260 research outputs found

    Composition Depth Profiles of High Temperature Superconducting Materials by Energetic Elastic Backscattering

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    A review is given of the application of high energy elastic backscattering spectrometry techniques for profiling high-temperature superconducting (HTSC) materials in thin film form. The use of higher bombarding ion energies provides most of the advantages of the more common lower energy or Rutherford backscattering (RBS) but additionally allows profiling to a greater thickness and, by a much larger sensitivity for light elements, permits profiling carbon and oxygen in the presence of heavier substrates. Examples for HTSC materials are given

    A simple method of obtaining concentration depth-profiles from X-ray diffraction

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    The construction of composition profiles from X-ray intensity bands was investigated. The intensity band-to-composition profile transformation utilizes a solution which can be easily evaluated. The technique can be applied to thin films and thick speciments for which the variation of lattice parameters, linear absorption coefficient, and reflectivity with composition are known. A deconvolution scheme with corrections for the instrumental broadening and ak-alfadoublet is discussed

    MgO barrier-perpendicular magnetic tunnel junctions with CoFe/Pd multilayers and ferromagnetic insertion layers

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    The authors studied an effect of ferromagnetic (Co20Fe60B20 or Fe) layer insertion on tunnel magnetoresistance (TMR) properties of MgO-barrier magnetic tunnel junctions (MTJs) with CoFe/Pd multilayer electrodes. TMR ratio in MTJs with CoFeB/MgO/Fe stack reached 67% at an-nealing temperature (Ta) of 200 degree C and then decreased rapidly at Ta over 250 degree C. The degradation of the TMR ratio may be related to crystallization of CoFe(B) into fcc(111) or bcc(011) texture result-ing from diffusion of B into Pd layers. MTJs which were in-situ annealed at 350oC just after depo-siting bottom CoFe/Pd multilayer showed TMR ratio of 78% by post annealing at Ta =200 degree C.Comment: 12 pages, 4 figure

    Silicon based oxidation-resistant coatings on Ti6242 alloy by dynamic ion mixing

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    The influence of SixCy and SixNy amorphous coatings on the oxidation resistance of a Ti6242 (Ti–6Al–2Sn–4Zr–2Mo) alloy was investigated. They were produced at room temperature by the dynamic ion mixing technique combining physical vapour deposition with simultaneous bombardment with 120 keV Ar+ ions. Isothermal oxidation tests were carried out at 600 °C in 1 atm flowing synthetic air (80% N2, 20% O2) demonstrating a considerable reduction (not, vert, similartwo orders of magnitude) of the oxidation rate for at least 100 h. The structural modifications after oxidation were investigated by XPS, XRD, SEM, SIMS. The formation of SiO2 is detected as the main oxidation product in the coating and the formation of Ti–Si compounds is also observed in the coating/substrate interface region. The crystallisation of SixNy is not detected and for SixCy only some traces of β-SiC could exist. The improvement of oxidation resistance of Ti6242 is discussed in relation with the intrinsic properties of the coatings and with the interface mixing and ion beam densification

    Taper-sectioning techniques in surface analysis

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    The provision of accurate composition-depth profiles is important in the investigation and characterization of thin and thick films, surface coatings, surface treatments and many other technological applications. Such profiles are normally obtained using a combination of sputter ion etching and surface analytical techniques. However, there are problems with this approach, particularly at depths greater than 1μm, since surfaces are generally eroded in a non-uniform way. Profiles to these depths are best achieved by using Auger electron spectroscopy in combination with a technique for mechanically tapering the specimen surface. Ball-cratering, which employs a rotating steel ball coated in fine diamond paste to abrade. a well-defined spherical crater in the surface, is shown to be a convenient and accurate method. [Continues.

    An X-ray diffraction study of titanium oxidation

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    Titanium specimens of commercial purity were exposed at 1100 to 1400 F to laboratory air for times up to 100 hours. The extent of substrate contamination by interstitial oxygen was was determined by a new X-ray diffraction analysis involving transformation of X-ray diffraction intensity bands. The oxygen solid-solubility at the oxide-metal interfaces and its variation with time at temperature were also determined. Diffusion coefficients are deduced from the oxygen depth profiles

    Composition depth profile analysis of electrodeposited alloys and metal multilayers: the reverse approach

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    The reverse depth profile analysis is a recently developed method for the study of a deposit composition profile in the near-substrate zone. The sample preparation technique enables one to separate the deposit and a thin cover layer from its substrate, and the initial roughness of the sample is much smaller than in the conventional sputtering direction. This technique is particularly suitable to study the zones being formed in the early phase of the electrodeposition of alloys. It has been demonstrated with the reverse depth profile analysis that in many cases when one component of an alloy is preferentially deposited, an initial zone is formed that is rich in the preferentially deposited component. This phenomenon is demonstrated for Ni Cd, Ni Sn, Fe Co Ni, Co Ni and Co Ni Cu alloys. The composition change is confined to the initial 150 nm thick deposit, and it is the result of the interplay of the deposition preference and the depletion of the electrolyte near the cathode with respect to the ion reduced preferentially. The reverse depth profile analysis made it possible to compare the measured and the calculated composition depth profile of electrodeposited multilayers. It has been shown that the decay in the composition oscillation intensity in Co/Cu multilayers with the increase of the sputtering depth can be derived from the roughness measured as a function of the deposit thickness

    Determining concentration depth profiles in fluorinated networks by means of electric force microscopy

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    5 páginas, 6 figuras.-- et al.By means of electric force microscopy, composition depth profiles were measured with nanometric resolution for a series of fluorinated networks. By mapping the dielectric permittivity along a line going from the surface to the bulk, we were able to experimentally access to the fluorine concentration profile. Obtained data show composition gradient lengths ranging from 30 nm to 80 nm in the near surface area for samples containing from 0.5 to 5 wt. % F, respectively. In contrast, no gradients of concentration were detected in bulk. This method has several advantages over other techniques because it allows profiling directly on a sectional cut of the sample. By combining the obtained results with x-ray photoelectron spectroscopy measurements, we were also able to quantify F/C ratio as a function of depth with nanoscale resolution.L.A.M., M.M.K., G.A.S., A.A., and J.C. acknowledge the financial support provided by the Basque Country Government (Grant No. IT-436-07), the Spanish Ministry of Science and Innovation (Grant Nos. MAT 2007-63681 and CSD 2006- 00053). The Donostia International Physics Center (DIPC) financial support is also acknowledged.Peer reviewe

    Multilayer chromium based coatings grown by atmospheric pressure direct liquid injection CVD

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    There is a great interest for multilayer hard coatings because they exhibit enhanced properties resulting from their nanostructuration. Such coatings are frequently constituted of carbide and nitride and are generally deposited under very low pressure by plasma and PVD processes. These vacuum techniques enable the growth of heterostructures with nanometric thick individual layers and sharp interfaces, which are two requirements for advanced performances. However, both to develop more economical processes and with the goal of continuous deposition applications, the CVD processes operating under atmospheric pressure are particularly attractive. In this paper we show that the combination of pulsed direct liquid injection and the use of metalorganic precursor (DLI-MOCVD) is a promising route for the growth of nanostructured multilayer coatings under atmospheric pressure. Chromium metal as well as chromium carbide and nitrides monolithic coatings have been deposited at 773 K by this process using liquid solution of bis(benzene) chromium as Cr molecular precursor. Then, CrCx/CrN nanostructured multilayer coatings with a bilayer period as low as 50 nm have been grown. Structural characterizations and preliminary mechanical properties of these metallurgical coatings are discussed
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