Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

10.1016/S0921-5107(01)00545-1Materials Science and Engineering B: Solid-State Materials for Advanced Technology852-3131-134MSBT

Deposition of fluoropolymer films on Si(100) surfaces by Rf magnetron sputtering of poly(tetrafluoroethylene)

10.1021/la011606jLangmuir18166373-6380LANG

Surface modification of polyimide films via plasma polymerization and deposition of allylpentafluorobenzene

10.1016/S0032-3861(02)00711-5Polymer43267279-7288POLM

Investigation of tungsten incorporated amorphous carbon film

10.1016/S0040-6090(99)00511-8Thin Solid Films355174-178THSF

Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system

10.1016/S0257-8972(99)00474-0Surface and Coatings Technology1232-3134-139SCTE