Evaluation of Space Power Materials Flown on the Passive Optical Sample Assembly

Evaluating the performance of materials on the exterior of spacecraft is of continuing interest, particularly in anticipation of those applications that will require a long duration in low Earth orbit. The Passive Optical Sample Assembly (POSA) experiment flown on the exterior of Mir as a risk mitigation experiment for the International Space Station was designed to better understand the interaction of materials with the low Earth orbit environment and to better understand the potential contamination threats that may be present in the vicinity of spacecraft. Deterioration in the optical performance of candidate space power materials due to the low Earth orbit environment, the contamination environment, or both, must be evaluated in order to propose measures to mitigate such deterioration. The thirty two samples of space power materials studied here include solar array blanket materials such as polyimide Kapton H and SiO(x) coated polyimide Kapton H, front surface aluminized sapphire, solar dynamic concentrator materials such as silver on spin coated polyimide and aluminum on spin coated polyimide, CV 1144 silicone, and the thermal control paint Z-93-P. The physical and optical properties that were evaluated prior to and after the POSA flight include mass, total, diffuse, and specular reflectance, solar absorptance, and infrared emittance. Additional post flight evaluation included scanning electron microscopy to observe surface features caused by the low Earth orbit environment and the contamination environment, and variable angle spectroscopic ellipsometry to identify contaminant type and thickness. This paper summarizes the results of pre- and post-flight measurements, identifies the mechanisms responsible for optical properties deterioration, and suggests improvements for the durability of materials in future missions

SAMPLE ANALYSIS METHODOLOGY UTILIZNGELECTROMAGNETIC RADATION

Simultaneous use of wavelengths in at least two ranges Selected from RADIO, MICRO. FIR, IR, NIR-VIS-NUV. UV, DUV, VUV EUV, XRAY in a regression procedure to evaluate parameters in mathematical dispersion structures to model dielectric functions

Bi(OTf)(3)-, TfOH-, and TMSOTf-Mediated, One-Pot Epoxide Rearrangement, Addition, and Intramolecular Silyl-Modified Sakurai (ISMS) Cascade toward Dihydropyrans: Comparison of Catalysts and Role of Bi(OTf)(3)

Catalytic quantities of bismuth(III) triflate efficiently initiate the rearrangement of epoxides to aldehydes, which subsequently react with (Z)-delta-hydroxyalkenylsilanes to afford 2,6-disubstituted 3,6-dihydro-2H-pyrans. Isolated yields of desired products using Bi(OTf)(3) were compared with yields obtained when the reactions were run with TfOH and TMSOTf in the presence and absence of several additives. These studies, as well as NMR spectroscopic analyses, indicate an initial Lewis acid/base interaction between Bi(OTf)(3) and substrates providing TfOH in situ

SAMPLEMASKINGINELLIPSOMETERAND THE LIKE SYSTEMS INCLUDING DETECTION OF SUBSTRATE BACKSIDE REFLECTIONS

A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside

Study of surface chemical changes and erosion rates for CV-1144-O silicone under electron cyclotron resonance oxygen plasma exposure

CV-1144-O silicone thin films were irradiated in an electron cyclotron resonance oxygen plasma, which is a simulation of the low earth orbital environment. A crude equivalence between this plasma system and the low earth orbital environment was determined by measuring Kapton weight loss in the plasma and comparing to Kapton weight loss in space experiments. Changes in optical properties and erosion rates under ultraviolet light and atomic oxygen radiation were studied using in situ spectroscopic ellipsometry (SE). The erosion rate at the beginning of the plasma exposure was significantly faster than that at later stages. Approximately one third of the total silicone thickness was etched away within 1 h, which according to the equivalence experiment, corresponds to about two months in low earth orbit. The refractive index of silicone in the visible range increased during the exposure, indicating that the film was being densified. Optical constants (both before and after plasma exposure) were determined by ex situ spectroscopic ellipsometry in the ultraviolet– visible–near-infrared (0.7–8.5 eV) and IR (200–7000 cm-1) ranges. Also, SE was used to map thickness and uniformity before and after radiation. Regression fits using Lorentzian and Gaussian oscillators as parametric models for the optical constants were excellent, and the major absorption peaks in the IR region were identified. The before- and after-radiation spectra showed significant decreases in CH3-associated peaks and increases in SiOx-associated peaks

Estimation of peak Raman gain coefficients for barium-bismuth-tellurite glasses from spontaneous Raman cross-section experiments

In this paper we explore the TeO2-Bi2O 3-BaO glass family with varied TeO2 concentration for Raman gain applications, and we report, for the first time, the peak Raman gain coefficients of glasses within this glass family extrapolated from non-resonant absolute Raman cross-section measurements at 785 nm. Estimated Raman gain coefficients show peak values of up to 40 times higher than silica for the main TeO2 bands. Other optical properties, including index dispersion from the visible to the long wave Infrared (LWIR) are also summarized in this paper. © 2009 Optical Society of America

Progress in spectroscopic ellipsometry: Applications from vacuum ultraviolet to infrared

Spectroscopic ellipsometry (SE) is a noncontact and nondestructive optical technique for thin film characterization. In the past 10 yr, it has migrated from the research laboratory into the semiconductor, data storage, display, communication, and optical coating industries. The wide acceptance of SE is a result of its flexibility to measure most material types: dielectrics, semiconductors, metals, superconductors, polymers, biological coatings, and even multilayers of these materials. Measurement of anisotropic materials has also made huge strides in recent years. Traditional SE measurements cover the ultraviolet, visible, and near infrared wavelengths. This spectral range is now acquired within seconds with high accuracy due to innovative optical configurations and charge coupled device detection. In addition, commercial SE has expanded into both the vacuum ultraviolet (VUV) and midinfrared (IR). This wide spectral coverage was achieved by utilizing new optical elements and detection systems, along with UV or Fourier transform IR light sources. Modern instrumentation is now available with unprecedented flexibility promoting a new range of possible applications. For example, the VUV spectral region is capable of characterizing lithographic materials for 157 nm photolithography. The VUV also provides increased sensitivity for thin layers (e.g., gate oxides or self-assembled monolayers) and allows investigation of high-energy electronic transitions. The infrared spectral region contains information about semiconductor doping concentration, phonon absorption, and molecular bond vibrational absorptions. In this work, we review the latest progress in SE wavelength coverage. Areas of significant application in both research and industrial fields will be surveyed, with emphasis on wavelength-specific information content