Molecular beam epitaxy of highly mismatched N-rich GaNSb and InNAs alloys

GaN materials alloyed with group V anions form the so-called highly mismatched alloys (HMAs). Recently, the authors succeeded in growing N-rich GaNAs and GaNBi alloys over a large composition range by plasma-assisted molecular beam epitaxy (PA-MBE). Here, they present first results on PA-MBE growth and properties of N-rich GaNSb and InNAs alloys and compare these with GaNAs and GaNBi alloys. The enhanced incorporation of As and Sb was achieved by growing the layers at extremely low growth temperatures. Although layers become amorphous for high As, Sb, and Bi content, optical absorption measurements show a progressive shift of the optical absorption edge to lower energy. The large band gap range and controllable conduction and valence band positions of these HMAs make them promising materials for efficient solar energy conversion devices

Growth of GaN on SiC(0001) by Molecular Beam Epitaxy

<p>GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 × 10⁹ cm^—2 for edge dislocations and 1 × 10⁷ cm^—2 for screw dislocations are achieved in GaN films of 1 μm thickness grown under optimal conditions. Reverse leakage is observed near some dislocations, although the majority of dislocations do not produce leakage.</p