Transformations of microdefect structure in silicon crystals under the influence of weak magnetic field

Quantitative characterization of complex microdefect structures in annealed silicon crystals (1150 °С, 40 h) and their transformations after exposing for one day in a weak magnetic field (1 T) has been performed by analyzing the rocking curves, which have been measured by a high-resolution double-crystal X-ray diffractometer. Based on the characterization results, which have been obtained by using the formulas of the dynamical theory of X-ray diffraction by imperfect crystals with randomly distributed microdefects of several types, the concentrations and average sizes of oxygen precipitates and dislocation loops after imposing the magnetic field and their dependences on time after its removing have been determined

X-Ray Diffraction Characterization of Nanoscale Strains and Defects in Yttrium Iron Garnet Films Implanted with Fluorine Ions

The theoretical diffraction model for a crystalline multilayer system with inhomogeneous strain profile and randomly distributed defects has been created by using the statistical dynamical theory of X-ray diffraction in imperfect crystals. The dynamical scattering peculiarities in both coherent and diffuse scattering intensities have been taken into account for all the layers of the system by using derived recurrence relations between coherent scattering amplitudes. The investigated yttrium-iron garnet films grown on gadolinium-gallium garnet substrate were implanted with different doses of 90 keV F+ ions. The rocking curves measured from the as-grown and implanted samples have been treated by using the proposed theoretical model. This model has allowed for the reliable self-consistent determination of strain profile parameters and structural defect characteristics in both implanted film and substrate of the investigated samples

Double- and triple-crystal X-ray diffractometry of microdefects in silicon

The generalized dynamical theory of X-ray scattering by real single crystals allows to self-consistently describe intensities of coherent and diffuse scattering measured by double- and triple-crystal diffractometers (DCD and TCD) from single crystals with defects in crystal bulk and with strained subsurface layers. Being based on this theory, we offer the combined DCD+TCD method that exhibits the higher sensitivity to defect structures with wide size distributions as compared with any of these methods alone. In the investigated Czochralski-grown silicon crystals, the sizes and concentrations of small oxygen precipitates as well as small and large dislocation loops have been determined using this method

Comprehensive investigation of defects in highly perfect silicon single crystals

We used X-ray diffraction method of total rocking curves and nondestructive direct observation techniques (atomic force and scanning electron microscopies) to quantitatively determine the defect characteristics (radii and concentrations) for the main types of defects in Czochralski-grown silicon single crystals annealed at 750 °С