Nonlinear stability of <i>E</i> centers in Si_1-<i>x</i>Ge_<i>x</i>: electronic structure calculations

Electronic structure calculations are used to investigate the binding energies of defect pairs composed of lattice vacancies and phosphorus or arsenic atoms (E centers) in silicon-germanium alloys. To describe the local environment surrounding the E center we have generated special quasirandom structures that represent random silicon-germanium alloys. It is predicted that the stability of E centers does not vary linearly with the composition of the silicon-germanium alloy. Interestingly, we predict that the nonlinear behavior does not depend on the donor atom of the E center but only on the host lattice. The impact on diffusion properties is discussed in view of recent experimental and theoretical results

Electronegativity and doping in Si1-xGex alloys

Silicon germanium alloys are technologically important in microelectronics but also they are an important paradigm and model system to study the intricacies of the defect processes on random alloys. The key in semiconductors is that dopants and defects can tune their electronic properties and although their impact is well established in elemental semiconductors such as silicon they are not well characterized in random semiconductor alloys such as silicon germanium. In particular the impact of electronegativity of the local environment on the electronic properties of the dopant atom needs to be clarified. Here we employ density functional theory in conjunction with special quasirandom structures model to show that the Bader charge of the dopant atoms is strongly dependent upon the nearest neighbor environment. This in turn implies that the dopants will behave differently is silicon-rich and germanium-rich regions of the silicon germanium alloy

Effects of sublimation on silicon-germanium RTG performance

Performance of silicon-germanium thermoelement in RTG with sublimation at high operating temperature

Solar thermoelectric generator design and panel development program

Thermoelectric and mechanical performance of silicon-germanium solar thermoelectric generato

Performance characteristics of typical silicon-germanium RTG's in air operation

Performance characteristics of typical silicon germanium RTG in air operation - reentry effec

Performance and weight dependence of a silicon-germanium RTG on fuel capsule temperature and heat flux

Performance and weight dependence of silicon germanium RTG on fuel capsule temperature and heat flu

Fabrication of one silicon-germanium thermoelectric test unit Final report

Use of thermoelectric test unit to determine applicability of silicon-germanium power modules to space power systems requirement

Thermoelectric properties of 80 a/o Si - 20 a/o Ge alloy as a function of time and temperature

Thermoelectric properties as function of time and temperature for phosphorous doped n-type silicon-germanium allo

Experimental characterization of CMOS photonic devices

Current electrical interconnects in super-computers and high-performance processors present a bottleneck in terms of bandwidth and power consumption. A migration to the optical domain in order to cope with the connectivity between units (e.g. CPUs and memory) is needed to overcome these issues. Zero-change CMOS photonic devices represent a very attractive solution to the design of optical on-chip links. This approach makes use of up-to-date CMOS process, having enormous benefits regarding integration with state-of-the-art electronics. Designing and characterizing zero-change CMOS photonic devices is key for the future of optical interconnects. This thesis presents the characterization both theoretical and experimental of a Silicon-Germanium ring resonator modulator. It represents the first ever depletion modulator up to the date using SiGe as an active material. Moreover, it shows the best wavelength shift reported so far for zero-change CMOS modulators, enhancing the shift of a pure Silicon device. The demonstration of this device begins a new era of optical modulator designs using silicon-germanium to enhance modulation efficiency, and therefore reduce power consumption.Las interconexiones eléctricas de supercomputadores y de microprocesadores de alto rendimiento representan actualmente un bottleneck en cuanto a ancho de banda y potencia consumida se refiere. Se necesita una migración hacia el dominio óptico, para realizar la conectividad entre las diferentes unidades (por ejemplo CPU y memoria), con tal de superar estas limitaciones. Los dispositivos fabricados con la tecnología zero-change CMOS representan una solución muy atractiva para el diseño de links ópticos dentro de un chip. Esta técnica utiliza procesos CMOS actuales, beneficiándose así enormemente de la fácil integración con dispositivos electrónicos actuales. Diseñar y caracterizar dispositivos trabajando con zero-change CMOS es clave para el futuro de las interconexiones ópticas. Esta tesis presenta la caracterización tanto teórica como experimental de un modulador tipo ring resonator de Silicon-Germanium. Es el primer modulador de depletion utilizando SiGe como un material activo. Además, este dispositivo muestra el desplazamiento en longitud de onda más grande publicado hasta la fecha, comparándolo con otros moduladores zero-change CMOS, mejorando el desplazamiento de dispositivos de puro silicio. La demostración de este dispositivo comienza una nueva era de diseños de moduladores ópticos que utilizaran silicon-germanium para mejorar la eficiencia de modulación, y por lo tanto reducir el consumo de potencia.Les interconnexions elèctriques de super-computadors i microprocessadors de alt rendiment representen actualment un coll d'ampolla en quant a ample de banda i potència consumida. Es necessita una migració cap al domini òptic, per realitzar la connectivitat entre les diferents unitats (per exemple entre la CPU i la memòria), per tal de superar aquests problemes. Els dispositius fabricats sota zero-change CMOS technology representen una solució molt atractiva al disseny de links òptics dins d'un xip. Aquesta tècnica utilitza processos CMOS actuals, tenint enormes beneficis en quant a la integració amb dispositius electrònics actuals. Dissenyar i caracteritzar dispositius treballant amb zero-change CMOS és clau pel futur de les interconnexions òptiques del futur. Aquesta tesi presenta la caracterització tant teòrica com experimental d'un modulador ring resonator de Silicon-Germanium. Representa el primer modulador de depletion usant SiGe con un material actiu. A més a més, aquest dispositiu mostra el desplaçament en longitud d'ona més gran publicat fins ara en qualsevol dispositiu zero-change CMOS, millorant el desplaçament de dispositius de pur silici. La demostració d'aquest dispositiu comença una nova era de dissenys de moduladors òptics que utilitzaran silicon-germanium per millorar l'eficiència de modulació i per tant per reduir el consum de potència

Electron beam recrystallization of amorphous semiconductor materials

Nucleation and growth of crystalline films of silicon, germanium, and cadmium sulfide on substrates of plastic and glass were investigated. Amorphous films of germanium, silicon, and cadmium sulfide on amorphous substrates of glass and plastic were converted to the crystalline condition by electron bombardment