Influence of parasitic capacitance variations on 65 nm and 32 nm predictive technology model SRAM core-cells

The continuous improving of CMOS technology allows the realization of digital circuits and in particular static random access memories that, compared with previous technologies, contain an impressive number of transistors. The use of new production processes introduces a set of parasitic effects that gain more and more importance with the scaling down of the technology. In particular, even small variations of parasitic capacitances in CMOS devices are expected to become an additional source of faulty behaviors in future technologies. This paper analyzes and compares the effect of parasitic capacitance variations in a SRAM memory circuit realized with 65 nm and 32 nm predictive technology model

Automating defects simulation and fault modeling for SRAMs

The continues improvement in manufacturing process density for very deep sub micron technologies constantly leads to new classes of defects in memory devices. Exploring the effect of fabrication defects in future technologies, and identifying new classes of realistic functional fault models with their corresponding test sequences, is a time consuming task up to now mainly performed by hand. This paper proposes a new approach to automate this procedure. The proposed method exploits the capabilities of evolutionary algorithms to automatically identify faulty behaviors into defective memories and to define the corresponding fault models and relevant test sequences. Target defects are modeled at the electrical level in order to optimize the results to the specific technology and memory architecture

Yield-Aware Leakage Power Reduction of On-Chip SRAMs

Leakage power dissipation of on-chip static random access memories (SRAMs) constitutes a significant fraction of the total chip power consumption in state-of-the-art microprocessors and system-on-chips (SoCs). Scaling the supply voltage of SRAMs during idle periods is a simple yet effective technique to reduce their leakage power consumption. However, supply voltage scaling also results in the degradation of the cells’ robustness, and thus reduces their capability to retain data reliably. This is particularly resulting in the failure of an increasing number of cells that are already weakened by excessive process parameters variations and/or manufacturing imperfections in nano-meter technologies. Thus, with technology scaling, it is becoming increasingly challenging to maintain the yield while attempting to reduce the leakage power of SRAMs. This research focuses on characterizing the yield-leakage tradeoffs and developing novel techniques for a yield-aware leakage power reduction of SRAMs. We first demonstrate that new fault behaviors emerge with the introduction of a low-leakage standby mode to SRAMs. In particular, it is shown that there are some types of defects in SRAM cells that start to cause failures only when the drowsy mode is activated. These defects are not sensitized in the active operating mode, and thus escape the traditional March tests. Fault models for these newly observed fault behaviors are developed and described in this thesis. Then, a new low-complexity test algorithm, called March RAD, is proposed that is capable of detecting all the drowsy faults as well as the simple traditional faults. Extreme process parameters variations can also result in SRAM cells with very weak data-retention capability. The probability of such cells may be very rare in small memory arrays, however, in large arrays, their probability is magnified by the huge number of bit-cells integrated on a single chip. Hence, it is critical also to account for such extremal events while attempting to scale the supply voltage of SRAMs. To estimate the statistics of such rare events within a reasonable computational time, we have employed concepts from extreme value theory (EVT). This has enabled us to accurately model the tail of the cell failure probability distribution versus the supply voltage. Analytical models are then developed to characterize the yield-leakage tradeoffs in large modern SRAMs. It is shown that even a moderate scaling of the supply voltage of large SRAMs can potentially result in significant yield losses, especially in processes with highly fluctuating parameters. Thus, we have investigated the application of fault-tolerance techniques for a more efficient leakage reduction of SRAMs. These techniques allow for a more aggressive voltage scaling by providing tolerance to the failures that might occur during the sleep mode. The results show that in a 45-nm technology, assuming 10% variation in transistors threshold voltage, repairing a 64KB memory using only 8 redundant rows or incorporating single error correcting codes (ECCs) allows for ~90% leakage reduction while incurring only ~1% yield loss. The combination of redundancy and ECC, however, allows to reach the practical limits of leakage reduction in the analyzed benchmark, i.e., ~95%. Applying an identical standby voltage to all dies, regardless of their specific process parameters variations, can result in too many cell failures in some dies with heavily skewed process parameters, so that they may no longer be salvageable by the employed fault-tolerance techniques. To compensate for the inter-die variations, we have proposed to tune the standby voltage of each individual die to its corresponding minimum level, after manufacturing. A test algorithm is presented that can be used to identify the minimum applicable standby voltage to each individual memory die. A possible implementation of the proposed tuning technique is also demonstrated. Simulation results in a 45-nm predictive technology show that tuning standby voltage of SRAMs can enhance data-retention yield by an additional 10%−50%, depending on the severity of the variations

An Experimental Evaluation of Resistive Defects and Different Testing Solutions in Low-Power Back-Biased SRAM Cells

This paper compares different types of resistive defects that may occur inside low-power SRAM cells, focusing on their impact on device operation. Notwithstanding the continuous evolution of SRAM device integration, manufacturing processes continue to be very sensitive to production faults, giving rise to defects that can be modeled as resistances, especially for devices designed to work in low-power modes. This work analyzes this type of resistive defect that may impair the device functionalities in subtle ways, depending on the defect characteristics and values that may not be directly or easily detectable by traditional test methods. We analyze each defect in terms of the possible effects inside the SRAM cell, its impact on power consumption, and provide guidelines for selecting the best test methods

Effects of cosmic rays on single event upsets

The efforts at establishing a research program in space radiation effects are discussed. The research program has served as the basis for training several graduate students in an area of research that is of importance to NASA. In addition, technical support was provided for the Single Event Facility Group at Brookhaven National Laboratory

Study of Radiation Effects on 28nm UTBB FDSOI Technology

With the evolution of modern Complementary Metal-Oxide-Semiconductor (CMOS) technology, transistor feature size has been scaled down to nanometers. The scaling has resulted in tremendous advantages to the integrated circuits (ICs), such as higher speed, smaller circuit size, and lower operating voltage. However, it also creates some reliability concerns. In particular, small device dimensions and low operating voltages have caused nanoscale ICs to become highly sensitive to operational disturbances, such as signal coupling, supply and substrate noise, and single event effects (SEEs) caused by ionizing particles, like cosmic neutrons and alpha particles. SEEs found in ICs can introduce transient pulses in circuit nodes or data upsets in storage cells. In well-designed ICs, SEEs appear to be the most troublesome in a space environment or at high altitudes in terrestrial environment. Techniques from the manufacturing process level up to the system design level have been developed to mitigate radiation effects. Among them, silicon-on-insulator (SOI) technologies have proven to be an effective approach to reduce single-event effects in ICs. So far, 28nm ultra-thin body and buried oxide (UTBB) Fully Depleted SOI (FDSOI) by STMicroelectronics is one of the most advanced SOI technologies in commercial applications. Its resilience to radiation effects has not been fully explored and it is of prevalent interest in the radiation effects community. Therefore, two test chips, namely ST1 and AR0, were designed and tested to study SEEs in logic circuits fabricated with this technology. The ST1 test chip was designed to evaluate SET pulse widths in logic gates. Three kinds of the on-chip pulse-width measurement detectors, namely the Vernier detector, the Pulse Capture detector and the Pulse Filter detector, were implemented in the ST1 chip. Moreover, a Circuit for Radiation Effects Self-Test (CREST) chain with combinational logic was designed to study both SET and SEU effects. The ST1 chip was tested using a heavy ion irradiation beam source in Radiation Effects Facility (RADEF), Finland. The experiment results showed that the cross-section of the 28nm UTBB-FDSOI technology is two orders lower than its bulk competitors. Laser tests were also applied to this chip to research the pulse distortion effects and the relationship between SET, SEU and the clock frequency. Total Ionizing Dose experiments were carried out at the University of Saskatchewan and European Space Agency with Co-60 gammacell radiation sources. The test results showed the devices implemented in the 28nm UTBB-FDSOI technology can maintain its functionality up to 1 Mrad(Si). In the AR0 chip, we designed five ARM Cortex-M0 cores with different logic protection levels to investigate the performance of approximate logic protecting methods. There are three custom-designed SRAM blocks in the test chip, which can also be used to measure the SEU rate. From the simulation result, we concluded that the approximate logic methodology can protect the digital logic efficiently. This research comprehensively evaluates the radiation effects in the 28nm UTBB-FDSOI technology, which provides the baseline for later radiation-hardened system designs in this technology

Design, implementation and testing of SRAM based neutron detectors

Neutrons of thermal and high energies can change the value of a bit stored in a Static Random Access Memory (SRAM) memory chip. The effect is non destructive and linearly dependent on the amount of incoming particles, which makes it exploitable for use as a neutron detector. Detection is done by writing a known pattern to the memory and continuously reading it back checking for wrong values. As the SRAM memory is immune to gamma radiation it is ideal for use in for instance medical linear accelerators for detection of neutron dose to a patient. The intention of this work has been twofold: (1) Testing of different SRAM devices of different bit-sizes, manufacturers, feature sizes and voltages for their sensitivity to neutrons of different energies from thermal to high energies. (2) Design and implement detector hardware, firmware and its accompanying readout system for successful use in irradiation testing. The work has been done in close collaboration with Eivind Larsen, whose main contributions has been related to the nuclear physics aspect of the work in addition to arrangements in regard to beam setup and experimentation. Testing have been done at the Physikalisch-Technische Bundesanstalt (PTB) facility in Braunschweig Germany in a quasi-monochromatic neutron beam of 5:8MeV, 8:5MeV and 14:8MeV, finding a dependence of the sensitivity on the energy. In addition there have been testing conducted in the high energy hadron field at CERF at CERN, finding that by using the results from the other experiments an estimated range of the saturation cross section could be determined. Testing was also conducted at two occasions in the 29MeV proton beam at Oslo Cyclotron Laboratory (OCL) in Oslo Norway, where it was found that the detector could be used as a reference detector for beam monitoring and for beam profile characterization. The cross sections of the detectors were found to be comparable to the 14:8MeV cross section found at PTB. Thermal neutron testing of the devices was done in the thermal neutron field of the nuclear reactor at Institute for Energy Technology (IFE) at Kjeller Norway. All the devices were found to be sensitive to the field. Detector electronics, adapted to the different devices, has been built which can withstand the same radiation as the memory device without malfunctioning. There has been a focus on using Commercial Off The Shelf (COTS) components for reducing the total cost of the detector to about 100-200$US. The use of COTS SRAM memory devices also simplifies the reproducibility and availability of spares. The detector currently uses a two way communication between the detector and iv Abstract the readout computer over two pair of cables reducing the amount of cabling needed for experiments. The detectors can be connected to the communication link in a bus fashion, currently enabling a total of 14 detectors to be tested simultaneously from 100m away, over the same cable. Single Event Latch-up (SEL) and problems with irregular count rate of SRAMs created in the 90nm fabrication node has created problems during testing. Some solutions and techniques to mitigate these in hardware and firmware are presented in this work.Master i FysikkMAMN-PHYSPHYS39

Sensor de envelhecimento para células de memória CMOS

Dissertação de Mestrado, Engenharia e Tecnologia, Instituto Superior de Engenharia, Universidade do Algarve, 2016As memórias Complementary Metal Oxide Semiconductor (CMOS) ocupam uma percentagem de área significativa nos circuitos integrados e, com o desenvolvimento de tecnologias de fabrico a uma escala cada vez mais reduzida, surgem problemas de performance e de fiabilidade. Efeitos como o BTI (Bias Thermal Instability), TDDB (Time Dependent Dielectric Breakdown), HCI (Hot Carrier Injection), EM (Electromigration), degradam os parâmetros físicos dos transístores de efeito de campo (MOSFET), alterando as suas propriedades elétricas ao longo do tempo. O efeito BTI pode ser subdividido em NBTI (Negative BTI) e PBTI (Positive BTI). O efeito NBTI é dominante no processo de degradação e envelhecimento dos transístores CMOS, afetando os transístores PMOS, enquanto o efeito PBTI assume especial relevância na degradação dos transístores NMOS. A degradação provocada por estes efeitos, manifesta-se nos transístores através do incremento do módulo da tensão de limiar de condução |ℎ| ao longo do tempo. A degradação dos transístores é designada por envelhecimento, sendo estes efeitos cumulativos e possuindo um grande impacto na performance do circuito, em particular se ocorrerem outras variações paramétricas. Outras variações paramétricas adicionais que podem ocorrer são as variações de processo (P), tensão (V) e temperatura (T), ou considerando todas estas variações, e de uma forma genérica, PVTA (Process, Voltage, Temperature and Aging). As células de memória de acesso aleatório (RAM, Random Access Memory), em particular as memórias estáticas (SRAM, Static Random Access Memory) e dinâmicas (DRAM, Dynamic Random Access Memory), possuem tempos de leitura e escrita precisos. Quando ao longo do tempo ocorre o envelhecimento das células de memória, devido à degradação das propriedades dos transístores MOSFET, ocorre também uma degradação da performance das células de memória. A degradação de performance é, portanto, resultado das transições lentas que ocorrem, devido ao envelhecimento dos transístores MOSFET que comutam mais tarde, comparativamente a transístores novos. A degradação de performance nas memórias devido às transições lentas pode traduzir-se em leituras e escritas mais lentas, bem como em alterações na capacidade de armazenamento da memória. Esta propriedade pode ser expressa através da margem de sinal ruído (SNM). O SNM é reduzido com o envelhecimento dos transístores MOSFET e, quando o valor do SNM é baixo, a célula perde a sua capacidade de armazenamento, tornando-se mais vulnerável a fontes de ruído. O SNM é, portanto, um valor que permite efetuar a aferição (benchmarking) e comparar as características da memória perante o envelhecimento ou outras variações paramétricas que possam ocorrer. O envelhecimento das memórias CMOS traduz-se portanto na ocorrência de erros nas memórias ao longo do tempo, o que é indesejável especialmente em sistemas críticos. O trabalho apresentado nesta dissertação tem como objetivo o desenvolvimento de um sensor de envelhecimento e performance para memórias CMOS, detetando e sinalizando para o exterior o envelhecimento em células de memória SRAM devido à constante monitorização da sua performance. O sensor de envelhecimento e performance é ligado na bit line da célula de memória e monitoriza ativamente as operações de leitura e escrita decorrentes da operação da memória. O sensor de envelhecimento é composto por dois blocos: um detetor de transições e um detetor de pulsos. O detetor de transições é constituído por oito inversores e uma porta lógica XOR realizada com portas de passagem. Os inversores possuem diferentes relações nos tamanhos dos transístores P/N, permitindo tempos de comutação em diferentes valores de tensão. Assim, quando os inversores com tensões de comutações diferentes são estimulados pelo mesmo sinal de entrada e são ligados a uma porta XOR, permitem gerar na saída um impulso sempre que existe uma comutação na bit line. O impulso terá, portanto, uma duração proporcional ao tempo de comutação do sinal de entrada, que neste caso particular são as operações de leitura e escrita da memória. Quando o envelhecimento ocorre e as transições se tornam mais lentas, os pulsos possuem uma duração superior face aos pulsos gerados numa SRAM nova. Os pulsos gerados seguem para um elemento de atraso (delay element) que provoca um atraso aos pulsos, invertendo-os de seguida, e garantindo que a duração dos pulsos é suficiente para que exista uma deteção. O impulso gerado é ligado ao bloco seguinte que compõe o sensor de envelhecimento e performance, sendo um circuito detetor de pulso. O detetor de pulso implementa um NOR CMOS, controlado por um sinal de relógio (clock) e pelos pulsos invertidos. Quando os dois sinais de input do NOR são ‘0’ o output resultante será ‘1’, criando desta forma uma janela de deteção. O sensor de envelhecimento será ajustado em cada implementação, de forma a que numa célula de memória nova os pulsos invertidos se encontrem alinhados temporalmente com os pulsos de relógio. Este ajuste é feito durante a fase de projeto, em função da frequência de operação requerida para a célula, quer pelo dimensionamento do delay element (ajustando o seu atraso), quer pela definição do período do sinal de relógio. À medida que o envelhecimento dos circuitos ocorre e as comutações nos transístores se tornam mais lentas, a duração dos pulsos aumenta e consequentemente entram na janela de deteção, originando uma sinalização na saída do sensor. Assim, caso ocorram operações de leitura e escrita instáveis, ou seja, que apresentem tempos de execução acima do expectável ou que os seus níveis lógicos estejam degradados, o sensor de envelhecimento e performance devolve para o exterior ‘1’, sinalizando um desempenho crítico para a operação realizada, caso contrário a saída será ‘0’, indicando que não é verificado nenhum erro no desempenho das operações de escrita e leitura. Os transístores do sensor de envelhecimento e performance são dimensionados de acordo com a implementação; por exemplo, os modelos dos transístores selecionados, tensões de alimentação, ou número de células de memória conectadas na bit line, influenciam o dimensionamento prévio do sensor, já que tanto a performance da memória como o desempenho do sensor dependem das condições de operação. Outras soluções previamente propostas e disponíveis na literatura, nomeadamente o sensor de envelhecimento embebido no circuito OCAS (On-Chip Aging Sensor), permitem detetar envelhecimento numa SRAM devido ao envelhecimento por NBTI. Porém esta solução OCAS apenas se aplica a um conjunto de células SRAM conectadas a uma bit line, não sendo aplicado individualmente a outras células de memória como uma DRAM e não contemplando o efeito PBTI. Uma outra solução já existente, o sensor Scout flip-flop utilizado para aplicações ASIC (Application Specific Integrated Circuit) em circuitos digitais síncronos, atua também como um sensor de performance local e responde de forma preditiva na monitorização de faltas por atraso, utilizando por base janelas de deteção. Esta solução não foi projetada para a monitorização de operações de leitura e escrita em memórias SRAM e DRAM. No entanto, pela sua forma de atuar, esta solução aproxima-se mais da solução proposta neste trabalho, uma vez que o seu funcionamento se baseia em sinalização de sinais atrasados. Nesta dissertação, o recurso a simulações SPICE (Simulation Program with Integrated Circuit Emphasis) permite validar e testar o sensor de envelhecimento e performance. O caso de estudo utilizado para aplicar o sensor é uma memória CMOS, SRAM, composta por 6 transístores, juntamente com os seus circuitos periféricos, nomeadamente o amplificador sensor e o circuito de pré-carga e equalização, desenvolvidos em tecnologia CMOS de 65nm e 22nm, com recurso aos modelos de MOSFET ”Berkeley Predictive Technology Models (PTM)”. O sensor é devolvido e testado em 65nm e em 22nm com os modelos PTM, permitindo caracterizar o sensor de envelhecimento e performance desenvolvido, avaliando também de que forma o envelhecimento degrada as operações de leitura e escrita da SRAM, bem como a sua capacidade de armazenamento e robustez face ao ruído. Por fim, as simulações apresentadas provam que o sensor de envelhecimento e performance desenvolvido nesta tese de mestrado permite monitorizar com sucesso a performance e o envelhecimento de circuitos de memória SRAM, ultrapassando os desafios existentes nas anteriores soluções disponíveis para envelhecimento de memórias. Verificou-se que na presença de um envelhecimento que provoque uma degradação igual ou superior a 10%, o sensor de envelhecimento e performance deteta eficazmente a degradação na performance, sinalizando os erros. A sua utilização em memórias DRAM, embora possível, não foi testada nesta dissertação, ficando reservada para trabalho futuro