Design, Characterization And Analysis Of Electrostatic Discharge (esd) Protection Solutions In Emerging And Modern Technologies

Electrostatic Discharge (ESD) is a significant hazard to electronic components and systems. Based on a specific processing technology, a given circuit application requires a customized ESD consideration that includes the devices’ operating voltage, leakage current, breakdown constraints, and footprint. As new technology nodes mature every 3-5 years, design of effective ESD protection solutions has become more and more challenging due to the narrowed design window, elevated electric field and current density, as well as new failure mechanisms that are not well understood. The endeavor of this research is to develop novel, effective and robust ESD protection solutions for both emerging technologies and modern complementary metal–oxide–semiconductor (CMOS) technologies. The Si nanowire field-effect transistors are projected by the International Technology Roadmap for Semiconductors as promising next-generation CMOS devices due to their superior DC and RF performances, as well as ease of fabrication in existing Silicon processing. Aiming at proposing ESD protection solutions for nanowire based circuits, the dimension parameters, fabrication process, and layout dependency of such devices under Human Body Mode (HBM) ESD stresses are studied experimentally in company with failure analysis revealing the failure mechanism induced by ESD. The findings, including design methodologies, failure mechanism, and technology comparisons should provide practical knowhow of the development of ESD protection schemes for the nanowire based integrated circuits. Organic thin-film transistors (OTFTs) are the basic elements for the emerging flexible, printable, large-area, and low-cost organic electronic circuits. Although there are plentiful studies focusing on the DC stress induced reliability degradation, the operation mechanism of OTFTs iv subject to ESD is not yet available in the literature and are urgently needed before the organic technology can be pushed into consumer market. In this work, the ESD operation mechanism of OTFT depending on gate biasing condition and dimension parameters are investigated by extensive characterization and thorough evaluation. The device degradation evolution and failure mechanism under ESD are also investigated by specially designed experiments. In addition to the exploration of ESD protection solutions in emerging technologies, efforts have also been placed in the design and analysis of a major ESD protection device, diodetriggered-silicon-controlled-rectifier (DTSCR), in modern CMOS technology (90nm bulk). On the one hand, a new type DTSCR having bi-directional conduction capability, optimized design window, high HBM robustness and low parasitic capacitance are developed utilizing the combination of a bi-directional silicon-controlled-rectifier and bi-directional diode strings. On the other hand, the HBM and Charged Device Mode (CDM) ESD robustness of DTSCRs using four typical layout topologies are compared and analyzed in terms of trigger voltage, holding voltage, failure current density, turn-on time, and overshoot voltage. The advantages and drawbacks of each layout are summarized and those offering the best overall performance are suggested at the en

Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

Dispositifs de protection contre les décharges électrostatiques pour les applications radio fréquences et millimétriques

Ces travaux s'inscrivent dans un contexte où les contraintes vis-à-vis des décharges électrostatiques sont de plus en plus fortes, les circuits de protection sont un problème récurrent pour les circuits fonctionnant à hautes fréquences. La capacité parasite des composants de protection limite fortement la transmission du signal et peut perturber fortement le fonctionnement normal d'un circuit. Les travaux présentés dans ce mémoire font suite à une volonté de fournir aux concepteurs de circuits fonctionnant aux fréquences millimétriques un circuit de protection robuste présentant de faibles pertes en transmission, avec des dimensions très petites et fonctionnant sur une très large bande de fréquences, allant du courant continu à 100 GHz. Pour cela, une étude approfondie des lignes de transmission et des composants de protection a été réalisée à l'aide de simulations électromagnétiques et de circuits. Placés et fragmentées le long de ces lignes de transmission, les composants de protection ont été optimisés afin de perturber le moins possible la transmission du signal, tout en gardant une forte robustesse face aux décharges électrostatiques. Cette stratégie de protection a été réalisée et validée en technologies CMOS avancées par des mesures fréquentielles, électriques et de courant de fuite.Advanced CMOS technologies provide an easier way to realize radio-frequency integrated circuits (RFICs). However, the lithography dimension shrink make electrostatic discharges (ESD) issues become more significant. Specific ESD protection devices are embedded in RFICs to avoid any damage. Unfortunately, ESD protections parasitic capacitance limits the operating bandwidth of RFICs. ESD protection size dimensions are also an issue for the protection of RFICs, in order to avoid a significant increase in production costs. This work focuses on a broadband ESD solution (DC-100 GHz) able to be implemented in an I/O pad to protect RFICs in advanced CMOS technologies. Thanks to the signal transmission properties of coplanar / microstrip lines, a broadband ESD solution is achieved by implementing ESD components under a transmission line. The silicon proved structure is broadband; it can be used in any RF circuits and fulfill ESD target. The physical dimensions also enable easy on-chip integration.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF

High-voltage ESD structures and ESD protection concepts in smart power technologies

Electro-static discharge (ESD) event can cause upset or permanent damage of integrated circuits (IC) and electrical systems. The risk of ESD fails needs to be mitigated or prevented. ESD robustness of IC products and electrical systems is specified, verified and qualified according to respective ESD standards. For high-voltage IC products based on smart power semiconductor technologies for industrial, power and automotive applications, design of effective and cost-efficient ESD protection is a big challenge, demanding wide and deep technical knowledge throughout high-frequency and high-power characterization techniques, semiconductor device physic, circuit design as well as modeling and simulation. The required measurement setups and tester components are developed and introduced. The characterization of ESD protection devices, IC and off-chip circuit elements is enabled and improved. The rise-time filters are important for the study of rise-time dependent ESD robustness. The human metal model (HMM) tester as an alternative to IEC ESD generators provides voltage waveform measurement with good quality in addition to current waveform measurement. It can be used for wafer-level or package-level device characterization. The measurement results of HMM tester and IEC ESD generator are compared. The on-chip ESD protection design relies on proper choice of different types of ESD protection devices and structures, depending on ESD specifications and IC applications. Typical on-chip ESD protection, whether snapback or non-snapback, single device or ESD circuit is introduced. The failure levels studies give a systematic benchmark of the ESD protection devices and structures, concerning device area, clamping voltage and other relevant parameters. The trade-off between those parameters and limitation of different ESD protection is discussed. Moreover, understanding of ESD failure modes is the key to implement effective ESD design. A unique ESD failure mode of smart power semiconductor device is discovered and investigated in detail. In the scope of finding ESD solutions, new active ESD clamps have been further developed in this work. The study of ESD protection is extended to the system-level involving on- and off-chip ESD protection elements. The characteristics of typical off-chip elements as well as the interaction between IC and off-chip protection elements plays essential role on the system robustness. A system-level ESD simulation incorporating IC and off-chip protection elements is desired for system efficient ESD design (SEED). A behavioral ESD model is developed which reproduces pulse-energy-dependent failure levels and self-heating effects. This modeling methodology can be used for assessment of system robustness even beyond ESD time-domain. The validation of the models is given by representative application examples. Several main challenges of high-voltage ESD design in smart power technologies have been addressed in this work, which can serve as guidance for ESD development and product support in future power semiconductor technologies

Federal Register

Daily publication of the U.S. Office of the Federal Register contains rules and regulations, proposed legislation and rule changes, and other notices, including "Presidential proclamations and Executive Orders, Federal agency documents having general applicability and legal effect, documents required to be published by act of Congress, and other Federal agency documents of public interest" (p. ii). Table of Contents starts on page iii

CONCEPTUAL DESIGN REPORT

Brookhaven National Laboratory has prepared a conceptual design for a world class user facility for scientific research using synchrotron radiation. This facility, called the ''National Synchrotron Light Source II'' (NSLS-II), will provide ultra high brightness and flux and exceptional beam stability. It will also provide advanced insertion devices, optics, detectors, and robotics, and a suite of scientific instruments designed to maximize the scientific output of the facility. Together these will enable the study of material properties and functions with a spatial resolution of {approx}1 nm, an energy resolution of {approx}0.1 meV, and the ultra high sensitivity required to perform spectroscopy on a single atom. The overall objective of the NSLS-II project is to deliver a research facility to advance fundamental science and have the capability to characterize and understand physical properties at the nanoscale, the processes by which nanomaterials can be manipulated and assembled into more complex hierarchical structures, and the new phenomena resulting from such assemblages. It will also be a user facility made available to researchers engaged in a broad spectrum of disciplines from universities, industries, and other laboratories

Federal Register

Daily publication of the U.S. Office of the Federal Register contains rules and regulations, proposed legislation and rule changes, and other notices, including "Presidential proclamations and Executive Orders, Federal agency documents having general applicability and legal effect, documents required to be published by act of Congress, and other Federal agency documents of public interest" (p. ii). Table of Contents starts on page iii

Federal Register

Daily publication of the U.S. Office of the Federal Register contains rules and regulations, proposed legislation and rule changes, and other notices, including "Presidential proclamations and Executive Orders, Federal agency documents having general applicability and legal effect, documents required to be published by act of Congress, and other Federal agency documents of public interest" (p. ii). Table of Contents starts on page iii

The 45th Australasian Universities Building Education Association Conference: Global Challenges in a Disrupted World: Smart, Sustainable and Resilient Approaches in the Built Environment, Conference Proceedings, 23 - 25 November 2022, Western Sydney University, Kingswood Campus, Sydney, Australia

This is the proceedings of the 45th Australasian Universities Building Education Association (AUBEA) conference which will be hosted by Western Sydney University in November 2022. The conference is organised by the School of Engineering, Design, and Built Environment in collaboration with the Centre for Smart Modern Construction, Western Sydney University. This year’s conference theme is “Global Challenges in a Disrupted World: Smart, Sustainable and Resilient Approaches in the Built Environment”, and expects to publish over a hundred double-blind peer review papers under the proceedings

Measuring knowledge sharing processes through social network analysis within construction organisations

The construction industry is a knowledge intensive and information dependent industry. Organisations risk losing valuable knowledge, when the employees leave them. Therefore, construction organisations need to nurture opportunities to disseminate knowledge through strengthening knowledge-sharing networks. This study aimed at evaluating the formal and informal knowledge sharing methods in social networks within Australian construction organisations and identifying how knowledge sharing could be improved. Data were collected from two estimating teams in two case studies. The collected data through semi-structured interviews were analysed using UCINET, a Social Network Analysis (SNA) tool, and SNA measures. The findings revealed that one case study consisted of influencers, while the other demonstrated an optimal knowledge sharing structure in both formal and informal knowledge sharing methods. Social networks could vary based on the organisation as well as the individuals’ behaviour. Identifying networks with specific issues and taking steps to strengthen networks will enable to achieve optimum knowledge sharing processes. This research offers knowledge sharing good practices for construction organisations to optimise their knowledge sharing processes