Identification of influence within the social media

Social media is expected to have a growing impact on the corporate reputation of organizations. Various social media actors referred to as social media influencers can have a particular impact on corporate reputation. It is important for organizations to identify these actors and understand how to interact with them in order to safeguard the organizational reputation. In this study, based on extensive literature review and a Delphi study, we constructed a model for the identification of the social media influencers; the ‘social media corporate reputation influencers model’. The Delphi study shows that the model is suitable for the identification of social media influencers by identifying the main indicators for determining and predicting the influence within the social media. Based on the Delphi study amongst social media marketing professionals, we conclude that social media has an impact on corporate reputations

The Relative Growth On Information In Two-Dimensional Partitions

Let ... ∈ [0, 1)^sup 2^. In this paper we find the rate at which knowledge about the partition elements ... lies in for one sequence of partitions determines the partition elements it lies in for another sequence of partitions. This rate depends on the entropy of these partitions and the geometry of their shapes, and gives a two-dimensional version of Lochs\u27 theorem

The electroclinic effect and modulated phases in smectic liquid crystals

We explore the possibility that the large electroclinic effect observed in ferroelectric liquid crystals arises from the presence of an ordered array of disclination lines and walls. If the spacing of these defects is in the subvisible range, this modulated phase would be similar macroscopically to a smectic A phase. The application of an electric field distorts the array, producing a large polarization, and hence a large electroclinic effect. We show that with suitable elastic parameters and sufficiently large chirality, the modulated phase is favored over the smectic A and helically twisted smectic C* phases. We propose various experimental tests of this scenario.Comment: 9 pages, 7 figures; new version includes dipolar interactions and bend-twist couplin

Application of atmospheric pressure glow discharge (APGD) for deposition of thin silica like films on polymeric webs

Silica-like films were deposited on PEN and PET polymeric foils in atmospheric pressure glow discharge (APGD) in a roll-to-roll reactor open to ambient air. APGD was ignited in a mixture of inexpensive carrying gas argon and nitrogen with oxygen and hexamethyldisiloxane (HMDSO) precursor. The uniform diffuse glow in various gas mixtures was sustained by utilizing electronic stabilization network. APGD operation in air for a present setup was demonstrated. The contribution of different deposition mechanisms to the resulting silica-like film is discussed. The dependence of film structure and chemical composition on the conditions during deposition process was studied by means of SEM, ATR-FTIR and XPS analysis. The influence of oxidant concentration on the deposited film properties is analyzed and discussed

Application of atmospheric pressure glow discharge (APGD) for deposition of thin silica like films on polymeric webs

Silica-like films were deposited on PEN and PET polymeric foils in atmospheric pressure glow discharge (APGD) in a roll-to-roll reactor open to ambient air. APGD was ignited in a mixture of inexpensive carrying gas argon and nitrogen with oxygen and hexamethyldisiloxane (HMDSO) precursor. The uniform diffuse glow in various gas mixtures was sustained by utilizing electronic stabilization network. APGD operation in air for a present setup was demonstrated. The contribution of different deposition mechanisms to the resulting silica-like film is discussed. The dependence of film structure and chemical composition on the conditions during deposition process was studied by means of SEM, ATR-FTIR and XPS analysis. The influence of oxidant concentration on the deposited film properties is analyzed and discussed

Vakschool 2.0:sustainable and quality vocational training

Lower vocational-oriented education is under pressure in the Netherlands. Small educational institutions are looking for sustainable quality solutions for offering high quality curricula. Cloud computing and social media may be one part of the solution. This research contributes to develop a sustainable quality vocational education 2.0 concept that can be used in small vocational oriented education. Different experts contributed to a concept, called Vakschool1 2.0, in three different sessions. The concept can be applied within small vocational oriented education in the Netherlands

On the Deposition Mechanism of the Silica Like Films in Atmospheric Pressure Glow Discharge

Atmospheric pressure plasma enhanced thin film deposition (PECVD) is nowadays in focus of increasing scientific and industrial interest. The benefits of this newly emerging technology are in possibilities for cost-efficient in-line roll-to-roll production without expensive and cumbersome vacuum equipment. Yet, comparing to the well studied low pressure PECVD, there is a serious lack of insights on thin film deposition mechanisms on the moving substrates at high pressure. In this contribution we present a study of the deposition process of silica-like films in the diffuse high power variety of the dielectric barrier discharge referred as atmospheric pressure glow discharge (APGD) [1, 2]. This process is capable to produce uniform carbon-free silica-like films on the polymeric webs in low cost gas mixtures [2]. Considering deposition mechanisms in a roll-to-roll atmospheric PECVD reactor with a moving polymer substrate and gas flow, three different pathways which are simultaneously contributing to the film formation can be identified: a) ionic deposition, where ionized products of the decomposed precursor drift in the electric field towards the surface; b) diffusive deposition of neutral radicals produced in plasma and afterglow phases and c) deposition of large particles or dust. Due to the gas flow and depletion of the precursor, each of these mechanisms leads to layers characterized by a specific composition, morphology and location within the discharge area. In this contribution we will address the influence of the different mechanisms on film deposition, supported by space-resolved spectroscopic ellipsometry, XPS, SEM and water contact angle measurements. The experimental profiles of the deposition rate along the gas flow were analyzed with a 2D numerical convection-diffusion deposition model. [1] S. Okazaki, M. Kogoma, M. Uehara, Y. Kimura, J. Phys. D: Appl.Phys., 26, 889, (1993) [2] S.A. Starostin, M.A. ElSabbagh, E. Aldea, H. de Vries M. Creatore, M.C.M. van de Sanden, IEEE Trans. Plasma Sci. 36, 968 (2008) [3] S. Starostine, E. Aldea, H. de Vries, M. Creatore, M. C.M. van de Sanden, Plasma Process Polym, 4, S440 (2007