GHz Rabi flopping to Rydberg states in hot atomic vapor cells

We report on the observation of Rabi oscillations to a Rydberg state on a timescale below one nanosecond in thermal rubidium vapor. We use a bandwidth-limited pulsed excitation and observe up to 6 full Rabi cycles within a pulse duration of ~ 4 ns. We find good agreement between the experiment and numerical simulations based on a surprisingly simple model. This result shows that fully coherent dynamics with Rydberg states can be achieved even in thermal atomic vapor thus suggesting small vapor cells as a platform for room temperature quantum devices. Furthermore the result implies that previous coherent dynamics in single atom Rydberg gates can be accelerated by three orders of magnitude.Comment: 4 pages, 3 figure

High contrast D1_{1} line electromagnetically induced transparency in nanometric-thin rubidium vapor cell

Electromagnetically induced transparency (EIT) on atomic D$_{1}$ line of rubidium is studied using a nanometric-thin cell with atomic vapor column length in the range of L= 400 - 800 nm. It is shown that the reduction of the cell thickness by 4 orders as compared with an ordinary cm-size cell still allows to form an EIT resonance for $L= \lambda$ ($\lambda =794$ nm) with the contrast of up to 40%. Remarkable distinctions of EIT formation in nanometric-thin and ordinary cells are demonstrated. Despite the Dicke effect of strong spectral narrowing and increase of the absorption for $L=$ $\lambda /2$, EIT resonance is observed both in the absorption and the fluorescence spectra for relatively low intensity of the coupling laser. Well resolved splitting of the EIT resonance in moderate magnetic field for $L=$ $\lambda$ can be used for magnetometry with nanometric spatial resolution. The presented theoretical model well describes the observed results.Comment: Submitted to Applied Physics B: Lasers and Optics, 9 pages, 10 figure

High throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct writing/milling capability. IBL allows for rapid prototyping of high-resolution FZPs that can be used for high-resolution imaging at soft X-ray energies. Here, we discuss improvements in the process enabling us to write zones down to 15 nm in width, achieving an effective outermost zone width of 30 nm. With a 35% reduction in process time and an increase in resolution by 26% compared to our previous results, we were able to resolve 21 nm features of a test sample using the FZP. The new process conditions are then applied for fabrication of large arrays of high-resolution zone plates. Results show that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics

Generation and characterization of focused helical x ray beams

The phenomenon of orbital angular momentum (OAM) affects a variety of important applications in visible optics, including optical tweezers, free-space communication, and 3D localization for fluorescence imaging. The lack of suitable wavefront shaping optics such as spatial light modulators has inhibited the ability to impart OAM on x-ray and electron radiation in a controlled way. Here, we report the experimental observation of helical soft x-ray beams generated by holographically designed diffractive optical elements. We demonstrate that these beams rotate as a function of propagation distance and measure their vorticity and coherent mode structure using ptychography. Our results establish an approach for controlling and shaping of complex focused beams for short wavelength scanning microscopy and OAM-driven applications

Correction of axial position uncertainty and systematic detector errors in ptychographic diffraction imaging

Ptychography is a diffraction imaging method that allows one to solve inverse problems in microscopy with the ability to retrieve information about and correct for systematic errors. Here, we propose techniques to correct for axial position uncertainty, detector point spread, and inhomogeneous detector response using ptychography’s inherent self-calibration capabilities. The proposed methods are tested with visible light and x-ray experimental data. We believe that the results are important for precise calibration of ptychographic experimental setups and rigorous quantification of partially coherent beams by means of ptychography