Optical lithography

Optical lithography is a photon-based technique comprised of projecting an image into a photosensitive emulsion (photoresist) coated onto a substrate such as a silicon wafer. It is the most widely used lithography process in the high volume manufacturing of nano-electronics by the semiconductor industry. Optical lithography’s ubiquitous use is a direct result of its highly parallel nature allowing vast amounts of information to be transferred very rapidly. For example, a modern leading edge lithography tool produces 150-300-mm patterned wafers per hour with 40-nm two-dimensional pattern resolution, yielding a pixel throughput of approximately 1.8T pixels/s. Continual advances in optical lithography capabilities have enabled the computing revolution over the past 50 years

QCD and models on multiplicities in e+e−e^+e^- and ppˉp\bar p interactions

A brief survey of theoretical approaches to description of multiplicity distributions in high energy processes is given. It is argued that the multicomponent nature of these processes leads to some peculiar characteristics observed experimentally. Predictions for LHC energies are presented. It is shown that similarity of the energy dependence of average multiplicities in different reactions is not enough alone to suggest the universal mechanism of particle production in strongly-interacting systems. Other characteristics of multiplicity distributions depend on the nature of colliding partners.Comment: 16 pages, 11 figures, Phys. Atom. Nuc