Open volume defects in ultra-thin TiO2 layers embedded in VMCO-like samples studied with positron annihilation spectroscopy

Positron annihilation signals from VMCO-like samples grown by atomic layer deposition at different temperatures are utilized for the characterization of differences in open volume defects in TiN/TiO2/a-Si heterostructures. Doppler and coincidence Doppler mode of positron annihilation spectroscopy combined with a monoenergetic positron beam were used for this study. Differences observed in the Doppler parameters indicate differences in the positron trapping states of the TiO2 epilayers grown at different temperatures. Furthermore, the coincidence-Doppler results show that these differences cannot be due to intermixing of the TiO2 and a-Si layers and formation of thin SiO2 layers at the interface during the growth process. The results indicate that the amount of open volume defects in the TiO2 layer of the VMCO-structure seems to increase with an increase in the growth temperature. Published under an exclusive license by AIP Publishing.Peer reviewe

Impact of Magnetic Coupling and Density on STT-MRAM Performance

As a unique mechanism for MRAMs, magnetic coupling needs to be accounted for when designing memory arrays. This paper models both intra- and inter-cell magnetic coupling analytically for STT-MRAMs and investigates their impact on the write performance and retention of MTJ devices, which are the data-storing elements of STT-MRAMs. We present magnetic measurement data of MTJ devices with diameters ranging from 35nm to 175nm, which we use to calibrate our intra-cell magnetic coupling model. Subsequently, we extrapolate this model to study inter-cell magnetic coupling in memory arrays. We propose the inter-cell magnetic coupling factor Psi to indicate coupling strength. Our simulation results show that Psi=2% maximizes the array density under the constraint that the magnetic coupling has negligible impact on the device's performance. Higher array densities show significant variations in average switching time, especially at low switching voltages, caused by inter-cell magnetic coupling, and dependent on the data pattern in the cell's neighborhood. We also observe a marginal degradation of the data retention time under the influence of inter-cell magnetic coupling

Tailoring the switching efficiency of magnetic tunnel junctions by the fieldlike spin-orbit torque

Current-induced spin-orbit torques provide a versatile tool for switching magnetic devices. In perpendicular magnets, the dampinglike component of the torque is the main driver of magnetization reversal. The degree to which the fieldlike torque assists the switching is a matter of debate. Here we study the switching of magnetic tunnel junctions with a CoFeB free layer and either W or Ta underlayers, which have a ratio of fieldlike to dampinglike torque of 0.3 and 1, respectively. We show that the fieldlike torque can either assist or hinder the switching of CoFeB when the static in-plane magnetic field required to define the polarity of spin-orbit torque switching has a component transverse to the current. In particular, the non-collinear alignment of the field and current can be exploited to increase the switching efficiency and reliability compared to the standard collinear alignment. By probing individual switching events in real-time, we also show that the combination of transverse magnetic field and fieldlike torque can accelerate or decelerate the reversal onset. We validate our observations using micromagnetic simulations and extrapolate the results to materials with different torque ratios. Finally, we propose device geometries that leverage the fieldlike torque for density increase in memory applications and synaptic weight generation

Spinel, an overlooked crystalline phase of Igzo

In the family of semiconducting oxides, InGaZnO4 (IGZO) is most attractive due to the absence of mobile holes and the preservation of a relative high electron mobility when the material is in the amorphous phase. Especially this last characteristic enables low deposition temperature (Td), beneficial for the application as semiconducting channels of thin film transistors (TFT) in optical displays and 3D memory elements. However, a disadvantage related to the amorphous phase is the distribution of bonding energies of oxygen anions, which is directly related to the distributed distances with respect to the neighboring metal cations [1], leading to free electron formation readily at low temperature. Please click Download on the upper right corner to see the full abstract

Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2 (vol 35, pg 151, 2020)

Correction for 'Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2' by Jonas Keukelier et al., J. Mater. Chem. C, 2021, DOI: ; 10.1039/d0tc04086j

Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2

Raman spectroscopy measurements are performed on sputtered GexSe1x thin films to identify bond presence. A large amount of homopolar bonds are found, including Ge–Ge bonds that can be attributed to Ge clustering. A time-resolved approach to Raman spectroscopy is explored to observe the effect of the high power-density laser on the sample material. Several methods are then used to tailor the structural bond homogeneity (homopolar–heteropolar bonds): annealing, varying sputter deposition pressure and the addition of dopants. In particular doping can reduce homopolar bond presence and increase heteropolar bonds presence. The impact of each dopant is supported by calculations of bond enthalpies according to Pauling equation using the approach of Lankhorst/Bicerano–Ovshinsky. Finally, in order to correlate the structural bond presence to the Ovonic Threshold Switching behaviour of (doped) GexSe1x thin films, both DC and pulsed (AC) measurement are performed on metal–insulator– metal (MIM) type test structures. It is found that minimizing homopolar bond presence is beneficial for the leakage current and electrical stability of the materia

Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector

The ovonic threshold switch (OTS) selector based on the voltage snapback of amorphous chalcogenides has received tremendous attention as it provides several desirable characteristics such as bidirectional switching, a controllable threshold voltage, high drive currents, and low leakage currents. GeSe is a well-known OTS selector that fulfills all the requirements imposed by future high-density storage class memories. Here, we report on pulsed chemical vapor deposition (CVD) of amorphous GeSe by using GeCl2 center dot C4H8O2 as a Ge source and two different Se sources namely bis-trimethylsilylselenide ((CH3)(3)Si)(2)Se (TMS)(2)Se and bis-triethylsilylselenide ((C2H5)(3)Si)(2)Se (TES)(2)Se. We utilized total reflection X-ray fluorescence (TXRF) to study the kinetics of precursor adsorption on the Si substrate. GeCl2 center dot C4H8O2 precursor adsorption on a 300 mm Si substrate showed under-dosing due to limited precursor supply. On the other hand, the Se precursor adsorption is limited by low reaction efficiency as we learned from a better within-wafer uniformity. Se precursors need Cl sites (from Ge precursor) for precursor ligand exchange reactions. Adsorption of (TMS)(2)Se is found to be much faster than (TES)(2)Se on a precoated GeClx layer. Atomic layer deposition (ALD) tests with GeCl2 center dot C4H8O2 and (TMS)(2)Se revealed that the growth per cycle (GPC) decreases with the introduction of purge steps in the ALD cycle, whereas a higher GPC is obtained in pulsed-CVD mode without purges. Based on this basic understanding of the process, we developed a pulsed CVD growth recipe (GPC = 0.3 angstrom per cycle) of GeSe using GeCl2 center dot C4H8O2 and (TMS)(2)Se at a reactor temperature of 70 degrees C. The 20 nm GeSe layer is amorphous and stoichiometric with traces of chlorine and carbon impurities. The film has a roughness of similar to 0.3 nm and it starts to crystallize at a temperature of similar to 370 degrees C. GeSe grown on 3D test structures showed excellent film conformality

Size dependence of spin-torque switching in perpendicular magnetic tunnel junctions

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