Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model : A Case Study [TR940. S618 2008 f rb].

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. The industry of semiconductor wafer fabrication (“fab”) has invested a huge amount of capital on the manufacturing equipments particular in photolithograph

Reusable modelling and simulation of flexible manufacturing for next generation semiconductor manufacturing facilities

Automated material handling systems (AMHS) in 300 mm semiconductor manufacturing facilities may need to evolve faster than expected considering the high performance demands on these facilities. Reusable simulation models are needed to cope with the demands of this dynamic environment and to deliver answers to the industry much faster. One vision for intrabay AMHS is to link a small group of intrabay AMHS systems, within a full manufacturing facility, together using what is called a Merge/Diverge link. This promises better operational performance of the AMHS when compared to operating two dedicated AMHS systems, one for interbay transport and the other for intrabay handling. A generic tool for modelling and simulation of an intrabay AMHS (GTIA-M&S) is built, which utilises a library of different blocks representing the different components of any intrabay material handling system. GTIA-M&S provides a means for rapid building and analysis of an intrabay AMHS under different operating conditions. The ease of use of the tool means that inexpert users have the ability to generate good models. Models developed by the tool can be executed with the merge/diverge capability enabled or disabled to provide comparable solutions to production demands and to compare these two different configurations of intrabay AMHS using a single simulation model. Finally, results from simulation experiments on a model developed using the tool were very informative in that they include useful decision making data, which can now be used to further enhance and update the design and operational characteristics of the intrabay AMHS

Cycle Time Analysis For Photolithography Tools In Semiconductor Manufacturing Industry With Simulation Model: A Case Study

Perkembangan industri semikonduktor dalam bidang fabrikasi biasanya melibatkan kos pelaburan yang tinggi terutamanya dalam alatan photolithography. Perkembangan pesat dalam bidang industri semikonduktor kini telah memerangsangkan teknik untuk mengoptimumkan penggunaan mesin-mesin dengan efektif setelah membelanjakan beribu juta dalam perlaburan. Tanpa penggunaan perisian komputer yang canggih dalam analisis, adalah sukar untuk menggunakan teknik purba dalam analisis pengiraan apabila menghadapi perkembangan produk yang semakin tinggi teknologinya. Dalam kajian ini, satu model simulasi telah dibina untuk menganalisis masa mendulu dalam alatan photolithography melalui teknik yang lebih sistematik dan efektif. Model simulasi ini telah dibina berasaskan perisian computer yang memerlukan informasi yang teliti seperti mas a memproses dan juga aliran proses dalam alatan photolithography. The industry of semiconductor wafer fabrication ("fab") has invested a huge amount of capital on the manufacturing equipments particular in photolithography area which has driven the needs to re-look at the most profitable way of utilizing and operating them efficiently. Traditional industrial engineering analysis techniques through mathematical models or static models for the studies of photolithography process are simply not adequate to analyze these complex environments. In this research, a more realistic representation of photolithography tools that can give a better prediction results and a more systematic methodology for minimizing photolithography cycle time is presented. The proposed method is to reduce waiting time and increase utilization of the photolithography process, which would result in an overall equipment cycle time reduction

Methodology On Investigating The Influences Of Automated Material Handling System In Automotive Assembly Process

A case study was selected as a method to collect data in actual industry situation. The study aimed to assess the influences of automated material handling system in automotive industry by proposing a new design of integration system through simulation, and analyze the significant effect and influence of the system. The method approach tool will be CAD Software (Delmia & Quest). The process of preliminary data gathering in phase 1 will collect all data related from actual industry situation. It is expected to produce a guideline and limitation in designing a new integration system later. In phase 2, an idea or concept of design will be done by using 10 principles of design consideration for manufacturing. A full factorial design will be used as design of experiment in order to analyze the performance measured of the integration system with the current system in case study. From the result of the experiment, an ANOVA analysis will be done to study the performance measured. Thus, it is expected that influences can be seen from the improvement made in the system

An Interval Based Approach To Model Input Uncertainty In Discrete-event Simulation

The objective of this research is to increase the robustness of discrete-event simulation (DES) when input uncertainties associated models and parameters are present. Input uncertainties in simulation have different sources, including lack of data, conflicting information and beliefs, lack of introspection, measurement errors, and lack of information about dependency. A reliable solution is obtained from a simulation mechanism that accounts for these uncertainty components in simulation. An interval-based simulation (IBS) mechanism based on imprecise probabilities is proposed, where the statistical distribution parameters in simulation are intervals instead of precise real numbers. This approach incorporates variability and uncertainty in systems. In this research, a standard procedure to estimate interval parameters of probability distributions is developed based on the measurement of simulation robustness. New mechanisms based on the inverse transform to generate interval random variates are proposed. A generic approach to specify the required replication length to achieve a desired level of robustness is derived. Furthermore, three simulation clock advancement approaches in the interval-based simulation are investigated. A library of Java-based IBS toolkits that simulates queueing systems is developed to demonstrate the new proposed reliable simulation. New interval statistics for interval data analysis are proposed to support decision making. To assess the performance of the IBS, we developed an interval-based metamodel for automated material handling systems, which generates interval performance measures that are more reliable and computationally more efficient than traditional DES simulation results

Intelligent shop scheduling for semiconductor manufacturing

Semiconductor market sales have expanded massively to more than 200 billion dollars annually accompanied by increased pressure on the manufacturers to provide higher quality products at lower cost to remain competitive. Scheduling of semiconductor manufacturing is one of the keys to increasing productivity, however the complexity of manufacturing high capacity semiconductor devices and the cost considerations mean that it is impossible to experiment within the facility. There is an immense need for effective decision support models, characterizing and analyzing the manufacturing process, allowing the effect of changes in the production environment to be predicted in order to increase utilization and enhance system performance. Although many simulation models have been developed within semiconductor manufacturing very little research on the simulation of the photolithography process has been reported even though semiconductor manufacturers have recognized that the scheduling of photolithography is one of the most important and challenging tasks due to complex nature of the process. Traditional scheduling techniques and existing approaches show some benefits for solving small and medium sized, straightforward scheduling problems. However, they have had limited success in solving complex scheduling problems with stochastic elements in an economic timeframe. This thesis presents a new methodology combining advanced solution approaches such as simulation, artificial intelligence, system modeling and Taguchi methods, to schedule a photolithography toolset. A new structured approach was developed to effectively support building the simulation models. A single tool and complete toolset model were developed using this approach and shown to have less than 4% deviation from actual production values. The use of an intelligent scheduling agent for the toolset model shows an average of 15% improvement in simulated throughput time and is currently in use for scheduling the photolithography toolset in a manufacturing plant

Production line: effect of different inspection station allocation under accepts reject inspection policy

Manufacturing system is one of the most important parts in any organization as it produces the output of the company which will generate the profit. It consists partly of the production line which plays the role as the centre of production to create the end product which could be half finished or the full product. It is a big problem for the company to determine which is the better arrangement and combination of the tools or machines available in this area of the organization as different combination will greatly impact the productivity of the production line together with the profit of the company. This research intend to analyze a new production line in a metal stamping company based on the complain from the company and try to explore the better layout or arrangement in the production line in reflect to the complained problem and constrain of the provided of accept the defect and repair inspection policy. The production line is first being analyzed in response to complain through computer simulation. After the problem had been identified, the researcher tried different alternatives in the attempt to seek for the better layout or arrangement in the production line. The effect of different inspection station allocation layout is then being evaluated in term of the production time. The research has resulted in the finding of the cause for the long production time in the factory which is the long inspection steps which consumed much of the production time. After a few alternatives have been explored in allocating the inspection station, it is obvious that the current approach of the production line is the better one. Even by reducing the number of inspection station, interesting enough, the production time does not seem to decrease but yet increased. This finding contradicts the normal thought of fewer stations means shorter time. This finding could be the founding basic in the future research regarding the allocation of the inspection station following certain provided policy. This is also very helpful in real life practice in company as to help them improve their production time. As for the time being, there is yet a research addressing this issue pertaining the given inspection policy

MODELING AND SIMULATION OF A SEMICONDUCTOR MANUFACTURING FAB FOR CYCLE TIME ANALYSIS

The goal of the thesis is to conduct a study of the effects of scheduling policies and machine failures on the manufacturing cycle time of the Integrated Circuit (IC) manufacturing process for two processor chips, namely Skylake and Kabylake, manufactured by Intel. The fab simulation model was developed as First in First Out (FIFO), Shortest Processing Time (SPT), Priority based (PB), and Failure FIFO (machine failures) model, and the average cycle times and queue waiting times under the four scheduling policy models were compared for both the Skylake and Kabylake wafers. The study revealed that scheduling policies SPT and PB increased the average cycle time for Skylake wafers while decreasing the average cycle time for the Kabylake wafers, when compared to the base FIFO model. Machine failures increased the average cycle time for both types of wafers

A framework for generating operational characteristic curves for semiconductor manufacturing systems using flexible and reusable discrete event simulations

This thesis proposes a framework for generating operating curves for semiconductor manufacturing facilities using a modular flexible discrete event simulation (DES) model embedded in an application that automates the design of experiments for the simulations. Typically, operating curves are generated using analytical queueing models that are difficult to implement and hence, can only be used for benchmarking purposes. Alternatively, DES models are more capable of capturing the complexities of a semiconductor manufacturing facility such as re-entrancy, rework and non-identical toolsets. However, traditional craft-based simulations require much time and resources. The proposed methodology aims to reduce this time by automatically calculating the parameters for experimentation and generating the simulation model. It proposes a novel method to more appropriately allocate simulation effort by selecting design points more relevant to the operating curve. The methodology was initially applied to a single toolset model and tested as a pilot case study using actual factory data. Overall, the resulting operating curves matched that of the actual data. Subsequently, the methodology was applied to a full semiconductor manufacturing facility, using datasets from the Semiconductor Wafer Manufacturing Data Format Specification. The automated framework was shown to generate the curves rapidly and comparisons against a number of queueing model equivalents showed that the DES curves were more accurate. The implications of this work mean that on deployment of the application, semiconductor manufacturers can quickly obtain an accurate operating curve of their factory that could be used to aid in capacity planning and enable better decision-making regarding allocation of resources

A review on equipment protection and system protection relay in power system

Power system equipment is configured and connected together with multiple voltage levels in existing electrical power system. There are varieties of electrical equipment obtainable in the power system predominantly from generation side up to the distribution side. Consequently, appropriate protections must be apt to prevent inessential disturbances that lead to voltage instability, voltage collapse and sooner a total blackout took place in the power system. The understanding of each component on the system protection is critical. This is due to any abnormal condition and failure can be analyzed and solved effectively due to the rapid changing and development on the power system network. Therefore, the enhancement of power quality can be achieved by sheltering the equipment with protection relay in power system. Moreover, the design of a systematic network is crucial for the system protection itself. Several types of protective equipment and protection techniques are taken into consideration in this paper. Hence, the existing accessible types and methods of system protection in the power system network are reviewed