130 research outputs found

    Diffeomorphic Transformations for Time Series Analysis: An Efficient Approach to Nonlinear Warping

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    The proliferation and ubiquity of temporal data across many disciplines has sparked interest for similarity, classification and clustering methods specifically designed to handle time series data. A core issue when dealing with time series is determining their pairwise similarity, i.e., the degree to which a given time series resembles another. Traditional distance measures such as the Euclidean are not well-suited due to the time-dependent nature of the data. Elastic metrics such as dynamic time warping (DTW) offer a promising approach, but are limited by their computational complexity, non-differentiability and sensitivity to noise and outliers. This thesis proposes novel elastic alignment methods that use parametric \& diffeomorphic warping transformations as a means of overcoming the shortcomings of DTW-based metrics. The proposed method is differentiable \& invertible, well-suited for deep learning architectures, robust to noise and outliers, computationally efficient, and is expressive and flexible enough to capture complex patterns. Furthermore, a closed-form solution was developed for the gradient of these diffeomorphic transformations, which allows an efficient search in the parameter space, leading to better solutions at convergence. Leveraging the benefits of these closed-form diffeomorphic transformations, this thesis proposes a suite of advancements that include: (a) an enhanced temporal transformer network for time series alignment and averaging, (b) a deep-learning based time series classification model to simultaneously align and classify signals with high accuracy, (c) an incremental time series clustering algorithm that is warping-invariant, scalable and can operate under limited computational and time resources, and finally, (d) a normalizing flow model that enhances the flexibility of affine transformations in coupling and autoregressive layers.Comment: PhD Thesis, defended at the University of Navarra on July 17, 2023. 277 pages, 8 chapters, 1 appendi

    Circuit Techniques for Multiple and Wideband Beamforming

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    University of Minnesota Ph.D. dissertation.June 2018. Major: Electrical Engineering. Advisor: Ramesh Harjani. 1 computer file (PDF); x, 102 pages.This thesis presents different architectures with regard to multiple beamforming and wideband phased array transceiver. Three different designs are implemented in TSMC 65nm RF CMOS to demonstrate different solutions. The design in this thesis have included major RF blocks in state-of-art wireless transceiver: RF receiver, local oscillator, and RF transmitter. First, a RF/analog FFT based four-channel four-beam receiver with progressive partial spatial ltering is proposed. This architecture is particularly well suited for MIMO systems where multiple beams are used to increase throughput. Like the FFT, the proposed architecture reuses computations for multi-beam systems. In particular, the proposed architecture redistributes the computations so as to maximize the reuse of the structure that already exist in a receiver chain. In many fashions the architecture is quite similar to a Butler matrix but unlike the Butler matrix it does not use large passive components at RF. Further, we exploit the normally occurring quadrature down-conversion process to implement the tap weights. In comparison to traditional MIMO architectures, that effectively duplicate each path, the distributed computations of this architecture provide partial spatial ltering before the final stage, improving interference rejection for the blocks between the LNA and the ADC. Additionally, because of the spatial ltering prior to the ADC, a single interferer only jams a single beam allowing for continued operation though at a lower combined throughput. The four-beam receiver core prototype in 65nm CMOS implements the basic FFT based architecture but does not include an LNA or extensive IF stages. This four-channel design consumes 56mW power and occupies an active area of 0:65mm2 excluding pads and test circuits. Second, a wideband phased array receiver architecture with simultaneous spectral and spatial filtering by sub-harmonic injection oscillators is presented. The design avoids using expensive delay elements by many conventional wideband phased array. Different from prior art of channelization which cannot solve beam-squinting issue among the sub-channels, we use sub-harmonic injection locking scheme, which make the center frequencies of all sub-channels point to the same spatial direction to overcome beam-squinting issue. The low frequency, low power and narrowband phase shifters are placed at LO in comparison to conventional way of placing delay elements or phase shifters in the signal path. This avoids receiver performance degradation from delay elements or phase shifters. The simultaneous spectral and spatial ltering dictates less ADC dynamic range requirement and further reduces power. The injection locking scheme reduces the phase noise contribution from the oscillators. The two-band prototype design realized in 65nm GP CMOS is centered at 9GHz, provides 4GHz instantaneous bandwidth, reduces beam-squinting by half, consumes 31.75mW/antenna and occupies 2.7mm2 of chip area. In the third work, a steerable RF/analog FFT based four-beam transmitter architecture is presented. This work is based on the idea of FFT based multiple beamforming in 1st work, but extended to the transmitter and make the all beams steerable. Due to the reciprocity between receiver and transmitter, decimation-in-frequency (DIF) FFT is utilized in the transmitter. All the beams are steered simultaneously by front-end phase shifters, while keep each of the beams is independent of the others. The steerability of FFT based multiple beamforming scheme makes this proposed prototype could tackle more complicated portable wireless environment. The first and second proposed architecture have been silicon veried, and the design of the third has been finished and ready for tapeout

    Applications in Electronics Pervading Industry, Environment and Society

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    This book features the manuscripts accepted for the Special Issue “Applications in Electronics Pervading Industry, Environment and Society—Sensing Systems and Pervasive Intelligence” of the MDPI journal Sensors. Most of the papers come from a selection of the best papers of the 2019 edition of the “Applications in Electronics Pervading Industry, Environment and Society” (APPLEPIES) Conference, which was held in November 2019. All these papers have been significantly enhanced with novel experimental results. The papers give an overview of the trends in research and development activities concerning the pervasive application of electronics in industry, the environment, and society. The focus of these papers is on cyber physical systems (CPS), with research proposals for new sensor acquisition and ADC (analog to digital converter) methods, high-speed communication systems, cybersecurity, big data management, and data processing including emerging machine learning techniques. Physical implementation aspects are discussed as well as the trade-off found between functional performance and hardware/system costs

    Particle Physics Reference Library

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    This third open access volume of the handbook series deals with accelerator physics, design, technology and operations, as well as with beam optics, dynamics and diagnostics. A joint CERN-Springer initiative, the “Particle Physics Reference Library” provides revised and updated contributions based on previously published material in the well-known Landolt-Boernstein series on particle physics, accelerators and detectors (volumes 21A,B1,B2,C), which took stock of the field approximately one decade ago. Central to this new initiative is publication under full open acces

    The Science and Technology of Particle Accelerators

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    The Science and Technology of Particle Accelerators provides an accessible introduction to the field, and is suitable for advanced undergraduates, graduate students, and academics, as well as professionals in national laboratories and facilities, industry, and medicine who are designing or using particle accelerators. Providing integrated coverage of accelerator science and technology, this book presents the fundamental concepts alongside detailed engineering discussions and extensive practical guidance, including many numerical examples. For each topic, the authors provide a description of the physical principles, a guide to the practical application of those principles, and a discussion of how to design the components that allow the application to be realised. Features: Written by an interdisciplinary and highly respected team of physicists and engineers from the Cockcroft Institute of Accelerator Science and Technology in the UK Accessible style, with many numerical examples Contains an extensive set of problems, with fully worked solutions available Rob Appleby is an academic member of staff at the University of Manchester, and Chief Examiner in the Department of Physics and Astronomy. Graeme Burt is an academic member of staff at the University of Lancaster, and previous Director of Education at the Cockcroft Institute. James Clarke is head of Science Division in the Accelerator Science and Technology Centre at STFC Daresbury Laboratory. Hywel Owen is an academic member of staff at the University of Manchester, and Director of Education at the Cockcroft Institute. All authors are researchers within the Cockcroft Institute of Accelerator Science and Technology and have extensive experience in the design and construction of particle accelerators, including particle colliders, synchrotron radiation sources, free electron lasers, and medical and industrial accelerator systems

    Power quality improvement utilizing photovoltaic generation connected to a weak grid

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    Microgrid research and development in the past decades have been one of the most popular topics. Similarly, the photovoltaic generation has been surging among renewable generation in the past few years, thanks to the availability, affordability, technology maturity of the PV panels and the PV inverter in the general market. Unfortunately, quite often, the PV installations are connected to weak grids and may have been considered as the culprit of poor power quality affecting other loads in particular sensitive loads connected to the same point of common coupling (PCC). This paper is intended to demystify the renewable generation, and turns the negative perception into positive revelation of the superiority of PV generation to the power quality improvement in a microgrid system. The main objective of this work is to develop a control method for the PV inverter so that the power quality at the PCC will be improved under various disturbances. The method is to control the reactive current based on utilizing the grid current to counteract the negative impact of the disturbances. The proposed control method is verified in PSIM platform. Promising results have been obtaine

    Virtual metrology for plasma etch processes.

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    Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point

    The Science and Technology of Particle Accelerators

    Get PDF
    The Science and Technology of Particle Accelerators provides an accessible introduction to the field, and is suitable for advanced undergraduates, graduate students, and academics, as well as professionals in national laboratories and facilities, industry, and medicine who are designing or using particle accelerators. Providing integrated coverage of accelerator science and technology, this book presents the fundamental concepts alongside detailed engineering discussions and extensive practical guidance, including many numerical examples. For each topic, the authors provide a description of the physical principles, a guide to the practical application of those principles, and a discussion of how to design the components that allow the application to be realised. Features: Written by an interdisciplinary and highly respected team of physicists and engineers from the Cockcroft Institute of Accelerator Science and Technology in the UK Accessible style, with many numerical examples Contains an extensive set of problems, with fully worked solutions available Rob Appleby is an academic member of staff at the University of Manchester, and Chief Examiner in the Department of Physics and Astronomy. Graeme Burt is an academic member of staff at the University of Lancaster, and previous Director of Education at the Cockcroft Institute. James Clarke is head of Science Division in the Accelerator Science and Technology Centre at STFC Daresbury Laboratory. Hywel Owen is an academic member of staff at the University of Manchester, and Director of Education at the Cockcroft Institute. All authors are researchers within the Cockcroft Institute of Accelerator Science and Technology and have extensive experience in the design and construction of particle accelerators, including particle colliders, synchrotron radiation sources, free electron lasers, and medical and industrial accelerator systems

    Virtual metrology for plasma etch processes.

    Get PDF
    Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point
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