Intelligent shop scheduling for semiconductor manufacturing

Semiconductor market sales have expanded massively to more than 200 billion dollars annually accompanied by increased pressure on the manufacturers to provide higher quality products at lower cost to remain competitive. Scheduling of semiconductor manufacturing is one of the keys to increasing productivity, however the complexity of manufacturing high capacity semiconductor devices and the cost considerations mean that it is impossible to experiment within the facility. There is an immense need for effective decision support models, characterizing and analyzing the manufacturing process, allowing the effect of changes in the production environment to be predicted in order to increase utilization and enhance system performance. Although many simulation models have been developed within semiconductor manufacturing very little research on the simulation of the photolithography process has been reported even though semiconductor manufacturers have recognized that the scheduling of photolithography is one of the most important and challenging tasks due to complex nature of the process. Traditional scheduling techniques and existing approaches show some benefits for solving small and medium sized, straightforward scheduling problems. However, they have had limited success in solving complex scheduling problems with stochastic elements in an economic timeframe. This thesis presents a new methodology combining advanced solution approaches such as simulation, artificial intelligence, system modeling and Taguchi methods, to schedule a photolithography toolset. A new structured approach was developed to effectively support building the simulation models. A single tool and complete toolset model were developed using this approach and shown to have less than 4% deviation from actual production values. The use of an intelligent scheduling agent for the toolset model shows an average of 15% improvement in simulated throughput time and is currently in use for scheduling the photolithography toolset in a manufacturing plant

Phase 1 of the automated array assembly task of the low cost silicon solar array project

The results of a study of process variables and solar cell variables are presented. Interactions between variables and their effects upon control ranges of the variables are identified. The results of a cost analysis for manufacturing solar cells are discussed. The cost analysis includes a sensitivity analysis of a number of cost factors

A review of data mining applications in semiconductor manufacturing

The authors acknowledge Fundacao para a Ciencia e a Tecnologia (FCT-MCTES) for its financial support via the project UIDB/00667/2020 (UNIDEMI).For decades, industrial companies have been collecting and storing high amounts of data with the aim of better controlling and managing their processes. However, this vast amount of information and hidden knowledge implicit in all of this data could be utilized more efficiently. With the help of data mining techniques unknown relationships can be systematically discovered. The production of semiconductors is a highly complex process, which entails several subprocesses that employ a diverse array of equipment. The size of the semiconductors signifies a high number of units can be produced, which require huge amounts of data in order to be able to control and improve the semiconductor manufacturing process. Therefore, in this paper a structured review is made through a sample of 137 papers of the published articles in the scientific community regarding data mining applications in semiconductor manufacturing. A detailed bibliometric analysis is also made. All data mining applications are classified in function of the application area. The results are then analyzed and conclusions are drawn.publishersversionpublishe

Optimal control rules for scheduling job shops

Caption title.Includes bibliographical references.Sheldon X.C. Lou

Technology Directions for the 21st Century, volume 1

For several decades, semiconductor device density and performance have been doubling about every 18 months (Moore's Law). With present photolithography techniques, this rate can continue for only about another 10 years. Continued improvement will need to rely on newer technologies. Transition from the current micron range for transistor size to the nanometer range will permit Moore's Law to operate well beyond 10 years. The technologies that will enable this extension include: single-electron transistors; quantum well devices; spin transistors; and nanotechnology and molecular engineering. Continuation of Moore's Law will rely on huge capital investments for manufacture as well as on new technologies. Much will depend on the fortunes of Intel, the premier chip manufacturer, which, in turn, depend on the development of mass-market applications and volume sales for chips of higher and higher density. The technology drivers are seen by different forecasters to include video/multimedia applications, digital signal processing, and business automation. Moore's Law will affect NASA in the areas of communications and space technology by reducing size and power requirements for data processing and data fusion functions to be performed onboard spacecraft. In addition, NASA will have the opportunity to be a pioneering contributor to nanotechnology research without incurring huge expenses

Microrobots for wafer scale microfactory: design fabrication integration and control.

Future assembly technologies will involve higher automation levels, in order to satisfy increased micro scale or nano scale precision requirements. Traditionally, assembly using a top-down robotic approach has been well-studied and applied to micro-electronics and MEMS industries, but less so in nanotechnology. With the bloom of nanotechnology ever since the 1990s, newly designed products with new materials, coatings and nanoparticles are gradually entering everyone’s life, while the industry has grown into a billion-dollar volume worldwide. Traditionally, nanotechnology products are assembled using bottom-up methods, such as self-assembly, rather than with top-down robotic assembly. This is due to considerations of volume handling of large quantities of components, and the high cost associated to top-down manipulation with the required precision. However, the bottom-up manufacturing methods have certain limitations, such as components need to have pre-define shapes and surface coatings, and the number of assembly components is limited to very few. For example, in the case of self-assembly of nano-cubes with origami design, post-assembly manipulation of cubes in large quantities and cost-efficiency is still challenging. In this thesis, we envision a new paradigm for nano scale assembly, realized with the help of a wafer-scale microfactory containing large numbers of MEMS microrobots. These robots will work together to enhance the throughput of the factory, while their cost will be reduced when compared to conventional nano positioners. To fulfill the microfactory vision, numerous challenges related to design, power, control and nanoscale task completion by these microrobots must be overcome. In this work, we study three types of microrobots for the microfactory: a world’s first laser-driven micrometer-size locomotor called ChevBot，a stationary millimeter-size robotic arm, called Solid Articulated Four Axes Microrobot (sAFAM), and a light-powered centimeter-size crawler microrobot called SolarPede. The ChevBot can perform autonomous navigation and positioning on a dry surface with the guidance of a laser beam. The sAFAM has been designed to perform nano positioning in four degrees of freedom, and nanoscale tasks such as indentation, and manipulation. And the SolarPede serves as a mobile workspace or transporter in the microfactory environment

Method of determining alignment of a template and a substrate having a liquid disposed therebetween

The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks and the template having template alignment marks, the method including, reducing a distance between the substrate and the template to cause a spreading of the activating light curable liquid; and varying an overlay placement of the template with respect to the substrate such that the template alignment marks are substantially aligned with the substrate alignment marks before the spreading causes the activating light curable liquid to cover an area between the substrate alignment marks and the template alignment marks.Board of Regents, University of Texas Syste