Room Temperature InP DFB Laser Array Directly Grown on (001) Silicon

Fully exploiting the silicon photonics platform requires a fundamentally new approach to realize high-performance laser sources that can be integrated directly using wafer-scale fabrication methods. Direct band gap III-V semiconductors allow efficient light generation but the large mismatch in lattice constant, thermal expansion and crystal polarity makes their epitaxial growth directly on silicon extremely complex. Here, using a selective area growth technique in confined regions, we surpass this fundamental limit and demonstrate an optically pumped InP-based distributed feedback (DFB) laser array grown on (001)-Silicon operating at room temperature and suitable for wavelength-division-multiplexing applications. The novel epitaxial technology suppresses threading dislocations and anti-phase boundaries to a less than 20nm thick layer not affecting the device performance. Using an in-plane laser cavity defined by standard top-down lithographic patterning together with a high yield and high uniformity provides scalability and a straightforward path towards cost-effective co-integration with photonic circuits and III-V FINFET logic

Diffraction studies for stoichiometry effects in BaTiO3 grown by molecular beam epitaxy on Ge(001)

In this work, we present a systematic study of the effect of the stoichiometry of BaTiO3 (BTO) films grown on the Ge(001) substrate by molecular-beam-epitaxy using different characterization methods relying on beam diffraction, including reflection high-energy electron diffraction (RHEED), X-ray diffraction (XRD), and selected-area electron diffraction in transmission electron microscopy. Surprisingly, over a wide range of [Ba]/[Ti] ratios, as measured by the Rutherford backscattering spectrometry, all the BTO layers exhibit the same epitaxial relationship BTO(001)// Ge(001) with the substrate, describing a 45 degrees lattice rotation of the BTO lattice with respect to the Ge lattice. However, varying the [Ba]/[Ti] ratio does change the diffraction behavior. From RHEED patterns, we can derive that excessive [Ba] and [Ti] generate twinning planes and a rougher surface in the non-stoichiometric BTO layers. XRD allows us to follow the evolution of the lattice constants as a function of the [Ba]/[Ti] ratio, providing an option for tuning the tetragonality of the BTO layer. In addition, we found that the intensity ratio of the 3 lowest-order Bragg peaks I-(001)/I-(002), I-(101)/I-(002), and I-(111)/I-(002) derived from omega - 2 theta scans characteristically depend on the BTO stoichiometry. To explain the relation between observed diffraction patterns and the stoichiometry of the BTO films, we propose a model based on diffraction theory explaining how excess [Ba] or [Ti] in the layer influences the diffraction response. Published by AIP Publishing

Correlation between surface reconstruction and polytypism in InAs nanowire selective area epitaxy

Themechanism of widely observed intermixing of wurtzite and zinc-blende crystal structures in InAs nanowire (NW) grown by selective area epitaxy (SAE) is studied. We demonstrate that the crystal structure in InAs NW grown by SAE can be controlled using basic growth parameters, and wurtzitelike InAs NWs are achieved.We link the polytypic InAs NWs SAE to the reconstruction of the growth front (111)B surface. Surface reconstruction study of InAs (111) substrate and the following homoepitaxy experiment suggest that (111) planar defect nucleation is related to the (1 × 1) reconstruction of InAs (111)B surface. In order to reveal it more clearly, a model is presented to correlate growth temperature and arsenic partial pressure with InAs NW crystal structure. This model considers the transition between (1 × 1) and (2 × 2) surface reconstructions in the frame of adatom atoms adsorption/desorption, and the polytypism is thus linked to reconstruction quantitatively. The experimental data fit well with the model, which highly suggests that surface reconstruction plays an important role in the polytypism phenomenon in InAs NWs SAE.https://doi.org/10.1103/PhysRevMaterials.1.074603Peer Reviewe

Observation of the stacking faults in In0.53Ga0.47As by electron channeling contrast imaging

The observation and interpretation of Frank stacking faults, Shockley stacking faults, Lomer dislocations, and 60 degrees misfit dislocations, which have similar line shapes in the (001) In0.53Ga0.47As crystalline surface, are performed with the electron channeling contrast imaging (ECCI) technique. To minimize the backscattered electron (BSE) contrast that resulted from the surface morphology, a relatively flat region is first selected and compared with an atomic force microscopy (AFM) image and then, subsequently, examining ECCI with transmission electron microscopy (TEM)-like invisibility criteria. By orthogonally choosing the diffraction vector g between (220) and (2-20), misfit dislocations seem to be always visible but partially faint in the g parallel to the line direction on the surface. With respect to the image contrast, Frank stacking faults and Lomer dislocations are likely to be completely invisible for parallel g. The criteria are further confirmed by cross-sectional TEM analysis, which shows a preferred homogeneous surface nucleation

New materials for modulators and switches in silicon photonics

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Syntetic Spectra Data used in publication "Differential evolution optimization of Rutherford back-scattering spectra"

The zip-file contains all synthetic spectra as used for and described in the publication "Differential evolution optimization of Rutherford back-scattering spectra" and all simulation input files for the code RUTHELDE presented therein. Naming according to the text in the paper. All files are in human readable ASCII format. The simulation input files can be best viewed with any kind of JSON file editor

Single Crystalline BaTiO3 Grown by Pulsed-Laser Deposition (PLD) on SrTiO3 / Si Pseudo-Substrate

Future applications such as high-speed chip-to-chip optical interconnects, compact high-resolution beam steering and video-rate RGB hologram generation require the integration of fast and efficient optical modulators on top of silicon CMOS devices. For these applications the integration of high quality electro-optical materials on silicon wafers is hence required. Among the possible material options, barium titanate (BaTiO3) is one promising candidate due to its large intrinsic Pockels coefficients. However, the reported Pockels coefficients in literature strongly depend on the obtained crystal lattice stress and axis orientation. In this work, we demonstrate a single-crystalline PLD-grown BaTiO3 (BTO) on top of a MBE-SrTiO3 /Si(001) pseudo-substrate. We investigated the orientation of the polarization axis of single-crystalline BTO under different growth conditions by X-ray diffraction. Larger Pockels coefficients are obtained for a-oriented BTO with its elongated axis lying parallel to sample surface. The control of growth conditions enables us to change polarization by selecting between c- and a-growth axis orientation with tetragonality control of single crystalline BTO films ranging from 0.98 to 1.02. For the a-BTO, the out-of-plane $ømega$-scan shows good crystalline quality with FWHM of 0.37\r. Using STEM and NBD, we relate the crystalline orientation switch to strain relaxation inside BTO films