285 research outputs found

    Design and Characterization of Standard Cell Library using FinFETs

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    The processors and digital circuits designed today contain billions of transistors on a small piece of silicon. As devices are becoming smaller, slimmer, faster, and more efficient, the transistors also have to keep up with the demands and needs of the daily user. Unfortunately, the CMOS technology has reached its limit and cannot be used to scale down due to the transistor\u27s breakdown caused by short channel effects. An alternative solution to this is the FinFET transistor technology, where the gate of the transistor is a three dimensional fin that surrounds the transistor and prevents the breakdown caused by scaling and short channel effects. FinFET devices are reported to have excellent control over short channel effects, high On/Off Ratio, extremely low gate leakage current and relative immunization over gate edge line roughness. Sub 20 nm node size is perceived to be the limit of scaling the CMOS transistors, but FinFETs can be scaled down further because of its unique design. Due to these advantages, the VLSI industry has now shifted to FinFET in implementation of their designs. However, these transistors have not been completely opened to academia. Analyzing and observing the effects of these devices can be pivotal in gaining an in-depth understanding of them. This thesis explores the implementation of FinFETs using a standard cell library designed using these transistors. The FinFET package file used to design these cells is a 15nm FinFET technology file developed by NCSU in collaboration with Cadence and Mentor Graphics. Post design, the cells were characterized, the results were analyzed and compared with cells designed using CMOS transistors at different node sizes to understand and extrapolate conclusions on FinFET devices

    Evaluating Architectural, Redundancy, and Implementation Strategies for Radiation Hardening of FinFET Integrated Circuits

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    In this article, authors explore radiation hardening techniques through the design of a test chip implemented in 16-nm FinFET technology, along with architectural and redundancy design space exploration of its modules. Nine variants of matrix multiplication were taped out and irradiated with neutrons. The results obtained from the neutron campaign revealed that the radiation-hardened variants present superior resiliency when either local or global triple modular redundancy (TMR) schemes are employed. Furthermore, simulation-based fault injection was utilized to validate the measurements and to explore the effects of different implementation strategies on failure rates. We further show that the interplay between these different implementation strategies is not trivial to capture and that synthesis optimizations can effectively break assumptions about the effectiveness of redundancy schemes

    Radiation Hardened by Design Methodologies for Soft-Error Mitigated Digital Architectures

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    abstract: Digital architectures for data encryption, processing, clock synthesis, data transfer, etc. are susceptible to radiation induced soft errors due to charge collection in complementary metal oxide semiconductor (CMOS) integrated circuits (ICs). Radiation hardening by design (RHBD) techniques such as double modular redundancy (DMR) and triple modular redundancy (TMR) are used for error detection and correction respectively in such architectures. Multiple node charge collection (MNCC) causes domain crossing errors (DCE) which can render the redundancy ineffectual. This dissertation describes techniques to ensure DCE mitigation with statistical confidence for various designs. Both sequential and combinatorial logic are separated using these custom and computer aided design (CAD) methodologies. Radiation vulnerability and design overhead are studied on VLSI sub-systems including an advanced encryption standard (AES) which is DCE mitigated using module level coarse separation on a 90-nm process with 99.999% DCE mitigation. A radiation hardened microprocessor (HERMES2) is implemented in both 90-nm and 55-nm technologies with an interleaved separation methodology with 99.99% DCE mitigation while achieving 4.9% increased cell density, 28.5 % reduced routing and 5.6% reduced power dissipation over the module fences implementation. A DMR register-file (RF) is implemented in 55 nm process and used in the HERMES2 microprocessor. The RF array custom design and the decoders APR designed are explored with a focus on design cycle time. Quality of results (QOR) is studied from power, performance, area and reliability (PPAR) perspective to ascertain the improvement over other design techniques. A radiation hardened all-digital multiplying pulsed digital delay line (DDL) is designed for double data rate (DDR2/3) applications for data eye centering during high speed off-chip data transfer. The effect of noise, radiation particle strikes and statistical variation on the designed DDL are studied in detail. The design achieves the best in class 22.4 ps peak-to-peak jitter, 100-850 MHz range at 14 pJ/cycle energy consumption. Vulnerability of the non-hardened design is characterized and portions of the redundant DDL are separated in custom and auto-place and route (APR). Thus, a range of designs for mission critical applications are implemented using methodologies proposed in this work and their potential PPAR benefits explored in detail.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

    Implementation and Applications of a Ternary Threshold Logic Gate

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    Reducing delay, power consumption, and chip area of a logic circuit are the main targets of a designer. Most of the times, the designer sacrifices power consumption and chip area to improve delay for a given technology node. To overcome this problem, we propose a ternary threshold logic gate. We implement the proposed gate by combining threshold logic and ternary logic. Then, we construct basic building blocks of a ternary ALU (as logic gates, comparator, and arithmetic circuits) using the proposed gate. We show that the proposed ternary TLG improves delay, power consumption, and chip area of ternary circuits via simulations. Thus, the proposed gate can be used to improve delay, power consumption, and chip area of ternary circuits

    Ultra Low Power Digital Circuit Design for Wireless Sensor Network Applications

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    Ny forskning innenfor feltet trĂ„dlĂžse sensornettverk Ă„pner for nye og innovative produkter og lĂžsninger. Biomedisinske anvendelser er blant omrĂ„dene med stĂžrst potensial og det investeres i dag betydelige belĂžp for Ă„ bruke denne teknologien for Ă„ gjĂžre medisinsk diagnostikk mer effektiv samtidig som man Ă„pner for fjerndiagnostikk basert pĂ„ trĂ„dlĂžse sensornoder integrert i et ”helsenett”. MĂ„let er Ă„ forbedre tjenestekvalitet og redusere kostnader samtidig som brukerne skal oppleve forbedret livskvalitet som fĂžlge av Ăžkt trygghet og mulighet for Ă„ tilbringe mest mulig tid i eget hjem og unngĂ„ unĂždvendige sykehusbesĂžk og innleggelser. For Ă„ gjĂžre dette til en realitet er man avhengige av sensorelektronikk som bruker minst mulig energi slik at man oppnĂ„r tilstrekkelig batterilevetid selv med veldig smĂ„ batterier. I sin avhandling ” Ultra Low power Digital Circuit Design for Wireless Sensor Network Applications” har PhD-kandidat Farshad Moradi fokusert pĂ„ nye lĂžsninger innenfor konstruksjon av energigjerrig digital kretselektronikk. Avhandlingen presenterer nye lĂžsninger bĂ„de innenfor aritmetiske og kombinatoriske kretser, samtidig som den studerer nye statiske minneelementer (SRAM) og alternative minnearkitekturer. Den ser ogsĂ„ pĂ„ utfordringene som oppstĂ„r nĂ„r silisiumteknologien nedskaleres i takt med mikroprosessorutviklingen og foreslĂ„r lĂžsninger som bidrar til Ă„ gjĂžre kretslĂžsninger mer robuste og skalerbare i forhold til denne utviklingen. De viktigste konklusjonene av arbeidet er at man ved Ă„ introdusere nye konstruksjonsteknikker bĂ„de er i stand til Ă„ redusere energiforbruket samtidig som robusthet og teknologiskalerbarhet Ăžker. Forskningen har vĂŠrt utfĂžrt i samarbeid med Purdue University og vĂŠrt finansiert av Norges ForskningsrĂ„d gjennom FRINATprosjektet ”Micropower Sensor Interface in Nanometer CMOS Technology”

    Novel IC designs with 32 nm Independent-Gate FinFET

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    Electrical EngineeringThe semiconductor industry is confronted with serious challenges as the push continues toward scaling transistors into the 22-nm technology node and beyond. The most important among these challenges is the diminishing gate control over the channel, which manifests itself in the form of the increased short-channel effects (SCE) and leakage currents. One approach to countering these effects is introducing new materials for improved performance, either into the gate stack, the channel, or the source/drain extension regions. However, even with the introduction of these new materials, leakage will continue to be a serious problem. Hence, alter device architecture are being explored which processes inherently better robustness to SCE. Among this alternatives, multiple-gate FETs, also known as FinFET or gate wrap-around FETs, are emerging as promising candidates. In a FinFET, the gate wraps around a thin slice of silicon, also known as a ???fin???, and current flows along the top and side surface of the fin. This wrap-around nature of the gate enhances the gate control over the channel, thus reducing the SCE and leakage currents. Furthermore, fabrication of FinFET is compatible with that of conventional CMOS, thus making possible very rapid deployment to manufacturing. From a circuit-design perspective, FinFET provides IC designer with more options to innovate. For instance, FinFET device can directly substitute the CMOS in the existing applications by using the shorted-gate FinFET in which two FinFET gates are tied together. Additionally, the low-power mode of FinFET device in which the back-gate bias is tied to a reverse-bias voltage is often employed in the low-power design in that it can reduce subthreshold leakage. Last but not least, the independent-gate FinFET emerges as an interesting device so that IC designers have a variety of choices to flexibly use the two gates of FinFET for difference tasks. In this thesis, independent-gate FinFET are our concern with two designs being included. The first work presents a novel methodology for IC speed-up in 32nm FinFET. By taking advantage of independently controlling two gates of IG-FinFET, a boosting structures is developed to improve the signal propagation on interconnect significantly. In the second work, a digital voltage sensor design is illustrated. Based on the operation of a p-type FinFET in low-power mode and independent-gate mode, a new technique for designing a controllable delay element (CDE) with high linearity is presented. Then, we develop a 9-bit digital voltage sensor with a voltage range of 0.7 ??? 1.1 V and 50 mV resolution. The proposed voltage sensor can operate with ultra-low power, a wide voltage range, and fairly high frequency.ope

    Cross-Layer Resiliency Modeling and Optimization: A Device to Circuit Approach

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    The never ending demand for higher performance and lower power consumption pushes the VLSI industry to further scale the technology down. However, further downscaling of technology at nano-scale leads to major challenges. Reduced reliability is one of them, arising from multiple sources e.g. runtime variations, process variation, and transient errors. The objective of this thesis is to tackle unreliability with a cross layer approach from device up to circuit level
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