin films were developed by the GLAD co-sputtering technique. The films were producedwith two separated W and Cu targets. Both targets were focused on the centre of the substrate and were simultaneouslysputtered using opposite and oblique angles of 80° from the substrate normal. In the first series, theW and Cu target currents were inversely changed from 50 to 140 mA in order to tune the elemental concentrationsand the microstructure. For the second series, a shield was added between W and Cu targets, perpendicularlyto the substrate surface in order to prevent the cross-contamination of the targets. The targetcurrents were varied similarly to the first series. Two argon sputtering pressures were used (0.42 and 1.0 Pa) ineach series, with and without the shield.Microstructure showed a tuneable inclined columnar microstructure, which become normal to the substrateat high pressure. The crystallographic structure was not significantly influenced by the shield implementationbut rather by the sputtering pressure. The W/Cu atomic concentration ratio varied between 0.2 and 5.5 as afunction of the sputtering pressure and target currents and an anisotropic chemical composition was measuredinside the columns. The wide range of DC electrical resistivities (3.6 ×10−7 to 5.7×10−5 Ωm) was discussedconsidering W and Cu target currents, high and low sputtering pressures and the use of a cross-contaminationshield. The role of the microstructure was clearly shown since significantly higher resistivity was obtained athigh pressure, as a function of the W/Cu atomic concentration ratio

Anisotropic thermal conductivity of nanocolumnar W thin films

International audienceWe report on experimental investigations of the thermal conductivity in W thin films 350 nm thick sputter-deposited by glancing angle deposition (GLAD). The 3ω method is used to measure the in-plane thermal conductivity kx and ky for films deposited with a deposition angle α of 0° and 80°. For classical films (α = 0°), the thermal conductivity is 71 Wm-1K-1 for both x and y directions, whereas for GLAD films (α = 80°) the in-plane conduction strongly drops with kx = 3.2 Wm-1K-1 and ky = 4.8 Wm-1K-1. The in-plane thermal conductivity anisotropy is determined with a heat conduction favored in the direction perpendicular to the deposition axis (anisotropic ratio of 1.5), which is connected to the anisotropic columnar microstructure. Some correlations with the electrical conductivity are discussed showing a significant deviation from the Wiedemann-Franz law for the in-plane transport properties of GLAD W films