Scheduled voltage scaling for increasing lifetime in the presence of NBTI

to an error at the time of submission and it was against the policy of the conference to later add him to the author list. Abstract — Negative Bias Temperature Instability (NBTI) is a leading reliability concern for integrated circuits (ICs). It gradually increases the threshold voltages of PMOS transistors, thereby increasing delay. We propose scheduled voltage scaling, a technique that gradually increases the operating voltage of the IC to compensate for NBTI-related performance degradation. Scheduled voltage scaling has the potential to increase IC lifetime by 46 % relative to the conventional approach using guard banding for ICs fabricated using a 45 nm process. I

Exploiting Aging Benefits for the Design of Reliable Drowsy Cache Memories

In this paper, we show how beneficial effects of aging on static power consumption can be exploited to design reliable drowsy cache memories adopting dynamic voltage scaling(DVS) to reduce static power. First, we develop an analytical model allowing designers to evaluate the long-term threshold voltage degradation induced by bias temperature instability (BTI)in a drowsy cache memory. Through HSPICE simulations, we demonstrate that, as drowsy memories age, static power reduction techniques based on DVS become more effective because of reduction in sub-threshold current due to BTI aging. We develop a simulation framework to evaluate trade-offs between static power and reliability, and a methodology to properly select the “drowsy” data retention voltage. We then propose different architectures of a drowsy cache memory allowing designers to meet different power and reliability constraints. The performed HSPICE simulations show a soft error rate and static noise margin improvement up to 20.8% and 22.7%, respectively, compared to standard aging unaware drowsy technique. This is achieved with a limited static power increase during the very early lifetime, and with static energy saving of up to 37% in 10 years of operation, at no or very limited hardware overhead

Cross-Layer Resiliency Modeling and Optimization: A Device to Circuit Approach

The never ending demand for higher performance and lower power consumption pushes the VLSI industry to further scale the technology down. However, further downscaling of technology at nano-scale leads to major challenges. Reduced reliability is one of them, arising from multiple sources e.g. runtime variations, process variation, and transient errors. The objective of this thesis is to tackle unreliability with a cross layer approach from device up to circuit level

Multi-criteria optimization for energy-efficient multi-core systems-on-chip

The steady down-scaling of transistor dimensions has made possible the evolutionary progress leading to today’s high-performance multi-GHz microprocessors and core based System-on-Chip (SoC) that offer superior performance, dramatically reduced cost per function, and much-reduced physical size compared to their predecessors. On the negative side, this rapid scaling however also translates to high power densities, higher operating temperatures and reduced reliability making it imperative to address design issues that have cropped up in its wake. In particular, the aggressive physical miniaturization have increased CMOS fault sensitivity to the extent that many reliability constraints pose threat to the device normal operation and accelerate the onset of wearout-based failures. Among various wearout-based failure mechanisms, Negative biased temperature instability (NBTI) has been recognized as the most critical source of device aging. The urge of reliable, low-power circuits is driving the EDA community to develop new design techniques, circuit solutions, algorithms, and software, that can address these critical issues. Unfortunately, this challenge is complicated by the fact that power and reliability are known to be intrinsically conflicting metrics: traditional solutions to improve reliability such as redundancy, increase of voltage levels, and up-sizing of critical devices do contrast with traditional low-power solutions, which rely on compact architectures, scaled supply voltages, and small devices. This dissertation focuses on methodologies to bridge this gap and establishes an important link between low-power solutions and aging effects. More specifically, we proposed new architectural solutions based on power management strategies to enable the design of low-power, aging aware cache memories. Cache memories are one of the most critical components for warranting reliable and timely operation. However, they are also more susceptible to aging effects. Due to symmetric structure of a memory cell, aging occurs regardless of the fact that a cell (or word) is accessed or not. Moreover, aging is a worst-case matric and line with worst-case access pattern determines the aging of the entire cache. In order to stop the aging of a memory cell, it must be put into a proper idle state when a cell (or word) is not accessed which require proper management of the idleness of each atomic unit of power management. We have proposed several reliability management techniques based on the idea of cache partitioning to alleviate NBTI-induced aging and obtain joint energy and lifetime benefits. We introduce graceful degradation mechanism which allows different cache blocks into which a cache is partitioned to age at different rates. This implies that various sub-blocks become unreliable at different times, and the cache keeps functioning with reduced efficiency. We extended the capabilities of this architecture by integrating the concept of reconfigurable caches to maintain the performance of the cache throughout its lifetime. By this strategy, whenever a block becomes unreliable, the remaining cache is reconfigured to work as a smaller size cache with only a marginal degradation of performance. Many mission-critical applications require guaranteed lifetime of their operations and therefore the hardware implementing their functionality. Such constraints are usually enforced by means of various reliability enhancing solutions mostly based on redundancy which are not energy-friendly. In our work, we have proposed a novel cache architecture in which a smart use of cache partitions for redundancy allows us to obtain cache that meet a desired lifetime target with minimal energy consumption

Cross-Layer Approaches for an Aging-Aware Design of Nanoscale Microprocessors

Thanks to aggressive scaling of transistor dimensions, computers have revolutionized our life. However, the increasing unreliability of devices fabricated in nanoscale technologies emerged as a major threat for the future success of computers. In particular, accelerated transistor aging is of great importance, as it reduces the lifetime of digital systems. This thesis addresses this challenge by proposing new methods to model, analyze and mitigate aging at microarchitecture-level and above

NEGATIVE BIAS TEMPERATURE INSTABILITY STUDIES FOR ANALOG SOC CIRCUITS

Negative Bias Temperature Instability (NBTI) is one of the recent reliability issues in sub threshold CMOS circuits. NBTI effect on analog circuits, which require matched device pairs and mismatches, will cause circuit failure. This work is to assess the NBTI effect considering the voltage and the temperature variations. It also provides a working knowledge of NBTI awareness to the circuit design community for reliable design of the SOC analog circuit. There have been numerous studies to date on the NBTI effect to analog circuits. However, other researchers did not study the implication of NBTI stress on analog circuits utilizing bandgap reference circuit. The reliability performance of all matched pair circuits, particularly the bandgap reference, is at the mercy of aging differential. Reliability simulation is mandatory to obtain realistic risk evaluation for circuit design reliability qualification. It is applicable to all circuit aging problems covering both analog and digital. Failure rate varies as a function of voltage and temperature. It is shown that PMOS is the reliabilitysusceptible device and NBTI is the most vital failure mechanism for analog circuit in sub-micrometer CMOS technology. This study provides a complete reliability simulation analysis of the on-die Thermal Sensor and the Digital Analog Converter (DAC) circuits and analyzes the effect of NBTI using reliability simulation tool. In order to check out the robustness of the NBTI-induced SOC circuit design, a bum-in experiment was conducted on the DAC circuits. The NBTI degradation observed in the reliability simulation analysis has given a clue that under a severe stress condition, a massive voltage threshold mismatch of beyond the 2mV limit was recorded. Bum-in experimental result on DAC proves the reliability sensitivity of NBTI to the DAC circuitry

Online Nbti Wear-out Estimation

CMOS feature size scaling has been a source of dramatic performance gains, but it has come at a cost of on-chip wear-out. Negative Bias Temperature Instability (NBTI) is one of the main on-chip wear-out problems which questions the reliability of a chip. To check the accuracy of Reaction-Diffusion (RD) model, this work first proposes to compare the NBTI wear-out data from the RD wear-out model and the reliability simulator - Ultrasim RelXpert, by monitoring the activity of the register file on a Leon3 processor. The simulator wear-out data obtained is considered to be the baseline data and is used to tune the RD model using a novel technique time slicing. It turns out that the tuned RD model NBTI degradation is on an average 80% accurate with respect to RelXpert simulator and its calculation is approximately 8 times faster than the simulator. We come up with a waveform compression technique, for the activity waveforms from the Leon3 register file, which consumes 131KB compared to 256MB required without compression, and also provides 91% accuracy in NBTI degradation, compared to the same obtained without compression. We also propose a NBTI ΔVth estimation/prediction technique to reduce the time consumption of the tuned RD model threshold voltage calculation by an order of with one day degradation being 93% within the same of the tuned RD model. This work further proposes to a novel NBTI Degradation Predictor (NDP), to predict the future NBTI degradation, in a DE2 FPGA for WCET benchmarks. Also we measure the ΔVth variation across the 4 corners of the DE2 FPGA running a single Leon3, which varies from 0.08% to 0.11% of the base Vth