Optical properties of ZnO deposited by atomic layer deposition (ALD) on Si nanowires

International audienceIn this work, we report proof-of-concept results on the synthesis of Si core/ ZnO shell nanowires (SiNWs/ZnO) by combining nanosphere lithography (NSL), metal assisted chemical etching (MACE) and atomic layer deposition (ALD). The structural properties of the SiNWs/ZnO nanostructures prepared were investigated by X-ray diffraction, Raman spectroscopy, scanning and transmission electron microscopies. The X-ray diffraction analysis revealed that all samples have a hexagonal wurtzite structure. The grain sizes are found to be in the range of 7-14 nm. The optical properties of the samples were investigated using reflectance and photoluminescence spectroscopy. The study of photoluminescence (PL) spectra of SiNWs/ZnO samples showed the domination of defect emission bands, pointing to deviations of the stoichiometry of the prepared 3D ZnO nanostructures. Reduction of the PL intensity of the SiNWs/ZnO with the increase of SiNWs etching time was observed, depicting an advanced light scattering with the increase of the nanowire length. These results open up new prospects for the design of electronic and sensing devices

MIXED MODE PERFORMANCE OF GAAS UTB-MOSFET WITH EXTRA INSULATOR REGION AND UNDOPED BURIED OXIDE REGION

Investigation of mixed mode performances for GaAs UTB-MOSFET at nanoscale regime keeping in view of “Beyond CMOS” is the current trend of semiconductor industry. Here it is proposed to modify conventional models by considering an extra Insulator Region (IR) and Undoped Buried oxide Region (UBR) to study the performance related to digital and analog/RF applications. Here a GaAs is considered as the channel material. The IR-UTB-SOI-n-MOSFET has shown promising results with respect to SS, DIBL, fT and switching speed